Patents by Inventor Daniel G. Stearns
Daniel G. Stearns has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20100262019Abstract: A method of investigating the location and size of a light-emitting source in a subject is disclosed. In practicing the method, one first obtains a light intensity profile by measuring, from a first perspective with a photodetector device, photons which (i) originate from the light-emitting source, (ii) travel through turbid biological tissue of the subject, and (iii) are emitted from a first surface region of interest of the subject. The light-intensity profile is matched against with a parameter-based biophotonic function, to estimate function parameters such as depth and size. The parameters so determined are refined using data other than the first measured light intensity profile, to obtain an approximate depth and size of the source in the subject. Also disclosed is an apparatus for carrying out the method.Type: ApplicationFiled: June 24, 2010Publication date: October 14, 2010Applicant: XENOGEN CORPORATIONInventors: Bradley W. Rice, Daniel G. Stearns, Tamara L. Troy
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Patent number: 7764986Abstract: A method of investigating the location and size of a light-emitting source in a subject is disclosed. In practicing the method, one first obtains a light intensity profile by measuring, from a first perspective with a photodetector device, photons which (i) originate from the light-emitting source, (ii) travel through turbid biological tissue of the subject, and (iii) are emitted from a first surface region of interest of the subject. The light-intensity profile is matched against with a parameter-based biophotonic function, to estimate function parameters such as depth and size. The parameters so determined are refined using data other than the first measured light intensity profile, to obtain an approximate depth and size of the source in the subject. Also disclosed is an apparatus for carrying out the method.Type: GrantFiled: July 29, 2007Date of Patent: July 27, 2010Assignee: Xenogen CorporationInventors: Bradley W. Rice, Daniel G. Stearns, Tamara L. Troy
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Publication number: 20100022872Abstract: The present invention provides systems and methods for obtaining a three-dimensional (3D) representation of one or more light sources inside a sample, such as a mammal. Mammalian tissue is a turbid medium, meaning that photons are both absorbed and scattered as they propagate through tissue. In the case where scattering is large compared with absorption, such as red to near-infrared light passing through tissue, the transport of light within the sample is described by diffusion theory. Using imaging data and computer-implemented photon diffusion models, embodiments of the present invention produce a 3D representation of the light sources inside a sample, such as a 3D location, size, and brightness of such light sources.Type: ApplicationFiled: September 29, 2009Publication date: January 28, 2010Applicant: XENOGEN CORPORATIONInventors: Daniel G. STEARNS, Bradley W. RICE, Michael D. CABLE
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Patent number: 7616985Abstract: The present invention provides systems and methods for obtaining a three-dimensional (3D) representation of one or more light sources inside a sample, such as a mammal. Mammalian tissue is a turbid medium, meaning that photons are both absorbed and scattered as they propagate through tissue. In the case where scattering is large compared with absorption, such as red to near-infrared light passing through tissue, the transport of light within the sample is described by diffusion theory. Using imaging data and computer-implemented photon diffusion models, embodiments of the present invention produce a 3D representation of the light sources inside a sample, such as a 3D location, size, and brightness of such light sources.Type: GrantFiled: June 25, 2003Date of Patent: November 10, 2009Assignee: Xenogen CorporationInventors: Daniel G. Stearns, Bradley W. Rice, Michael D. Cable
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Patent number: 7603167Abstract: The present invention provides systems and methods for obtaining a three-dimensional (3D) representation of one or more light sources inside a sample, such as a mammal. Mammalian tissue is a turbid medium, meaning that photons are both absorbed and scattered as they propagate through tissue. In the case where scattering is large compared with absorption, such as red to near-infrared light passing through tissue, the transport of light within the sample is described by diffusion theory. Using imaging data and computer-implemented photon diffusion models, embodiments of the present invention produce a 3D representation of the light sources inside a sample, such as a 3D location, size, and brightness of such light sources.Type: GrantFiled: July 29, 2007Date of Patent: October 13, 2009Assignee: Xenogen CorporationInventors: Daniel G. Stearns, Bradley W. Rice, Michael D. Cable
