Patents by Inventor Daan Maurtis SLOTBOOM

Daan Maurtis SLOTBOOM has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Position measurement using natural frequency vibration of a pattern
    Patent number: 8477289
    Abstract: A detection method for detecting a property of an extended pattern formed by at least one line generally extending in a first direction. The extended pattern is formed on a substrate or on a substrate table and may extend, for example, over a length of at least 50× the width of the line. The extended pattern is focus sensitive. The detection method includes moving the substrate table in a first direction and measuring along that first direction a property of the extended pattern. The property can be a result of a physical property of the extended pattern in a second direction perpendicular to the first direction. In a next step a calibration of the substrate table position can be derived from the measured position of the extended pattern.
    Type: Grant
    Filed: June 2, 2009
    Date of Patent: July 2, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Daan Maurtis Slotboom, Johan Hendrik Geerke, Igor Matheus Petronella Aarts
  • Lithographic apparatus and device manufacturing method
    Patent number: 8446564
    Abstract: A detection method for detecting a property of an extended pattern formed by at least one line generally extending in a first direction. The extended pattern is formed on a substrate or on a substrate table and preferably extends over a length of at least 50× the width of the line. The extended pattern is focus sensitive. The detection method includes moving the substrate table in a first direction and measuring along that first direction a property of the extended pattern. The property can be a result of a physical property of the extended pattern in a second direction perpendicular to the first direction. In a next step a calibration of the substrate table position can be derived from the measured position of the extended pattern.
    Type: Grant
    Filed: June 2, 2009
    Date of Patent: May 21, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Gerardus Carolus Johannus Hofmans, Bart Peter Bert Segers, Daan Maurtis Slotboom
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20090305151
    Abstract: A detection method for detecting a property of an extended pattern formed by at least one line generally extending in a first direction. The extended pattern is formed on a substrate or on a substrate table and preferably extends over a length of at least 50× the width of the line. The extended pattern is focus sensitive. The detection method includes moving the substrate table in a first direction and measuring along that first direction a property of the extended pattern. The property can be a result of a physical property of the extended pattern in a second direction perpendicular to the first direction. In a next step a calibration of the substrate table position can be derived from the measured position of the extended pattern.
    Type: Application
    Filed: June 2, 2009
    Publication date: December 10, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Gerardus Carolus Johannus HOFMANS, Bart Peter Bert Segers, Daan Maurtis Slotboom
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20090296058
    Abstract: A detection method for detecting a property of an extended pattern formed by at least one line generally extending in a first direction. The extended pattern is formed on a substrate or on a substrate table and may extend, for example, over a length of at least 50× the width of the line. The extended pattern is focus sensitive. The detection method includes moving the substrate table in a first direction and measuring along that first direction a property of the extended pattern. The property can be a result of a physical property of the extended pattern in a second direction perpendicular to the first direction. In a next step a calibration of the substrate table position can be derived from the measured position of the extended pattern.
    Type: Application
    Filed: June 2, 2009
    Publication date: December 3, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Daan Maurtis SLOTBOOM, Johan Hendrik GEERKE, Igor Matheus Petronella AARTS