Patents by Inventor Daiyu Okafuji
Daiyu Okafuji has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11904521Abstract: A rectangular substrate is prepared by providing a starting rectangular substrate having front and back surfaces and four side surfaces as ground, and pressing a rotary polishing pad perpendicularly against one side surface under a constant pressure, and relatively moving the rotary polishing pad and the substrate parallel to the side surface, for thereby polishing the side surface of the substrate. In the imprint lithography, the rectangular substrate is capable of controlling compression and pattern shape at a high accuracy and thus transferring a complex pattern of fine feature size to a recipient.Type: GrantFiled: September 26, 2017Date of Patent: February 20, 2024Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Daiyu Okafuji, Hiroyuki Yamazaki, Masao Ando, Masaki Takeuchi
-
Patent number: 11757067Abstract: A synthetic quartz glass cavity member (1) is bonded to a substrate (6) having an optical device (7) mounted thereon such that the device may be accommodated in the cavity member. The cavity member (1) has an inside surface consisting of a top surface (2a) opposed to the device (7) and a side surface (3a). The top surface (2a) is a mirror surface and the side surface (3a) is a rough surface.Type: GrantFiled: July 15, 2022Date of Patent: September 12, 2023Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Harunobu Matsui, Daijitsu Harada, Daiyu Okafuji, Hiroyuki Yamazaki, Masaki Takeuchi
-
Publication number: 20220352427Abstract: A synthetic quartz glass cavity member (1) is bonded to a substrate (6) having an optical device (7) mounted thereon such that the device may be accommodated in the cavity member. The cavity member (1) has an inside surface consisting of a top surface (2a) opposed to the device (7) and a side surface (3a). The top surface (2a) is a mirror surface and the side surface (3a) is a rough surface.Type: ApplicationFiled: July 15, 2022Publication date: November 3, 2022Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Harunobu Matsui, Daijitsu Harada, Daiyu OKAFUJI, Hiroyuki YAMAZAKI, Masaki TAKEUCHI
-
Patent number: 11424389Abstract: A synthetic quartz glass cavity member (1) is bonded to a substrate (6) having an optical device (7) mounted thereon such that the device may be accommodated in the cavity member. The cavity member (1) has an inside surface consisting of a top surface (2a) opposed to the device (7) and a side surface (3a). The top surface (2a) is a mirror surface and the side surface (3a) is a rough surface.Type: GrantFiled: July 22, 2019Date of Patent: August 23, 2022Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Harunobu Matsui, Daijitsu Harada, Daiyu Okafuji, Hiroyuki Yamazaki, Masaki Takeuchi
-
Patent number: 11402751Abstract: In an imprint mold-forming synthetic quartz glass substrate (1) of rectangular shape having dimensions L1 and L2 with L1?L2, a circular region is delineated on the substrate back surface by a circle of radius R with L2?2R?10 mm. When approximation analysis is performed from the 1st to 8th term in the Zernike polynomials on the circular region, a coefficient of the 4th term is equal to or greater than ?(2R/100,000×1) ?m.Type: GrantFiled: September 24, 2020Date of Patent: August 2, 2022Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Hiroyuki Yamazaki, Masao Ando, Daiyu Okafuji, Masaki Takeuchi
-
Publication number: 20220088832Abstract: An imprint mold-forming substrate is manufactured by providing a starting imprint mold-forming substrate (1) having a patterned portion (2) and a non-patterned portion (5), providing a table (3) having a recess (4), bonding the substrate (1) to the table (3) such that the patterned portion (2) is received in the recess (4) of the table to define a space region (7) between the patterned portion (2) and the table (3) such that the patterned portion is not in direct contact with the table, and performing contour machining on the substrate (1) secured to the table (3).Type: ApplicationFiled: September 24, 2020Publication date: March 24, 2022Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Hiroyuki Yamazaki, Daiyu Okafuji, Masaki Takeuchi
-