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Patent number: 7599731Abstract: Described herein are systems and methods for obtaining a three-dimensional (3D) representation of the distribution of fluorescent probes inside a sample, such as a mammal. Using a) fluorescent light emission data from one or more images, b) a surface representation of the mammal, and c) computer-implemented photon propagation models, the systems and methods produce a 3D representation of the fluorescent probe distribution in the mammal. The distribution may indicate—in 3D—the location, size, and/or brightness or concentration of one or more fluorescent probes in the mammal.Type: GrantFiled: April 10, 2007Date of Patent: October 6, 2009Assignee: Xenogen CorporationInventors: Bradley W. Rice, Chaincy Kuo, Daniel G. Stearns, Heng Xu
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Patent number: 7555332Abstract: Described herein are systems and methods for obtaining a three-dimensional (3D) representation of the distribution of fluorescent probes inside a sample, such as a mammal. Using a) fluorescent light emission data from one or more images, b) a surface representation of the mammal, and c) computer-implemented photon propagation models, the systems and methods produce a 3D representation of the fluorescent probe distribution in the mammal. The distribution may indicate—in 3D—the location, size, and/or brightness or concentration of one or more fluorescent probes in the mammal.Type: GrantFiled: July 29, 2007Date of Patent: June 30, 2009Assignee: Xenogen CorporationInventors: Bradley W. Rice, Chaincy Kuo, Daniel G. Stearns, Heng Xu
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Patent number: 7403812Abstract: A method of investigating the location and size of a light-emitting source in a subject is disclosed. In practicing the method, one first obtains a light intensity profile by measuring, from a first perspective with a photodetector device, photons which (i) originate from the light-emitting source, (ii) travel through turbid biological tissue of the subject, and (iii) are emitted from a first surface region of interest of the subject. The light-intensity profile is matched against with a parameter-based biophotonic function, to estimate function parameters such as depth and size. The parameters so determined are refined using data other than the first measured light intensity profile, to obtain an approximate depth and size of the source in the subject. Also disclosed is an apparatus for carrying out the method.Type: GrantFiled: May 17, 2002Date of Patent: July 22, 2008Assignee: Xenogen CorporationInventors: Bradley W. Rice, Daniel G. Stearns, Tamara L. Troy
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Patent number: 7049033Abstract: Absorber material used in conventional EUVL reticles is eliminated by introducing a direct modulation in the complex-valued reflectance of the multilayer. A spatially localized energy source such as a focused electron or ion beam directly writes a reticle pattern onto the reflective multilayer coating. Interdiffusion is activated within the film by an energy source that causes the multilayer period to contract in the exposed regions. The contraction is accurately determined by the energy dose. A controllable variation in the phase and amplitude of the reflected field in the reticle plane is produced by the spatial modulation of the multilayer period. This method for patterning an EUVL reticle has the advantages (1) avoiding the process steps associated with depositing and patterning an absorber layer and (2) providing control of the phase and amplitude of the reflected field with high spatial resolution.Type: GrantFiled: July 31, 2003Date of Patent: May 23, 2006Assignee: The EUV LLCInventors: Daniel G. Stearns, Donald W. Sweeney, Paul B. Mirkarimi
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Patent number: 7022435Abstract: A method for fabricating an EUV phase shift mask is provided that includes a substrate upon which is deposited a thin film multilayer coating that has a complex-valued reflectance. An absorber layer or a buffer layer is attached onto the thin film multilayer, and the thickness of the thin film multilayer coating is altered to introduce a direct modulation in the complex-valued reflectance to produce phase shifting features.Type: GrantFiled: September 27, 2002Date of Patent: April 4, 2006Assignee: EUV Limited Liability CorporationInventors: Daniel G. Stearns, Donald W. Sweeney, Paul B. Mirkarimi, Anton Barty
