Abstract: An apparatus for generating extreme ultra-violet (EUV) light, including a drive laser arranged to produce a laser pulse, a vacuum chamber, a set of focusing optics arranged to focus the laser pulse produced by the drive laser onto a target spot within the vacuum chamber, a target material generator arranged to deliver a series of droplets of a target material to the target spot by modulating a flow velocity of a supply of the target material through a nozzle tip and thereby inducing a formation process of the series of droplets which series of droplets from the nozzle tip are expelled through a triple point chamber, and a set of collector optics arranged to focus a quantity of EUV light generated when a droplet of the series of drople of the target material is exposed to the laser pulse at the target spot onto an intermediate focus spot.

Abstract: An apparatus for generating extreme ultra-violet (EUV) light for use in a lithography inspection tool, comprising a drive laser arranged to produce a laser pulse, a vacuum chamber, a set of focusing optics arranged to focus the laser pulse produced by the drive laser onto a target spot within the vacuum chamber with a beam target diameter of less than 100 ?m, a target material generator arranged to deliver an amount of a target material to the target spot within the vacuum chamber, and a set of collector optics arranged to focus a quantity of EUV light generated when the amount of the target material is exposed to the laser pulse at the target spot onto an intermediate focus spot.