Publication number: 20220091501Abstract: In an imprint mold-forming synthetic quartz glass substrate (1) of rectangular shape having dimensions L1 and L2 with L1?L2, a circular region is delineated on the substrate back surface by a circle of radius R with L2?2R?10 mm. When approximation analysis is performed from the 1st to 8th term in the Zernike polynomials on the circular region, a coefficient of the 4th term is equal to or greater than ?(2R/100,000×1) ?m.Type: ApplicationFiled: September 24, 2020Publication date: March 24, 2022Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Hiroyuki Yamazaki, Masao Ando, Daiyu Okafuji, Masaki Takeuchi
-
Publication number: 20200028031Abstract: A synthetic quartz glass cavity member (1) is bonded to a substrate (6) having an optical device (7) mounted thereon such that the device may be accommodated in the cavity member. The cavity member (1) has an inside surface consisting of a top surface (2a) opposed to the device (7) and a side surface (3a). The top surface (2a) is a mirror surface and the side surface (3a) is a rough surface.Type: ApplicationFiled: July 22, 2019Publication date: January 23, 2020Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Harunobu Matsui, Daijitsu Harada, Daiyu OKAFUJI, Hiroyuki YAMAZAKI, Masaki TAKEUCHI
-
Publication number: 20180079130Abstract: A rectangular substrate is prepared by providing a starting rectangular substrate having front and back surfaces and four side surfaces as ground, and pressing a rotary polishing pad perpendicularly against one side surface under a constant pressure, and relatively moving the rotary polishing pad and the substrate parallel to the side surface, for thereby polishing the side surface of the substrate. In the imprint lithography, the rectangular substrate is capable of controlling compression and pattern shape at a high accuracy and thus transferring a complex pattern of fine feature size to a recipient.Type: ApplicationFiled: September 26, 2017Publication date: March 22, 2018Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Daiyu Okafuji, Hiroyuki Yamazaki, Masao Ando, Masaki Takeuchi
-
Patent number: 9902037Abstract: An electronic grade glass substrate is provided with a recess, channel or step in one surface, and a first chamfer between the side surface of the recess, channel or step and the one surface. The side and bottom surfaces of the recess, channel or step are mirror finished, and the first chamfer is mirror finished.Type: GrantFiled: November 3, 2015Date of Patent: February 27, 2018Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Daiyu Okafuji, Hiroyuki Yamazaki, Masaki Takeuchi
-
Patent number: 9884448Abstract: A rectangular substrate is prepared by providing a starting rectangular substrate having front and back surfaces and four side surfaces as ground, and pressing a rotary polishing pad perpendicularly against one side surface under a constant pressure, and relatively moving the rotary polishing pad and the substrate parallel to the side surface, for thereby polishing the side surface of the substrate. In the imprint lithography, the rectangular substrate is capable of controlling compression and pattern shape at a high accuracy and thus transferring a complex pattern of fine feature size to a recipient.Type: GrantFiled: August 18, 2015Date of Patent: February 6, 2018Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Daiyu Okafuji, Hiroyuki Yamazaki, Masao Ando, Masaki Takeuchi
-
Patent number: 9505166Abstract: A rectangular substrate is used as a mold after it is provided with a topological pattern. The substrate has A-side and B-side opposed surfaces, the A-side surface being provided with the topological pattern. The A-side surface includes a central rectangular region of 1 to 50 mm by 1 to 50 mm having a flatness of up to 350 nm. Use of the mold-forming substrate prevents the occurrence of a pattern misalignment or pattern error between the step of forming a pattern on a mold-forming substrate and the transfer step. Transfer of a fine size and complex pattern is possible.Type: GrantFiled: October 31, 2013Date of Patent: November 29, 2016Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Daijitsu Harada, Daiyu Okafuji, Hiroyuki Yamazaki, Masaki Takeuchi
-
Publication number: 20160067843Abstract: An electronic grade glass substrate is provided with a recess, channel or step in one surface, and a first chamfer between the side surface of the recess, channel or step and the one surface. The side and bottom surfaces of the recess, channel or step are mirror finished, and the first chamfer is mirror finished.Type: ApplicationFiled: November 3, 2015Publication date: March 10, 2016Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Daiyu Okafuji, Hiroyuki Yamazaki, Masaki Takeuchi
