Patents by Inventor Daigo Saito
Daigo Saito has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240084753Abstract: A control device and method controls a vehicle having an internal combustion engine connected to an automatic transmission via a torque converter with a lockup device. The torque of the internal combustion engine is limited the by a torque limit value based on a speed difference between an input rotational speed and an output rotational speed of the torque converter during acceleration in a non-lockup state. The torque-limiting of the internal combustion engine is prohibited torque-limiting upon a prescribed condition being met. The prescribed condition is met by a heating request, during hill climbing/towing, during travel at high vehicle speeds, when the accelerator pedal opening angle exceeds or is equal to a prescribed opening angle, when the torque limit value is greater than a target torque, in a range other than a D range, or in a mode other than normal mode.Type: ApplicationFiled: November 29, 2021Publication date: March 14, 2024Inventors: Tetsuya NISHIYAMA, Daigo KISHI, Tatsuo NAKANO, Seiichirou TAKAHASHI, Koji SAITO, Yukiyoshi INUTA, Takao ARIMATSU, Yasuhiro ENDO
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Publication number: 20230324802Abstract: A resist underlayer film for lithography does not cause intermixing with a resist layer, has high dry etching resistance and high heat resistance, and generates a low amount of sublimate. A resist underlayer film-forming composition containing a polymer having a unit structure of the following formula (1): wherein A is a divalent group having at least two amino groups, the group is derived from a compound having a condensed ring structure and an aromatic group for substituting a hydrogen atom on the condensed ring, and B1 and B2 are each independently a hydrogen atom, an alkyl group, a benzene ring group, a condensed ring group, or a combination thereof, or B1 and B2 optionally form a ring with a carbon atom bonded to B1 and B2.Type: ApplicationFiled: June 9, 2023Publication date: October 12, 2023Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Hikaru TOKUNAGA, Daigo SAITO, Keisuke HASHIMOTO, Rikimaru SAKAMOTO
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Patent number: 11720024Abstract: A resist underlayer film for lithography does not cause intermixing with a resist layer, has high dry etching resistance and high heat resistance, and generates a low amount of sublimate. A resist underlayer film-forming composition containing a polymer having a unit structure of the following formula (1): wherein A is a divalent group having at least two amino groups, the group is derived from a compound having a condensed ring structure and an aromatic group for substituting a hydrogen atom on the condensed ring, and B1 and B2 are each independently a hydrogen atom, an alkyl group, a benzene ring group, a condensed ring group, or a combination thereof, or B1 and B2 optionally form a ring with a carbon atom bonded to B1 and B2.Type: GrantFiled: August 4, 2022Date of Patent: August 8, 2023Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Hikaru Tokunaga, Daigo Saito, Keisuke Hashimoto, Rikimaru Sakamoto
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Publication number: 20220404707Abstract: A resist underlayer film for lithography does not cause intermixing with a resist layer, has high dry etching resistance and high heat resistance, and generates a low amount of sublimate. A resist underlayer film-forming composition containing a polymer having a unit structure of the following formula (1): wherein A is a divalent group having at least two amino groups, the group is derived from a compound having a condensed ring structure and an aromatic group for substituting a hydrogen atom on the condensed ring, and B1 and B2 are each independently a hydrogen atom, an alkyl group, a benzene ring group, a condensed ring group, or a combination thereof, or B1 and B2 optionally form a ring with a carbon atom bonded to B1 and B.Type: ApplicationFiled: August 4, 2022Publication date: December 22, 2022Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Hikaru TOKUNAGA, Daigo SAITO, Keisuke HASHIMOTO, Rikimaru SAKAMOTO
