Abstract: The present invention aims to provide an adhesive composition which has high initial adhesion and can strongly fix an adherend, while can be peeled off easily by light irradiation even after undergoing a high-temperature process at 200° C. or higher. The present invention also aims to provide an adhesive tape produced from the adhesive composition, and wafer treatment method using the adhesive composition. The present invention provides an adhesive composition including an adhesive component, a photoinitiator, and a silicone compound containing a functional group that is crosslinkable with the adhesive component.

Abstract: The present invention aims to provide an adhesive composition having high adhesive strength, as well as being easily detachable and having excellent heat resistance, an adhesive tape comprising the adhesive composition, a method for treating a semiconductor wafer using the adhesive tape, and a method for producing a TSV wafer. The present invention relates to an adhesive composition comprising: an adhesive component; and a tetrazole compound represented by the following formula (1), formula (2), or formula (3), or its salt: wherein R1 and R2 each may be hydrogen, a hydroxy group, an amino group, or a C1-C7 alkyl group, alkylene group, phenyl group, or mercapto group; and the C1-C7 alkyl group, alkylene group, phenyl group, and mercapto group may be substituted.

Abstract: An object of the present invention is to provide a binder resin for a conductive paste, which can be used to obtain a conductive paste having a high conductive powder dispersibility, an ability to form high-aspect-ratio lines, and a low residual carbon content after firing. Further objects of the invention are to provide a conductive paste and a solar cell element produced using such a binder resin for a conductive paste. The invention provides a binder resin for a conductive paste, which includes a polymer having a main chain composed of a segment derived from a (meth)acrylate monomer and having also a phosphoric acid-based component represented by general formula (1) below at an ? position thereon. In general formula (1), X is an oxygen atom or a sulfur atom, and R1 and R2 are each a hydrogen atom, a hydrocarbon group having 1 to 13 carbon atoms, a hydroxyl group-containing group having 1 to 13 carbon atoms or an ester bond-containing group having 1 to 13 carbon atoms.

Abstract: It is an object of the invention to provide a method for producing an IC chip capable of producing an IC chip with a thickness as extremely thin as 50 ?m or thinner, for example, about 25 to 30 ?m at a high productivity.

Abstract: It is the object of the invention to provide a method for manufacturing a semiconductor chip capable of obtaining a semiconductor chip at a high manufacturing efficiency without damages. The invention is a method for manufacturing a semiconductor chip, which comprises a tape adhesion step of sticking a pressure sensitive adhesive tape for dicing having a pressure sensitive adhesive layer containing a gas generating agent for generating a gas by radiating light to a semiconductor wafer with a circuit formed; a dicing step for dicing the wafer with the pressure sensitive adhesive tape for dicing stuck and dividing the semiconductor wafer into each semiconductor chip; a separation step of separating at least a portion of the pressure sensitive adhesive tape for dicing from the semiconductor chip by radiating light to the divided each semiconductor chip; and a pickup step of picking the semiconductor chip up by a needle-less pickup method.