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Patent number: 6967168Abstract: A method and apparatus are provided for the repair of an amplitude defect in a multilayer coating. A significant number of layers underneath the amplitude defect are undamaged. The repair technique restores the local reflectivity of the coating by physically removing the defect and leaving a wide, shallow crater that exposes the underlying intact layers. The particle, pit or scratch is first removed the remaining damaged region is etched away without disturbing the intact underlying layers.Type: GrantFiled: June 29, 2001Date of Patent: November 22, 2005Assignee: The EUV Limited Liability CorporationInventors: Daniel G. Stearns, Donald W. Sweeney, Paul B. Mirkarimi, Henry N. Chapman
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Patent number: 6821682Abstract: A method is provided for repairing defects in a multilayer coating layered onto a reticle blank used in an extreme ultraviolet lithography (EUVL) system. Using high lateral spatial resolution, energy is deposited in the multilayer coating in the vicinity of the defect. This can be accomplished using a focused electron beam, focused ion beam or a focused electromagnetic radiation. The absorbed energy will cause a structural modification of the film, producing a localized change in the film thickness. The change in film thickness can be controlled with sub-nanometer accuracy by adjusting the energy dose. The lateral spatial resolution of the thickness modification is controlled by the localization of the energy deposition. The film thickness is adjusted locally to correct the perturbation of the reflected field. For example, when the structural modification is a localized film contraction, the repair of a defect consists of flattening a mound or spreading out the sides of a depression.Type: GrantFiled: September 26, 2000Date of Patent: November 23, 2004Assignee: The EUV LLCInventors: Daniel G. Stearns, Donald W. Sweeney, Paul B. Mirkarimi
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Patent number: 6815129Abstract: A method for compensating for flare-induced critical dimensions (CD) changes in photolithography. Changes in the flare level results in undesirable CD changes. The method when used in extreme ultraviolet (EUV) lithography essentially eliminates the unwanted CD changes. The method is based on the recognition that the intrinsic level of flare for an EUV camera (the flare level for an isolated sub-resolution opaque dot in a bright field mask) is essentially constant over the image field. The method involves calculating the flare and its variation over the area of a patterned mask that will be imaged and then using mask biasing to largely eliminate the CD variations that the flare and its variations would otherwise cause. This method would be difficult to apply to optical or DUV lithography since the intrinsic flare for those lithographies is not constant over the image field.Type: GrantFiled: September 26, 2000Date of Patent: November 9, 2004Assignee: EUV LLCInventors: John E. Bjorkholm, Daniel G. Stearns, Eric M. Gullikson, Daniel A. Tichenor, Scott D. Hector
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Publication number: 20040142250Abstract: Absorber material used in conventional EUVL reticles is eliminated by introducing a direct modulation in the complex-valued reflectance of the multilayer. A spatially localized energy source such as a focused electron or ion beam directly writes a reticle pattern onto the reflective multilayer coating. Interdiffusion is activated within the film by an energy source that causes the multilayer period to contract in the exposed regions. The contraction is accurately determined by the energy dose. A controllable variation in the phase and amplitude of the reflected field in the reticle plane is produced by the spatial modulation of the multilayer period. This method for patterning an EUVL reticle has the advantages of (1) avoiding the process steps associated with depositing and patterning an absorber layer and (2) providing control of the phase and amplitude of the reflected field with high spatial resolution.Type: ApplicationFiled: July 31, 2003Publication date: July 22, 2004Applicant: The Regents of the University of CaliforniaInventors: Daniel G. Stearns, Donald W. Sweeney, Paul B. Mirkarimi
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Publication number: 20040062999Abstract: A method for fabricating an EUV phase shift mask is provided that includes a substrate upon which is deposited a thin film multilayer coating that has a complex-valued reflectance. An absorber layer or a buffer layer is attached onto the thin film multilayer, and the thickness of the thin film multilayer coating is altered to introduce a direct modulation in the complex-valued reflectance to produce phase shifting features.Type: ApplicationFiled: September 27, 2002Publication date: April 1, 2004Applicant: The Regents of the University of CaliforniaInventors: Daniel G. Stearns, Donald W. Sweeney, Paul B. Mirkarimi, Anton Barty
