Patents by Inventor Daniel Lendi
Daniel Lendi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 10943774Abstract: The present disclosure relates to a sputtering arrangement, a vacuum coating system, and a method for carrying out HiPIMS coating methods; the sputtering arrangement has at least two different interconnection possibilities and the switch to the second interconnection possibility, in which two sputtering sub-assemblies are operated simultaneously with high power pulses, achieves a productivity gain.Type: GrantFiled: November 14, 2016Date of Patent: March 9, 2021Assignee: OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKONInventors: Siegfried Krassnitzer, Daniel Lendi, Denis Kurapov
-
Publication number: 20180330931Abstract: The present disclosure relates to a sputtering arrangement, a vacuum coating system, and a method for carrying out HiPIMS coating methods; the sputtering arrangement has at least two different interconnection possibilities and the switch to the second interconnection possibility, in which two sputtering sub-assemblies are operated simultaneously with high power pulses, achieves a productivity gain.Type: ApplicationFiled: November 14, 2016Publication date: November 15, 2018Inventors: Siegfried Krassnitzer, Daniel Lendi, Denis Kurapov
-
Patent number: 10074976Abstract: A power distributor that is capable of distributing the high power from a DC generator to more than two targets sequentially and without the power output of the DC generator being interrupted. Furthermore, the invention relates to a sputter source that includes the power generator described above.Type: GrantFiled: October 29, 2013Date of Patent: September 11, 2018Assignee: OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKONInventor: Daniel Lendi
-
Patent number: 9997338Abstract: This invention relates to an arc-based method for the deposition of insulating layers and to an arc-based method for low-temperature coating processes, in which an electric arc discharge, ignited and applied on the surface of a target in an arc source, is simultaneously fed a direct current and a pulsed or alternating current. The invention further relates to an arc source in which the target is connected to a power supply unit that encompasses either a minimum of one pulsed high-current power supply 18, 18? and an additional power supply 13?, 18?, or a power supply 21, 21?, 22 designed with switchable combinatorial circuitry.Type: GrantFiled: April 8, 2005Date of Patent: June 12, 2018Assignee: OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKONInventors: Jürgen Ramm, Oliver Gstoehl, Beno Widrig, Daniel Lendi
-
Patent number: 9906210Abstract: The present invention relates to a method for providing power pulses for PVD sputter cathodes which comprise a power consumption component and a cathode element, wherein during a power increase interval for a generator the power on the power consumption component is decreased and then the power on the cathode element is decreased, with changeover being effected such that the power draw from the generator providing the power does not have to be interrupted.Type: GrantFiled: October 8, 2012Date of Patent: February 27, 2018Assignee: OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKONInventors: Siegfried Krassnitzer, Daniel Lendi, Markus Lechthaler
-
Patent number: 9267200Abstract: The invention relates to a method for supplying power impulses for PVD sputtering cathodes subdivided into partial cathodes. In said method, the power impulse intervals acting on the partial cathodes are selected in such a way as to overlap, thereby dispensing with the need to interrupt the drawing of power supplied by the generator.Type: GrantFiled: April 4, 2012Date of Patent: February 23, 2016Assignee: OERLIKON SURFACE SOLUTIONS AG, TRUBBACHInventors: Siegfried Krassnitzer, Daniel Lendi, Markus Lechthaler, Kurt Ruhm
-
Publication number: 20160043546Abstract: A power distributor that is capable of distributing the high power from a DC generator to more than two targets sequentially and without the power output of the DC generator being interrupted. Furthermore, the invention relates to a sputter source that includes the power generator described above.Type: ApplicationFiled: October 29, 2013Publication date: February 11, 2016Inventor: Daniel Lendi
-
Patent number: 9226379Abstract: The present invention relates to a plasma source which is arranged in floating fashion on a vacuum chamber, wherein the plasma source comprises a source housing, and a filament is provided in the source housing and is arranged so as to be insulated therefrom, wherein means for measuring the potential drop between the source housing and the filament are provided. The measured potential drop can be used for regulating the voltage heating the filament. According to the invention, corresponding means are provided.Type: GrantFiled: August 29, 2012Date of Patent: December 29, 2015Assignee: OERLIKON SURFACE SOLUTIONS AG, TRUBBACHInventors: Siegfried Krassnitzer, Daniel Lendi, Juerg Hagmann
-
