Patents by Inventor Daniel Edward Carlsen

Daniel Edward Carlsen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Ultra High Purity Conditions for Atomic Scale Processing
    Publication number: 20230230802
    Abstract: An apparatus for atomic scale processing is provided. The apparatus may include a reactor and an inductively coupled plasma source. The reactor may have inner and outer surfaces such that a portion of the inner surfaces define an internal volume of the reactor. The internal volume of the reactor may contain a fixture assembly to support a substrate wherein the partial pressure of each background impurity within the internal volume may be below 10?6 Torr to reduce the role of said impurities in surface reactions during atomic scale processing.
    Type: Application
    Filed: March 6, 2023
    Publication date: July 20, 2023
    Inventors: Gilbert Bruce Rayner, JR., Noel Christopher O'Toole, Daniel Edward Carlsen
  • Ultra high purity conditions for atomic scale processing
    Patent number: 11631571
    Abstract: An apparatus for atomic scale processing is provided. The apparatus may include a reactor (100) and an inductively coupled plasma source (10). The reactor may have inner (154) and outer surfaces (152) such that a portion of the inner surfaces define an internal volume (156) of the reactor. The internal volume of the reactor may contain a fixture assembly (158) to support a substrate (118) wherein the partial pressure of each background impurity within the internal volume may be below 10?6 Torr to reduce the role of said impurities in surface reactions during atomic scale processing.
    Type: Grant
    Filed: August 11, 2020
    Date of Patent: April 18, 2023
    Assignee: Kurt J. Lesker Company
    Inventors: Gilbert Bruce Rayner, Jr., Noel Christopher O'Toole, Daniel Edward Carlsen
  • Ultra High Purity Conditions for Atomic Scale Processing
    Publication number: 20210313145
    Abstract: An apparatus for atomic scale processing is provided. The apparatus may include a reactor (100) and an inductively coupled plasma source (10). The reactor may have inner (154) and outer surfaces (152) such that a portion of the inner surfaces define an internal volume (156) of the reactor. The internal volume of the reactor may contain a fixture assembly (158) to support a substrate (118) wherein the partial pressure of each background impurity within the internal volume may be below 10?6 Torr to reduce the role of said impurities in surface reactions during atomic scale processing.
    Type: Application
    Filed: August 11, 2020
    Publication date: October 7, 2021
    Inventors: Gilbert Bruce Rayner, Jr., Noel Christopher O'Toole, Daniel Edward Carlsen
  • Compound Motion Vacuum Environment Deposition Source Shutter Mechanism
    Publication number: 20210140035
    Abstract: A shutter mechanism for a deposition source includes: an actuator; a shutter operatively connected to the actuator; and a linkage arrangement that operatively connects the shutter to the actuator, where the linkage arrangement is configured to move the shutter in a compound motion relative to the actuator between an open position and a closed position.
    Type: Application
    Filed: November 3, 2020
    Publication date: May 13, 2021
    Inventors: David Manko, Daniel Edward Carlsen, Michael Paul Bendis