Patents by Inventor Daniel B. Doran

Daniel B. Doran has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Automated washing system and method
    Patent number: 6039057
    Abstract: A system and a method for washing objects, such as cassettes and carriers used to hold and transport silicon wafers during manufacture of semiconductor chips. The method employs the steps of exposing to ultraviolet radiation the objects in a process chamber, spraying of developer fluid onto the objects, rinsing the objects, spraying of surfactant solution on the objects, rinsing the objects and drying the objects using heated, ionized ULPA filtered air. Apparatus for accomplishing the above is disclosed.
    Type: Grant
    Filed: September 2, 1999
    Date of Patent: March 21, 2000
    Assignee: Hyundai Electronics America
    Inventor: Daniel B. Doran
  • Automated washing method
    Patent number: 6017397
    Abstract: A system and a method for washing objects, such as cassettes and carriers used to hold and transport silicon wafers during manufacture of semiconductor chips. The method employs the steps of exposing to ultraviolet radiation the objects in a process chamber, spraying of developer fluid onto the objects, rinsing the objects, spraying of surfactant solution on the objects, rinsing the objects and drying the objects using heated, ionized ULPA filtered air. Apparatus for accomplishing the above is disclosed.
    Type: Grant
    Filed: March 5, 1993
    Date of Patent: January 25, 2000
    Assignee: Hyundai Eletronics America
    Inventor: Daniel B. Doran
  • Method and apparatus for chemical mechanical polishing
    Patent number: 5888120
    Abstract: A method and apparatus provides a method for polishing a surface of a substrate with a polishing pad. The surface of the substrate is polished using the polishing pad. The surface of the substrate is deformed in response to changes in the polishing pad, wherein deformation of the surface of the substrate increases uniformity in polishing of the surface of the substrate.
    Type: Grant
    Filed: September 29, 1997
    Date of Patent: March 30, 1999
    Assignee: LSI Logic Corporation
    Inventor: Daniel B. Doran