Patents by Inventor Dajana Cujas

Dajana Cujas has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Scanning particle microscope and method for determining a position change of a particle beam of the scanning particle microscope
    Patent number: 9336983
    Abstract: The invention refers to a scanning particle microscope comprising: (a) at least one reference object which is fixedly arranged at an output of the scanning particle microscope for a particle beam so that the reference object can at least partially be imaged by use of the electron beam; (b) at least one scanning unit operable to scan a particle beam of the scanning particle microscope across at least one portion of the reference object; and (c) at least one setting unit operable to change at least one setting of the scanning particle microscope.
    Type: Grant
    Filed: June 30, 2015
    Date of Patent: May 10, 2016
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Michael Budach, Christof Baur, Dajana Cujas, Robert Heberlein, Marion Batz
  • SCANNING PARTICLE MICROSCOPE AND METHOD FOR DETERMINING A POSITION CHANGE OF A PARTICLE BEAM OF THE SCANNING PARTICLE MICROSCOPE
    Publication number: 20150380210
    Abstract: The invention refers to a scanning particle microscope comprising: (a) at least one reference object which is fixedly arranged at an output of the scanning particle microscope for a particle beam so that the reference object can at least partially be imaged by use of the electron beam; (b) at least one scanning unit operable to scan a particle beam of the scanning particle microscope across at least one portion of the reference object; and (c) at least one setting unit operable to change at least one setting of the scanning particle microscope.
    Type: Application
    Filed: June 30, 2015
    Publication date: December 31, 2015
    Inventors: Michael Budach, Christof Baur, Dajana Cujas, Robert Heberlein
  • METHOD AND APPARATUS FOR PROTECTING A SUBSTRATE DURING PROCESSING BY A PARTICLE BEAM
    Publication number: 20140255831
    Abstract: The invention refers to a method and apparatus for protecting a substrate during a processing by at least one particle beam. The method comprises the following steps: (a) applying a locally restrict limited protection layer on the substrate; (b) etching the substrate and/or a layer arranged on the substrate by use of the at least one particle beam and at least one gas; and/or (c) depositing material onto the substrate by use of the at least one particle beam and at least one precursor gas; and (d) removing the locally limited protection layer from the substrate.
    Type: Application
    Filed: March 7, 2014
    Publication date: September 11, 2014
    Inventors: Thorsten Hofmann, Tristan Bret, Petra Spies, Nicole Auth, Michael Budach, Dajana Cujas