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Patent number: 11300879Abstract: A material to form a resist underlayer film having properties achieving heat resistance, flattening properties, and etching resistance through lithography. A resist underlayer film forming composition including a polymer having a unit structure of Formula (1): (wherein R1 is an organic group having at least two amines and at least three C6-40 aromatic rings, R2 and R3 are each a hydrogen atom, a C1-10 alkyl group, a C6-40 aryl group, a heterocyclic group, or a combination thereof, and the alkyl group, the aryl group, and the heterocyclic group are optionally substituted with a halogen group, a nitro group, an amino group, a formyl group, an alkoxy group, or a hydroxy group, or R2 and R3 optionally form a ring together). The above mentioned composition t, wherein R1 is a divalent organic group derived from N,N?-diphenyl-1,4-phenylenediamine.Type: GrantFiled: August 28, 2017Date of Patent: April 12, 2022Assignee: NISSAN CHEMICAL CORPORATIONInventors: Daigo Saito, Keisuke Hashimoto, Rikimaru Sakamoto
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Patent number: 11169441Abstract: A resist underlayer film forming composition characterized by containing (A) a compound represented by formula (1) (in formula (1), independently, R1 represents a C1 to C30 divalent group; each of R2 to R7 represents a C1 to C10 linear, branched, or cyclic alkyl group, a C6 to C10 aryl group, a C2 to C10 alkenyl group, a thiol group, or a hydroxyl group; at least one R5 is a hydroxyl group or a thiol group; each of m2, m3, and m6 is an integer of 0 to 9; each of m4 and m7 is an integer of 0 to 8; m5 is an integer of 1 to 9; n is an integer of 0 to 4; and each of p2 to p7 is an integer of 0 to 2) and a cross-linkable compound represented by formula (2-1) or (2-2) (in formula (2), Q1 represents a single bond or an m12-valent organic group; each of R12 and R15 independently represents a C2 to C10 alkyl group or a C2 to C10 alkyl group having a C1 to C10 alkoxy group; each of R13 and R16 represents a hydrogen atom or a methyl group; each of R14 and R17 represents a C1 to C10 alkyl group or a C6 to C40 aryl group;Type: GrantFiled: July 12, 2018Date of Patent: November 9, 2021Assignee: NISSAN CHEMICAL CORPORATIONInventors: Daigo Saito, Keisuke Hashimoto, Rikimaru Sakamoto
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Publication number: 20200387072Abstract: A resist underlayer film-forming composition including a novolac resin having a structural group (C) formed by reaction between an aromatic ring of an aromatic compound (A) having at least two amino groups and three C6-40 aromatic rings and a vinyl group of an aromatic vinyl compound (B). The structural group (C) may be a group of the following Formula (1): [wherein R1 is a divalent group containing at least two amino groups and at least three C6-40 aromatic rings]. R1 may be a divalent organic group prepared by removal of two hydrogen atoms from aromatic rings of a compound of the following Formula (2): R1 may be a divalent organic group prepared by removal of two hydrogen atoms from aromatic rings of N,N?-diphenyl-1,4-phenylenediamine.Type: ApplicationFiled: February 20, 2019Publication date: December 10, 2020Applicant: NISSAN CHEMICAL CORPORATIONInventors: Hirokazu NISHIMAKI, Daigo SAITO, Ryo KARASAWA, Keisuke HASHIMOTO
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Publication number: 20200142310Abstract: A resist underlayer film forming composition characterized by containing (A) a compound represented by formula (1) (in formula (1), independently, R1 represents a C1 to C30 divalent group; each of R2 to R7 represents a C1 to C10 linear, branched, or cyclic alkyl group, a C6 to C10 aryl group, a C2 to C10 alkenyl group, a thiol group, or a hydroxyl group; at least one R5 is a hydroxyl group or a thiol group; each of m2, m3, and m6 is an integer of 0 to 9; each of m4 and m7 is an integer of 0 to 8; m5 is an integer of 1 to 9; n is an integer of 0 to 4; and each of p2 to p7 is an integer of 0 to 2) and a cross-linkable compound represented by formula (2-1) or (2-2) (in formula (2), Q1 represents a single bond or an m12-valent organic group; each of R12 and R15 independently represents a C2 to C10 alkyl group or a C2 to C10 alkyl group having a C1 to C10 alkoxy group; each of R13 and R16 represents a hydrogen atom or a methyl group; each of R14 and R17 represents a C1 to C10 alkyl group or a C6 to C40 aryl group;Type: ApplicationFiled: July 12, 2018Publication date: May 7, 2020Applicant: NISSAN CHEMICAL CORPORATIONInventors: Daigo SAITO, Keisuke HASHIMOTO, Rikimaru SAKAMOTO
