Patents by Inventor Daniel Francis GLOSTER

Daniel Francis GLOSTER has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9260616
    Abstract: Gloss-controllable, radiation-curable inkjet inks cure quickly with minimal radiation exposure, enabling high-printing speed and low surface heating with controllable gloss on the printed image. Ink gloss can be controlled by varying the pinning energy to create the printed images with varied gloss from 10 to 100 gloss unit at 85° gloss measurement angle. After curing, the ink remains flexible on the surface, giving excellent performance on a wide range of surfaces, greatly expanding the range of applications for the ink. A gloss-controllable, radiation-curable inkjet ink may include approximately 8-18% of photo-initiators responding to UVA and UVV (UVA: 320-400 nm wavelengths, UVV: 400-450 nm wavelengths) radiation to initiate free radicals and optionally, other types of photo-initiators and approximately 60-85% of highly flexible mono-functional monomers.
    Type: Grant
    Filed: February 29, 2012
    Date of Patent: February 16, 2016
    Assignee: ELECTRONICS FOR IMAGING, INC.
    Inventors: Lianhui Cong, Daniel Francis Gloster, Paul Andrew Edwards
  • Publication number: 20130222499
    Abstract: Gloss-controllable, radiation-curable inkjet inks cure quickly with minimal radiation exposure, enabling high-printing speed and low surface heating with controllable gloss on the printed image. Ink gloss can be controlled by varying the pinning energy to create the printed images with varied gloss from 10 to 100 gloss unit at 85° gloss measurement angle. After curing, the ink remains flexible on the surface, giving excellent performance on a wide range of surfaces, greatly expanding the range of applications for the ink. A gloss-controllable, radiation-curable inkjet ink may include approximately 8-18% of photo-initiators responding to UVA and UW (UVA: 320-400 nm wavelengths, UW: 400-450 nm wavelengths) radiation to initiate free radicals and optionally, other types of photo-initiators and approximately 60-85% of highly flexible mono-functional monomers.
    Type: Application
    Filed: February 29, 2012
    Publication date: August 29, 2013
    Inventors: Lianhui CONG, Daniel Francis GLOSTER, Paul Andrew EDWARDS