-
Publication number: 20160052193Abstract: A rectangular substrate is prepared by providing a starting rectangular substrate having front and back surfaces and four side surfaces as ground, and pressing a rotary polishing pad perpendicularly against one side surface under a constant pressure, and relatively moving the rotary polishing pad and the substrate parallel to the side surface, for thereby polishing the side surface of the substrate. In the imprint lithography, the rectangular substrate is capable of controlling compression and pattern shape at a high accuracy and thus transferring a complex pattern of fine feature size to a recipient.Type: ApplicationFiled: August 18, 2015Publication date: February 25, 2016Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Daiyu Okafuji, Hiroyuki Yamazaki, Masao Ando, Masaki Takeuchi
-
Patent number: 9205528Abstract: An electronic grade glass substrate is provided with a recess, channel or step in one surface, and a first chamfer between the side surface of the recess, channel or step and the one surface. The side and bottom surfaces of the recess, channel or step are mirror finished, and the first chamfer is mirror finished.Type: GrantFiled: October 24, 2012Date of Patent: December 8, 2015Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Daiyu Okafuji, Hiroyuki Yamazaki, Masaki Takeuchi
-
Patent number: 9017143Abstract: An electronic grade synthetic quartz glass substrate is manufactured by machining a synthetic quartz glass substrate to form a recess, channel or step and polishing the bottom and side surfaces of the recess, channel or step to mirror finish by a working portion of a rotary polishing tool while keeping the working portion in contact with the bottom and side surfaces under independent constant pressures.Type: GrantFiled: June 28, 2011Date of Patent: April 28, 2015Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Daiyu Okafuji, Masaki Takeuchi, Hiroyuki Yamazaki
-
Patent number: 9017144Abstract: An electronic grade synthetic quartz glass substrate having a recess, channel or step is manufactured by machining at least one surface of a synthetic quartz glass substrate having a maximum birefringence of up to 3 nm/cm in its entirety to form a recess, channel or step, and removing the residual stress due to machining.Type: GrantFiled: June 28, 2011Date of Patent: April 28, 2015Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Daiyu Okafuji, Masaki Takeuchi, Hiroyuki Yamazaki
-
Publication number: 20140120198Abstract: A rectangular substrate is used as a mold after it is provided with a topological pattern. The substrate has A-side and B-side opposed surfaces, the A-side surface being provided with the topological pattern. The A-side surface includes a central rectangular region of 1 to 50 mm by 1 to 50 mm having a flatness of up to 350 nm. Use of the mold-forming substrate prevents the occurrence of a pattern misalignment or pattern error between the step of forming a pattern on a mold-forming substrate and the transfer step. Transfer of a fine size and complex pattern is possible.Type: ApplicationFiled: October 31, 2013Publication date: May 1, 2014Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Daijitsu HARADA, Daiyu OKAFUJI, Hiroyuki YAMAZAKI, Masaki TAKEUCHI
-
Publication number: 20110318996Abstract: An electronic grade synthetic quartz glass substrate having a recess, channel or step is manufactured by machining at least one surface of a synthetic quartz glass substrate having a maximum birefringence of up to 3 nm/cm in its entirety to form a recess, channel or step, and removing the residual stress due to machining.Type: ApplicationFiled: June 28, 2011Publication date: December 29, 2011Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Daiyu Okafuji, Masaki Takeuchi, Hiroyuki Yamazaki
-
Publication number: 20110318995Abstract: An electronic grade synthetic quartz glass substrate is manufactured by machining a synthetic quartz glass substrate to form a recess, channel or step and polishing the bottom and side surfaces of the recess, channel or step to mirror finish by a working portion of a rotary polishing tool while keeping the working portion in contact with the bottom and side surfaces under independent constant pressures.Type: ApplicationFiled: June 28, 2011Publication date: December 29, 2011Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Daiyu Okafuji, Masaki Takeuchi, Hiroyuki Yamazaki