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Publication number: 20190212649Abstract: A material to form a resist underlayer film having properties achieving heat resistance, flattening properties, and etching resistance through lithography. A resist underlayer film forming composition including a polymer having a unit structure of Formula (1): (wherein R1 is an organic group having at least two amines and at least three C6-40 aromatic rings, R2 and R3 are each a hydrogen atom, a C1-10 alkyl group, a C6-40 aryl group, a heterocyclic group, or a combination thereof, and the alkyl group, the aryl group, and the heterocyclic group are optionally substituted with a halogen group, a nitro group, an amino group, a formyl group, an alkoxy group, or a hydroxy group, or R2 and R3 optionally form a ring together). The above mentioned composition t, wherein R1 is a divalent organic group derived from N,N?-diphenyl-1,4-phenylenediamine.Type: ApplicationFiled: August 28, 2017Publication date: July 11, 2019Applicant: NISSAN CHEMICAL CORPORATIONInventors: Daigo SAITO, Keisuke HASHIMOTO, Rikimaru SAKAMOTO
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Patent number: 10156692Abstract: An optical fiber transition assembly comprises a cable having a first terminal end from which extends an optical fiber. A furcation tube is also provided, having a second terminal end near the first terminal end of the cable into which the optical fiber of the cable is received. A polymeric transition element surrounds the first and second terminal ends to protect and secure the optical fiber in transition from the cable to the furcation tube, the polymeric transition element being configured to be retained in an entry port of an enclosure.Type: GrantFiled: June 17, 2015Date of Patent: December 18, 2018Assignee: AFL Telecommunications LLCInventors: Edward Morris, Roger Vaughn, Vahid Ebrahimi, Daigo Saito, Wilfred Courchaine
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Publication number: 20180356732Abstract: A resist underlayer film for lithography does not cause intermixing with a resist layer, has high dry etching resistance and high heat resistance, and generates a low amount of sublimate. A resist underlayer film-forming composition containing a polymer having a unit structure of the following formula (1): wherein A is a divalent group having at least two amino groups, the group is derived from a compound having a condensed ring structure and an aromatic group for substituting a hydrogen atom on the condensed ring, and B1 and B2 are each independently a hydrogen atom, an alkyl group, a benzene ring group, a condensed ring group, or a combination thereof, or B1 and B2 optionally form a ring with a carbon atom bonded to B1 and B2.Type: ApplicationFiled: November 30, 2016Publication date: December 13, 2018Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Hikaru TOKUNAGA, Daigo SAITO, Keisuke HASHIMOTO, Rikimaru SAKAMOTO
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Patent number: 10138323Abstract: A highly branched polymer comprising repeating units which each have an acid group such as sulfo group, said repeating units being represented by formula [1] or the like, and a dispersant for carbon nanotubes (CNTs) which comprises the highly branched polymer can disperse CNTs in a medium such as an organic solvent to the individual sizes and can yield thin films having improved conductivity. In formula [1], any one of A1 to A5 is a sulfo group, and the others are each a hydrogen atom.Type: GrantFiled: May 25, 2012Date of Patent: November 27, 2018Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Daigo Saito, Tatsuya Hatanaka
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Publication number: 20180314154Abstract: A resist underlayer film-forming composition comprising a novolac resin obtained by reacting an aromatic compound (A) with an aldehyde (B) having formyl group bonded to a secondary carbon atom or tertiary carbon atom of a C2-26 alkyl group. A resist underlayer film-forming composition according to the first aspect, in which the novolac resin comprises a unit structure of Formula (1): (in Formula (1), A is a bivalence group derived from a C6-40 aromatic compound; b1 is a C1-16 alkyl group; and b2 is a hydrogen atom or a C1-9 alkyl group). A is the bivalent group derived from an aromatic compound comprising an amino group, a hydroxy group, or both an amino group and a hydroxy group.Type: ApplicationFiled: October 14, 2016Publication date: November 1, 2018Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Daigo SAITO, Takafumi ENDO, Ryo KARASAWA, Rikimaru SAKAMOTO
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Publication number: 20180267262Abstract: A wedge device for use with a fiber optic connector comprises an insert body comprising a light transmissive material. The insert body defines a wedge portion integrally extending into a light pass structure, the light pass structure terminating in a single upper face distal from the wedge portion. For example, wedge device may be a unitary member formed entirely of the light transmissive material.Type: ApplicationFiled: May 22, 2018Publication date: September 20, 2018Inventors: Daigo Saito, Roger Vaughn
