Patents by Inventor Daisuke Matsuno

Daisuke Matsuno has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9300271
    Abstract: An impedance matching device includes an input port connected to a high-frequency power supply, an output port connected to a load, an impedance variable circuit, a T-parameter memory for storing sets of T-parameters in a manner such that each of the sets of T-parameters is related to a corresponding one of adjustable impedance values of the device, an input voltage detector for detecting a forward wave voltage and a reflected wave voltage at the input port, and a p-p value calculator for computation of a p-p value of a high-frequency voltage at the output port. The computation of the p-p value of the high-frequency voltage is performed by using the forward wave voltage and the reflected wave voltage detected at the input port and also using one set of the T-parameters stored in the T-parameter memory.
    Type: Grant
    Filed: February 20, 2014
    Date of Patent: March 29, 2016
    Assignee: DAIHEN Corporation
    Inventor: Daisuke Matsuno
  • Publication number: 20140354173
    Abstract: An impedance matching device includes an input port connected to a high-frequency power supply, an output port connected to a load, an impedance variable circuit, a T-parameter memory for storing sets of T-parameters in a manner such that each of the sets of T-parameters is related to a corresponding one of adjustable impedance values of the device, an input voltage detector for detecting a forward wave voltage and a reflected wave voltage at the input port, and a p-p value calculator for computation of a p-p value of a high-frequency voltage at the output port. The computation of the p-p value of the high-frequency voltage is performed by using the forward wave voltage and the reflected wave voltage detected at the input port and also using one set of the T-parameters stored in the T-parameter memory.
    Type: Application
    Filed: February 20, 2014
    Publication date: December 4, 2014
    Applicant: DAIHEN Corporation
    Inventor: Daisuke MATSUNO
  • Patent number: 7642879
    Abstract: An impedance matching apparatus 3 calculates a forward wave voltage Vfo and a reflected wave voltage Vro at an output terminal 3b, based on a forward wave voltage Vfi and a reflected wave voltage Vri at an input terminal 3a, on information on variable values of variable capacitors VC1, VC2 acquired in advance through measurement, and on a T parameter of the impedance matching apparatus 3 corresponding to the information on the variable values of variable capacitors VC1, VC2. The impedance matching apparatus 3 calculates an input reflection coefficient ?i at the input terminal 3a corresponding to the information on the variable values of the variable capacitors VC1, VC2, based on the forward wave voltage Vfo, the reflected wave voltage Vro and the T parameter.
    Type: Grant
    Filed: December 19, 2007
    Date of Patent: January 5, 2010
    Assignee: Daihen Corporation
    Inventor: Daisuke Matsuno
  • Publication number: 20080129407
    Abstract: An impedance matching apparatus 3 calculates a forward wave voltage Vfo and a reflected wave voltage Vro at an output terminal 3b, based on a forward wave voltage Vfi and a reflected wave voltage Vri at an input terminal 3a, on information on variable values of variable capacitors VC1, VC2 acquired in advance through measurement, and on a T parameter of the impedance matching apparatus 3 corresponding to the information on the variable values of variable capacitors VC1, VC2. The impedance matching apparatus 3 calculates an input reflection coefficient ?i at the input terminal 3a corresponding to the information on the variable values of the variable capacitors VC1, VC2, based on the forward wave voltage Vfo, the reflected wave voltage Vro and the T parameter.
    Type: Application
    Filed: December 19, 2007
    Publication date: June 5, 2008
    Applicant: DAIHEN CORPORATION
    Inventor: Daisuke Matsuno
  • Patent number: 7332981
    Abstract: An impedance matching apparatus 3 calculates a forward wave voltage Vfo and a reflected wave voltage Vro at an output terminal 3b, based on a forward wave voltage Vfi and a reflected wave voltage Vri at an input terminal 3a, on information on variable values of variable capacitors VC1, VC2 acquired in advance through measurement, and on a T parameter of the impedance matching apparatus 3 corresponding to the information on the variable values of variable capacitors VC1, VC2. The impedance matching apparatus 3 calculates an input reflection coefficient ?i at the input terminal 3a corresponding to the information on the variable values of the variable capacitors VC1, VC2, based on the forward wave voltage Vfo, the reflected wave voltage Vro and the T parameter.
    Type: Grant
    Filed: February 1, 2007
    Date of Patent: February 19, 2008
    Assignee: Daihen Corporation
    Inventor: Daisuke Matsuno
  • Publication number: 20070170997
    Abstract: An impedance matching apparatus 3 calculates a forward wave voltage Vfo and a reflected wave voltage Vro at an output terminal 3b, based on a forward wave voltage Vfi and a reflected wave voltage Vri at an input terminal 3a, on information on variable values of variable capacitors VC1, VC2 acquired in advance through measurement, and on a T parameter of the impedance matching apparatus 3 corresponding to the information on the variable values of variable capacitors VC1, VC2. The impedance matching apparatus 3 calculates an input reflection coefficient ?i at the input terminal 3a corresponding to the information on the variable values of the variable capacitors VC1, VC2, based on the forward wave voltage Vfo, the reflected wave voltage Vro and the T parameter.