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Publication number: 20040021771Abstract: The present invention provides systems and methods for obtaining a three-dimensional (3D) representation of one or more light sources inside a sample, such as a mammal. Mammalian tissue is a turbid medium, meaning that photons are both absorbed and scattered as they propagate through tissue. In the case where scattering is large compared with absorption, such as red to near-infrared light passing through tissue, the transport of light within the sample is described by diffusion theory. Using imaging data and computer-implemented photon diffusion models, embodiments of the present invention produce a 3D representation of the light sources inside a sample, such as a 3D location, size, and brightness of such light sources.Type: ApplicationFiled: June 25, 2003Publication date: February 5, 2004Applicant: Xenogen CorporationInventors: Daniel G. Stearns, Bradley W. Rice, Michael D. Cable
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Patent number: 6635391Abstract: Absorber material used in conventional EUVL reticles is eliminated by introducing a direct modulation in the complex-valued reflectance of the multilayer. A spatially localized energy source such as a focused electron or ion beam directly writes a reticle pattern onto the reflective multilayer coating. Interdiffusion is activated within the film by an energy source that causes the multilayer period to contract in the exposed regions. The contraction is accurately determined by the energy dose. A controllable variation in the phase and amplitude of the reflected field in the reticle plane is produced by the spatial modulation of the multilayer period. This method for patterning an EUVL reticle has the advantages of (1) avoiding the process steps associated with depositing and patterning an absorber layer and (2) providing control of the phase and amplitude of the reflected field with high spatial resolution.Type: GrantFiled: December 28, 2000Date of Patent: October 21, 2003Assignee: The Regents of the University of CaliforniaInventors: Daniel G. Stearns, Donald W. Sweeney, Paul B. Mirkarimi
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Publication number: 20030164998Abstract: An ion-assisted deposition technique to provide planarization of topological defects, e.g., to mitigate the effects of small particle contaminants on reticles for extreme ultraviolet (EUV) lithography. Reticles for EUV lithography will be fabricated by depositing high EUV reflectance Mo/Si multilayer films on superpolished substrates and topological substrate defects can nucleate unacceptable (“critical”) defects in the reflective Mo/Si coatings. A secondary ion source is used to etch the Si layers in between etch steps to produce topological defects with heights that are harmless to the lithographic process.Type: ApplicationFiled: March 1, 2002Publication date: September 4, 2003Applicant: The Regents of the University of CaliforniaInventors: Paul B. Mirkarimi, Eberhard A. Spiller, Daniel G. Stearns
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Publication number: 20030006214Abstract: A method and apparatus are provided for the repair of an amplitude defect in a multilayer coating. A significant number of layers underneath the amplitude defect are undamaged. The repair technique restores the local reflectivity of the coating by physically removing the defect and leaving a wide, shallow crater that exposes the underlying intact layers. The particle, pit or scratch is first removed the remaining damaged region is etched away without disturbing the intact underlying layers.Type: ApplicationFiled: June 29, 2001Publication date: January 9, 2003Applicant: The Regents of the University of CaliforniaInventors: Daniel G. Stearns, Donald W. Sweeney, Paul B. Mirkarimi, Henry N. Chapman
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Publication number: 20030002028Abstract: A method of investigating the location and size of a light-emitting source in a subject is disclosed. In practicing the method, one first obtains a light intensity profile by measuring, from a first perspective with a photodetector device, photons which (i) originate from the light-emitting source, (ii) travel through turbid biological tissue of the subject, and (iii) are emitted from a first surface region of interest of the subject. The light-intensity profile is matched against with a parameter-based biophotonic function, to estimate function parameters such as depth and size. The parameters so determined are refined using data other than the first measured light intensity profile, to obtain an approximate depth and size of the source in the subject. Also disclosed is an apparatus for carrying out the method.Type: ApplicationFiled: May 17, 2002Publication date: January 2, 2003Inventors: Bradley W. Rice, Daniel G. Stearns, Tamara L. Troy