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Patent number: 10036860Abstract: A connector assembly for a fiber optic cable comprises a multi-part inner housing adapted to support an optical fiber splice connection structure. A cable clamp is located at a proximal end of the inner housing and is adapted to engage an outer sheath of a fiber optic cable. Preferably, the cable clamp is rotatable with respect to the inner housing.Type: GrantFiled: October 25, 2017Date of Patent: July 31, 2018Assignee: AFL Telecommunications LLCInventors: Daigo Saito, Roger Vaughn
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Publication number: 20180181001Abstract: A resist underlayer film-forming composition in which a coating film having high flattening properties is formed on a substrate. A resist underlayer film-forming composition including an epoxy adduct (C) obtained by reacting an epoxy group-containing compound (A) with an epoxy adduct-forming compound (B), wherein one or both of the epoxy group-containing compound (A) and the epoxy adduct-forming compound (B) contain an optionally branched alkyl group having a carbon atom number of three or more. The epoxy adduct-forming compound (B) is at least one compound selected from the group consisting of carboxylic acid (B1), carboxylic anhydride (B2), a phenol compound (B3), a hydroxyl group-containing compound (B4), a thiol compound (B5), an amino compound (B6), and an imide compound (B7). The optionally branched alkyl group having a carbon atom number of three or more is contained in the epoxy adduct-forming compound (B). The optionally branched alkyl group has a C3-19 alkyl group.Type: ApplicationFiled: June 20, 2016Publication date: June 28, 2018Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Takafumi ENDO, Daigo SAITO, Ryo KARASAWA, Rikimaru SAKAMOTO
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Patent number: 10007067Abstract: A wedge device for use with a fiber optic connector comprises an insert body comprising a light transmissive material. The insert body defines a wedge portion integrally extending into a light pass structure, the light pass structure terminating in a single upper face distal from the wedge portion. For example, wedge device may be a unitary member formed entirely of the light transmissive material.Type: GrantFiled: March 10, 2015Date of Patent: June 26, 2018Assignee: AFL Telecommunications LLCInventors: Daigo Saito, Roger Vaughn
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Publication number: 20180059337Abstract: A connector assembly for a fiber optic cable comprises a multi-part inner housing adapted to support an optical fiber splice connection structure. A cable clamp is located at a proximal end of the inner housing and is adapted to engage an outer sheath of a fiber optic cable. Preferably, the cable clamp is rotatable with respect to the inner housing.Type: ApplicationFiled: October 25, 2017Publication date: March 1, 2018Inventors: Daigo Saito, Roger Vaughn
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Patent number: 9829656Abstract: A connector assembly for a fiber optic cable comprises a multi-part inner housing adapted to support an optical fiber splice connection structure. A cable clamp is located at a proximal end of the inner housing and is adapted to engage an outer sheath of a fiber optic cable. Preferably, the cable clamp is rotatable with respect to the inner housing.Type: GrantFiled: December 22, 2014Date of Patent: November 28, 2017Assignee: AFL Telecommunications LLCInventors: Daigo Saito, Roger Vaughn
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Publication number: 20170322386Abstract: An optical fiber transition assembly comprises a cable having a first terminal end from which extends an optical fiber. A furcation tube is also provided, having a second terminal end near the first terminal end of the cable into which the optical fiber of the cable is received. A polymeric transition element surrounds the first and second terminal ends to protect and secure the optical fiber in transition from the cable to the furcation tube, the polymeric transition element being configured to be retained in an entry port of an enclosure.Type: ApplicationFiled: June 17, 2015Publication date: November 9, 2017Inventors: Edward MORRIS, Roger VAUGHN, Vahid EBRAHIMI, Daigo SAITO, Wilfred COURCHAINE