    Type: Application
    Filed: February 1, 2007
    Publication date: July 26, 2007
    Applicant: DAIHEN CORPORATION
    Inventor: Daisuke Matsuno
  • Patent number: 7199678
    Abstract: An impedance matching apparatus 3 calculates a forward wave voltage Vfo and a reflected wave voltage Vro at an output terminal 3b, based on a forward wave voltage Vfi and a reflected wave voltage Vri at an input terminal 3a, on information on variable values of variable capacitors VC1, VC2 acquired in advance through measurement, and on a T parameter of the impedance matching apparatus 3 corresponding to the information on the variable values of variable capacitors VC1, VC2. The impedance matching apparatus 3 calculates an input reflection coefficient ?i at the input terminal 3a corresponding to the information on the variable values of the variable capacitors VC1, VC2, based on the forward wave voltage Vfo, the reflected wave voltage Vro and the T parameter.
    Type: Grant
    Filed: October 31, 2005
    Date of Patent: April 3, 2007
    Assignee: Daihen Corporation
    Inventor: Daisuke Matsuno
  • Publication number: 20060151591
    Abstract: An impedance matching apparatus 3 calculates a forward wave voltage Vfo and a reflected wave voltage Vro at an output terminal 3b, based on a forward wave voltage Vfi and a reflected wave voltage Vri at an input terminal 3a, on information on variable values of variable capacitors VC1, VC2 acquired in advance through measurement, and on a T parameter of the impedance matching apparatus 3 corresponding to the information on the variable values of variable capacitors VC1, VC2. The impedance matching apparatus 3 calculates an input reflection coefficient ?i at the input terminal 3a corresponding to the information on the variable values of the variable capacitors VC1, VC2, based on the forward wave voltage Vfo, the reflected wave voltage Vro and the T parameter.
    Type: Application
    Filed: October 31, 2005
    Publication date: July 13, 2006
    Applicant: DAIHEN Corporation
    Inventor: Daisuke Matsuno
  • Patent number: 6621372
    Abstract: In an impedance matching device having at least two stubs serially provided to a main coaxial tube so as to be separated from each other with a predetermined interval in a tube axial direction, each stub is composed of a variable capacity capacitor to be jointed to an inner conductor of the main coaxial tube, an electrically conductive capacitor cover to be jointed to an outer conductor of the main coaxial tube so as to cover a surrounding of the variable capacity capacitor, and a drive motor arranged on an outside of the capacitor cover so as to drive a movable side electrode of the variable capacity capacitor. The movable side electrode of the variable capacity capacitor is driven directly by the drive motor so that the impedance matching device is made to be compact and response of impedance matching to a fluctuation of a load impedance such as a behavior of a plasma load is improved, and the life is lengthened and degrees of freedom of installation is widened.
    Type: Grant
    Filed: February 27, 2002
    Date of Patent: September 16, 2003
    Assignee: Daihen Corporation
    Inventors: Kazuki Kondo, Daisuke Matsuno, Eiji Kaneko, Koji Itadani
  • Publication number: 20020163398
    Abstract: In an impedance matching device having at least two stubs serially provided to a main coaxial tube so as to be separated from each other with a predetermined interval in a tube axial direction, each stub is composed of a variable capacity capacitor to be jointed to an inner conductor of the main coaxial tube, an electrically conductive capacitor cover to be jointed to an outer conductor of the main coaxial tube so as to cover a surrounding of the variable capacity capacitor, and a drive motor arranged on an outside of the capacitor cover so as to drive a movable side electrode of the variable capacity capacitor. The movable side electrode of the variable capacity capacitor is driven directly by the drive motor so that the impedance matching device is made to be compact and response of impedance matching to a fluctuation of a load impedance such as a behavior of a plasma load is improved, and the life is lengthened and degrees of freedom of installation is widened.
    Type: Application
    Filed: February 27, 2002
    Publication date: November 7, 2002
    Applicant: Daihen Corporation
    Inventors: Kazuki Kondo, Daisuke Matsuno, Eiji Kaneko, Koji Itadani
  • Patent number: 5760544
    Abstract: The microwave generator with use of a magnetron comprises a microwave detector for detecting microwave output from the magnetron and a filament life diagnostic circuit for judging the life of filament of the magnetron by decreasing an input power to a filament of the magnetron from a normal state of the magnetron while monitoring the microwave output from the magnetron by the microwave detector, comparing the input power in the normal state of the magnetron with that just before the magnetron becomes unstable and judging the filament life based on the difference between the input power of the normal state and that just before the unstable state.
    Type: Grant
    Filed: February 20, 1997
    Date of Patent: June 2, 1998
    Assignee: Daihen Corporation
    Inventors: Michio Taniguchi, Hiroaki Oichi, Yoshiki Fukumoto, Daisuke Matsuno, Yoshinobu Kasai