Abstract: A method for making a perpendicular magnetic recording disk includes forming a template layer below a Ru or Ru alloy underlayer, with a granular Co alloy recording layer formed on the underlayer. The template layer is formed by depositing a solution of a polymer with a functional end group and nanoparticles, allowing the solution to dry, annealing the polymer layer to thereby form a polymer layer with embedded spaced-apart nanoparticles, and then etching the polymer layer to a depth sufficient to partially expose the nanoparticles so they protrude above the surface of the polymer layer. The protruding nanoparticles serve as controlled nucleation sites for the Ru or Ru alloy atoms. The nanoparticle-to-nanoparticle distances can be controlled during the formation of the template layer. This enables control of the Co alloy grain diameter distribution as well as grain-to-grain distance distribution.

Abstract: A method for making a perpendicular magnetic recording disk includes forming a template layer below a Ru or Ru alloy underlayer, with a granular Co alloy recording layer formed on the underlayer. The template layer is formed by depositing a solution of a polymer with a functional end group and nanoparticles, allowing the solution to dry, annealing the polymer layer to thereby form a polymer layer with embedded spaced-apart nanoparticles, and then etching the polymer layer to a depth sufficient to partially expose the nanoparticles so they protrude above the surface of the polymer layer. The protruding nanoparticles serve as controlled nucleation sites for the Ru or Ru alloy atoms. The nanoparticle-to-nanoparticle distances can be controlled during the formation of the template layer. This enables control of the Co alloy grain diameter distribution as well as grain-to-grain distance distribution.

Abstract: A method for making a patterned-media magnetic recording disk using nanoimprint lithography (NIL) enlarges the size of the imprint resist features after the imprint resist has been patterned by NIL. The layer of imprint resist material is deposited on a disk blank, which may have the magnetic layer already deposited on it. The imprint resist layer is patterned by NIL, resulting in a plurality of spaced-apart resist pillars with sloped sidewalls from the top to the base. An overlayer of a material like a fluorocarbon polymer is deposited over the patterned resist layer, including over the sloped resist pillar sidewalls. This enlarges the lateral dimension of the resist pillars. The overlayer is then etched to leave the overlayer on the sloped resist pillar sidewalls while exposing the disk blank in the spaces between the resist pillars.

Abstract: A patterned perpendicular magnetic recording disk with discrete data islands of recording layer (RL) material includes a substrate, a patterned exchange bridge layer of magnetic material between the substrate and the islands, and an optional exchange-coupling control layer (CCL) between the exchange bridge layer and the islands. The exchange bridge layer has patterned pedestals below the islands. The exchange bridge layer controls exchange interactions between the RLs in adjacent islands to compensate the dipolar fields between islands, and the pedestals concentrate the flux from the write head. The disk may include a soft underlayer (SUL) of soft magnetically permeable material on the substrate and a nonmagnetic exchange break layer (EBL) on the SUL between the SUL and the exchange bridge layer. In a thermally-assisted recording (TAR) disk a heat sink layer may be located below the exchange bridge layer and the SUL may be optional.

Abstract: A pattern clean-up for fabrication of patterned media using a forced assembly of molecules is disclosed. E-beam lithography is initially used to write the initial patterned bit media structures, which have size and positioning errors. Nano-sized protein molecules are then forced to assemble of on top of the bits. The protein molecules have a very uniform size distribution and assemble into a lattice structure above the e-beam patterned areas. The protein molecules reduce the size and position errors in e-beam patterned structures. This process cleans the signal from the e-beam lithography and lowers the noise in the magnetic reading and writing. This process may be used to fabricate patterned bit media directly on hard disk, or to create a nano-imprint master for mass production of patterned bit media disks.

Abstract: A method for planarizing a magnetic recording disk that has surface features of elevated lands and recessed grooves includes forming two coatings of cured perfluorinated polyether (PFPE) polymers over the surface features. The disk may have a protective carbon overcoat with a surface that replicates the topography of lands and grooves. A liquid functionalized-PFPE is applied over the disk surface and then cured to form a first coating with the functionalized end groups bonding to the carbon overcoat. A liquid non-functionalized-PFPE polymer is then applied over the functionalized-PFPE coating and cured to form a second coating. The combined coatings substantially planarize the disk surface so that there is minimal recession between the top of the coating over the lands and the top of the coating over the grooves.

