Patents by Inventor Daisuke Terauchi

Daisuke Terauchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Charged particle beam equipment with magnification correction
    Patent number: 7649172
    Abstract: Charged particle beam equipment enables the simultaneous measurement and correction of magnification errors in both X and Y directions in one measurement without requiring the elimination of displacement, if any, in rotation direction between the direction of a periodic structure pattern of a sample having a known periodic structure and the X or Y direction on an electron image of the sample. The charged particle beam equipment of the invention enables the simultaneous measurement of magnification errors in the X and Y directions by FFT transformation and coordinate transformation of an electron image, even when there is a displacement in rotation direction between the direction of the periodic structural pattern and the X or Y direction on the electron image of the sample.
    Type: Grant
    Filed: May 16, 2007
    Date of Patent: January 19, 2010
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Masaru Ozawa, Hiromi Inada, Daisuke Terauchi, Hiroyuki Tanaka
  • Charged particle beam equipment
    Publication number: 20080067380
    Abstract: Charged particle beam equipment enables the simultaneous measurement and correction of magnification errors in both X and Y directions in one measurement without requiring the elimination of displacement, if any, in rotation direction between the direction of a periodic structure pattern of a sample having a known periodic structure and the X or Y direction on an electron image of the sample. The charged particle beam equipment of the invention enables the simultaneous measurement of magnification errors in the X and Y directions by FFT transformation and coordinate transformation of an electron image, even when there is a displacement in rotation direction between the direction of the periodic structural pattern and the X or Y direction on the electron image of the sample.
    Type: Application
    Filed: May 16, 2007
    Publication date: March 20, 2008
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Masaru Ozawa, Hiromi Inada, Daisuke Terauchi, Hiroyuki Tanaka