Patents by Inventor Dan Kapp

Dan Kapp has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Determining a configuration for an optical element positioned in a collection aperture during wafer inspection
    Patent number: 10215713
    Abstract: Methods and systems for determining a configuration for an optical element positioned in a collection aperture during wafer inspection are provided. One system includes a detector configured to detect light from a wafer that passes through an optical element, which includes a set of collection apertures, when the optical element has different configurations thereby generating different images for the different configurations. The system also includes a computer subsystem configured for constructing additional image(s) from two or more of the different images, and the two or more different images used to generate any one of the additional image(s) do not include only different images generated for single collection apertures in the set. The computer subsystem is further configured for selecting one of the different or additional configurations for the optical element based on the different images and the additional image(s).
    Type: Grant
    Filed: June 18, 2017
    Date of Patent: February 26, 2019
    Assignee: KLA-Tencor Corp.
    Inventors: Pavel Kolchin, Mikhail Haurylau, Junwei Wei, Dan Kapp, Robert Danen, Grace Chen
  • Determining a Configuration for an Optical Element Positioned in a Collection Aperture During Wafer Inspection
    Publication number: 20170292918
    Abstract: Methods and systems for determining a configuration for an optical element positioned in a collection aperture during wafer inspection are provided. One system includes a detector configured to detect light from a wafer that passes through an optical element, which includes a set of collection apertures, when the optical element has different configurations thereby generating different images for the different configurations. The system also includes a computer subsystem configured for constructing additional image(s) from two or more of the different images, and the two or more different images used to generate any one of the additional image(s) do not include only different images generated for single collection apertures in the set. The computer subsystem is further configured for selecting one of the different or additional configurations for the optical element based on the different images and the additional image(s).
    Type: Application
    Filed: June 18, 2017
    Publication date: October 12, 2017
    Inventors: Pavel Kolchin, Mikhail Haurylau, Junwei Wei, Dan Kapp, Robert Danen, Grace Chen
  • Determining a configuration for an optical element positioned in a collection aperture during wafer inspection
    Patent number: 9709510
    Abstract: Methods and systems for determining a configuration for an optical element positioned in a collection aperture during wafer inspection are provided. One system includes a detector configured to detect light from a wafer that passes through an optical element, which includes a set of collection apertures, when the optical element has different configurations thereby generating different images for the different configurations. The system also includes a computer subsystem configured for constructing additional image(s) from two or more of the different images, and the two or more different images used to generate any one of the additional image(s) do not include only different images generated for single collection apertures in the set. The computer subsystem is further configured for selecting one of the different or additional configurations for the optical element based on the different images and the additional image(s).
    Type: Grant
    Filed: June 24, 2015
    Date of Patent: July 18, 2017
    Assignee: KLA-Tencor Corp.
    Inventors: Pavel Kolchin, Mikhail Haurylau, Junwei Wei, Dan Kapp, Robert Danen, Grace Chen
  • Determining a Configuration for an Optical Element Positioned in a Collection Aperture During Wafer Inspection
    Publication number: 20150377797
    Abstract: Methods and systems for determining a configuration for an optical element positioned in a collection aperture during wafer inspection are provided. One system includes a detector configured to detect light from a wafer that passes through an optical element, which includes a set of collection apertures, when the optical element has different configurations thereby generating different images for the different configurations. The system also includes a computer subsystem configured for constructing additional image(s) from two or more of the different images, and the two or more different images used to generate any one of the additional image(s) do not include only different images generated for single collection apertures in the set. The computer subsystem is further configured for selecting one of the different or additional configurations for the optical element based on the different images and the additional image(s).
    Type: Application
    Filed: June 24, 2015
    Publication date: December 31, 2015
    Inventors: Pavel Kolchin, Mikhail Haurylau, Junwei Wei, Dan Kapp, Robert Danen, Grace Chen