Abstract: A method for making a patterned-media magnetic recording disk using nanoimprint lithography (NIL) enlarges the size of the imprint resist features after the imprint resist has been patterned by NIL. The layer of imprint resist material is deposited on a disk blank, which may have the magnetic layer already deposited on it. The imprint resist layer is patterned by NIL, resulting in a plurality of spaced-apart resist pillars with sloped sidewalls from the top to the base. An overlayer of a material like a fluorocarbon polymer is deposited over the patterned resist layer, including over the sloped resist pillar sidewalls. This enlarges the lateral dimension of the resist pillars. The overlayer is then etched to leave the overlayer on the sloped resist pillar sidewalls while exposing the disk blank in the spaces between the resist pillars.

Abstract: A patterned perpendicular magnetic recording disk with discrete data islands of recording layer (RL) material includes a substrate, a patterned exchange bridge layer of magnetic material between the substrate and the islands, and an optional exchange-coupling control layer (CCL) between the exchange bridge layer and the islands. The exchange bridge layer has patterned pedestals below the islands. The exchange bridge layer controls exchange interactions between the RLs in adjacent islands to compensate the dipolar fields between islands, and the pedestals concentrate the flux from the write head. The disk may include a soft underlayer (SUL) of soft magnetically permeable material on the substrate and a nonmagnetic exchange break layer (EBL) on the SUL between the SUL and the exchange bridge layer. In a thermally-assisted recording (TAR) disk a heat sink layer may be located below the exchange bridge layer and the SUL may be optional.

Abstract: A pattern clean-up for fabrication of patterned media using a forced assembly of molecules is disclosed. E-beam lithography is initially used to write the initial patterned bit media structures, which have size and positioning errors. Nano-sized protein molecules are then forced to assemble of on top of the bits. The protein molecules have a very uniform size distribution and assemble into a lattice structure above the e-beam patterned areas. The protein molecules reduce the size and position errors in e-beam patterned structures. This process cleans the signal from the e-beam lithography and lowers the noise in the magnetic reading and writing. This process may be used to fabricate patterned bit media directly on hard disk, or to create a nano-imprint master for mass production of patterned bit media disks.

Abstract: A pattern clean-up for fabrication of patterned media using a forced assembly of molecules is disclosed. E-beam lithography is initially used to write the initial patterned bit media structures, which have size and positioning errors. Nano-sized protein molecules are then forced to assemble of on top of the bits. The protein molecules have a very uniform size distribution and assemble into a lattice structure above the e-beam patterned areas. The protein molecules reduce the size and position errors in e-beam patterned structures. This process cleans the signal from the e-beam lithography and lowers the noise in the magnetic reading and writing. This process may be used to fabricate patterned bit media directly on hard disk, or to create a nano-imprint master for mass production of patterned bit media disks.

Abstract: A method for planarizing media disk surfaces with a polymer solution is disclosed. A non-functionalized lubricant is used to coat the disk surfaces without dewetting issues. The polymer is applied via soaking in a diluted solution for several minutes. The interaction of the polymer with the disk surface leads to preferential adsorption of lubricant into the valleys of the topography on the disk surface.

Abstract: A method for planarizing a magnetic recording disk that has surface features of elevated lands and recessed grooves includes forming two coatings of cured perfluorinated polyether (PFPE) polymers over the surface features. The disk may have a protective carbon overcoat with a surface that replicates the topography of lands and grooves. A liquid functionalized-PFPE is applied over the disk surface and then cured to form a first coating with the functionalized end groups bonding to the carbon overcoat. A liquid non-functionalized-PFPE polymer is then applied over the functionalized-PFPE coating and cured to form a second coating. The combined coatings substantially planarize the disk surface so that there is minimal recession between the top of the coating over the lands and the top of the coating over the grooves.

Abstract: A pattern clean-up for fabrication of patterned media using a forced assembly of molecules is disclosed. E-beam lithography is initially used to write the initial patterned bit media structures, which have size and positioning errors. Nano-sized protein molecules are then forced to assemble of on top of the bits. The protein molecules have a very uniform size distribution and assemble into a lattice structure above the e-beam patterned areas. The protein molecules reduce the size and position errors in e-beam patterned structures. This process cleans the signal from the e-beam lithography and lowers the noise in the magnetic reading and writing. This process may be used to fabricate patterned bit media directly on hard disk, or to create a nano-imprint master for mass production of patterned bit media disks.

Abstract: A perpendicular write pole having dual gap layers is disclosed. An outer gap layer, resistant to etching and corrosion in alkaline solutions protects the inner gap layer during photo resist development. An inner gap layer, resistant to acid etch conditions, protects the magnetic pole materials during removal of portions of the outer gap layer prior to electroplating of the pole to form the flare point.