Patents by Inventor Daniel J. Swart

Daniel J. Swart has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240128131
    Abstract: A camera may capture reflected light from the surface of the wafer during a semiconductor process that adds or removes material from the wafer, such as an etch process. To accurately determine an endpoint for the process, a camera sampling rate and light source intensity may be optimized in the process recipe. Optimizing the light source intensity may include characterizing light intensities that will be reflected from the waiver using an image of the wafer. Pixel intensities may be used to adjust the light source intensity to compensate for more complex wafer patterns. Optimizing the camera sampling rates may include nondestructively rotating a view of the wafer and converting the sampled intensities to the frequency domain. The camera sampling rate may be increased or decreased to remove spatial noise from the image without oversampling unnecessarily. These optimized parameters may then generate a clean, repeatable trace for endpoint determination.
    Type: Application
    Filed: October 14, 2022
    Publication date: April 18, 2024
    Applicant: Applied Materials, Inc.
    Inventors: Avishay Vaxman, Qintao Zhang, Jeffrey P. Koch, David P. Surdock, Wayne R. Swart, David J. Lee, Samphy Hong, Aldrin Bernard Vincent Eddy, Daniel G. Deyo
  • Patent number: 4837161
    Abstract: An analytical chemistry apparatus and method for introducing a reagent into a flowing stream of liquid carrier in order to quantitatively analyze one or more components of a sample added into the carrier. The reagent is permeated across a short section of membrane having relatively large pores. The use of such a membrane: (a) allows the membrane to be protected from physical damage by covering it with a perforate structure; (b) significantly reduces bandspreading across the membrane reagent addition device; (c) reduces the pressure drop across the membrane reagent addition device; and (d) still allows for the permeation of an effective amount of the reagent into the carrier. The reagent is preferably pressurized to minimize leakage of carrier across the membrane and the reagent can be self-pressurized by essentially completely filling the reagent reservoir of the invention with reagent and then hermetically sealing the reservoir.
    Type: Grant
    Filed: August 25, 1986
    Date of Patent: June 6, 1989
    Assignee: The Dow Chemical Company
    Inventors: Timothy S. Stevens, Nile N. Frawley, Daniel J. Swart, William C. Harris, Deborah E. Diedering, Lawrence W. Nicholson, L. David Rothman
  • Patent number: 4613678
    Abstract: Esterification of aromatic dicarboxylic acids with cyclic alkylene carbonates in the presence of organic compounds containing at least one six-membered aromatic nitrogen-containing heterocyclic moiety.
    Type: Grant
    Filed: June 30, 1980
    Date of Patent: September 23, 1986
    Assignee: The Dow Chemical Company
    Inventor: Daniel J. Swart
  • Patent number: 4500704
    Abstract: The invention is a process for the preparation of a carbon dioxide oxirane copolymer wherein the process comprises contacting carbon dioxide with an oxirane in the presence of (1) an organic coordination compound and (2) a catalytic amount of a double metal cyanide complex under conditions such that an oxirane carbon dioxide copolymer is prepared.
    Type: Grant
    Filed: August 15, 1983
    Date of Patent: February 19, 1985
    Assignee: The Dow Chemical Company
    Inventors: William J. Kruper, Jr., Daniel J. Swart
  • Patent number: 4360656
    Abstract: Alternating copolyestercarbonate resins having repeating units of the formula: ##STR1## wherein R.sup.1 is para-phenylene; each R is independently an aromatic hydrocarbylene or inertly substituted aromatic hydrocarbylene, e.g., ##STR2## and x is a number from 0.05 to 0.65 exhibit physical properties such as heat resistance, clarity and impact strength that are superior to the comparable properties of corresponding random copolymers. Such resins are useful for making transparent tough films and molded articles having high heat resistance.
    Type: Grant
    Filed: September 22, 1980
    Date of Patent: November 23, 1982
    Assignee: The Dow Chemical Co.
    Inventors: Daniel J. Swart, Jacqueline S. Kelyman
  • Patent number: 4347351
    Abstract: Linear polyesters are produced by esterification of aromatic dicarboxylic acids with cyclic alkylene carbonates in the presence of organic compounds containing at least one six-membered aromatic nitrogen-containing heterocyclic moiety followed by polycondensation of the resulting low molecular weight ester.
    Type: Grant
    Filed: February 17, 1981
    Date of Patent: August 31, 1982
    Assignee: The Dow Chemical Company
    Inventor: Daniel J. Swart
  • Patent number: 4278787
    Abstract: Alternating copolyestercarbonate resins having repeating units of the formula: ##STR1## wherein R.sup.1 is meta-phenylene and R is independently an aromatic hydrocarbylene or inertly substituted aromatic hydrocarbylene, e.g., ##STR2## exhibit physical properties such as heat resistance, clarity and impact strength that are superior to the comparable properties of corresponding random copolymers and exhibit physical properties such as impact strength and processability that are superior to the comparable properties of corresponding alternating copolyestercarbonates wherein R.sup.1 is para-phenylene. Such resins are useful for making transparent tough films and molded articles having high heat resistance.
    Type: Grant
    Filed: July 7, 1980
    Date of Patent: July 14, 1981
    Assignee: The Dow Chemical Company
    Inventors: Daniel J. Swart, Jacqueline S. Kelyman
  • Patent number: 4105633
    Abstract: Alternating copolyestercarbonate resins having repeating units of the formula: ##STR1## wherein each R is independently an aromatic hydrocarbylene or inertly substituted aromatic hydrocarbylene, e.g., ##STR2## exhibit physical properties such as heat and impact resistance that are superior to the heat and impact resistance of corresponding random copolymers. Such resins are useful for making transparent tough films and molded articles having high heat resistance.
    Type: Grant
    Filed: May 11, 1977
    Date of Patent: August 8, 1978
    Assignee: The Dow Chemical Company
    Inventors: Daniel J. Swart, Jacqueline S. Kelyman