Publication number: 20140339917Abstract: The present invention relates to a method for providing power pulses for PVD sputter cathodes which comprise a power consumption component and a cathode element, wherein during a power increase interval for a generator the power on the power consumption component is decreased and then the power on the cathode element is decreased, with changeover being effected such that the power draw from the generator providing the power does not have to be interrupted.Type: ApplicationFiled: October 8, 2012Publication date: November 20, 2014Applicant: Oerlikon Trading AG, TrubbachInventors: Siegfried Krassnitzer, Daniel Lendi, Markus Lechthaler
-
Publication number: 20140217892Abstract: The present invention relates to a plasma source which is arranged in floating fashion on a vacuum chamber, wherein the plasma source comprises a source housing, and a filament is provided in the source housing and is arranged so as to be insulated therefrom, wherein means for measuring the potential drop between the source housing and the filament are provided. The measured potential drop can be used for regulating the voltage heating the filament. According to the invention, corresponding means are provided.Type: ApplicationFiled: August 29, 2012Publication date: August 7, 2014Applicant: OERLIKON TRADING AG, TRUBBACHInventors: Siegfried Krassnitzer, Daniel Lendi, Juerg Hagmann
-
Publication number: 20140190819Abstract: The invention relates to a method for supplying power impulses for PVD sputtering cathodes subdivided into partial cathodes. In said method, the power impulse intervals acting on the partial cathodes are selected in such a way as to overlap, thereby dispensing with the need to interrupt the drawing of power supplied by the generator.Type: ApplicationFiled: April 4, 2012Publication date: July 10, 2014Applicant: OERLIKON TRADING AG, TRUBBACHInventors: Siegfried Krassnitzer, Daniel Lendi, Markus Lechthaler, Kurt Ruhm
-
Patent number: 7943017Abstract: A vacuum process system for surface-treating work pieces uses an arc evaporation source. The system has a first electrode connected to a DC power source and a second electrode, disposed separately from the arc evaporation source. The two electrodes are operated while being connected to a single pulsed power supply.Type: GrantFiled: March 1, 2006Date of Patent: May 17, 2011Assignee: Oerlikon Trading AG, TrubbachInventors: Jürgen Ramm, Beno Widrig, Daniel Lendi, Volker Derflinger, Andreas Reiter
-
Patent number: 7455755Abstract: The invention relates to a vacuum plasma generator for providing a plasma discharge (10) for treating work pieces (5) by way of a pulsed plasma process in a vacuum chamber (2). Said vacuum plasma generator comprises a generator output (9, 9?) having an AC mains supply (6a), an AC/DC mains rectifier system (6) for rectifying the AC mains voltage to a DC voltage, a filter capacitor (6b), a first stage as clocked DC/DC voltage converter (7) with means for adjusting the DC output voltage which produces an intermediate circuit voltage (Uz), comprising a controlled power switch (7a) which feeds the primary winding of a transformer (14) and the secondary winding of which is connected to a rectifier (15) and a downstream intermediate capacitor (12) and configures a floating transformer secondary circuit (23). Said secondary circuit is connected to a downstream second stage which is a pulse output stage (8) and is connected to the generator output (9, 9?).Type: GrantFiled: March 20, 2006Date of Patent: November 25, 2008Assignee: Oerlikon Trading AG, TrubbachInventors: Gerhard Tuymer, Jürgen Ramm, Daniel Lendi
-
Publication number: 20080173536Abstract: A vacuum process system for surface-treating work pieces uses an arc evaporation source. The system has a first electrode connected to a DC power source and a second electrode, disposed separately from the arc evaporation source. The two electrodes are operated while being connected to a single pulsed power supply.Type: ApplicationFiled: March 1, 2006Publication date: July 24, 2008Inventors: Jürgen Ramm, Beno Widrig, Daniel Lendi, Volker Derflinger, Andreas Reiter
-
Publication number: 20080143260Abstract: The invention relates to a vacuum plasma generator for providing a plasma discharge (10) for treating work pieces (5) by way of a pulsed plasma process in a vacuum chamber (2). Said vacuum plasma generator comprises a generator output (9, 9?) having an AC mains supply (6a), an AC/DC mains rectifier system (6) for rectifying the AC mains voltage to a DC voltage, a filter capacitor (6b), a first stage as clocked DC/DC voltage converter (7) with means for adjusting the DC output voltage which produces an intermediate circuit voltage (Uz), comprising a controlled power switch (7a) which feeds the primary winding of a transformer (14) and the secondary winding of which is connected to a rectifier (15) and a downstream intermediate capacitor (12) and configures a floating transformer secondary circuit (23). Said secondary circuit is connected to a downstream second stage which is a pulse output stage (8) and is connected to the generator output (9, 9?).Type: ApplicationFiled: March 1, 2006Publication date: June 19, 2008Inventors: Gerhard Tuymer, Jurgen Ramm, Daniel Lendi
-
Publication number: 20070000772Abstract: This invention relates to an arc-based method for the deposition of insulating layers and to an arc-based method for low-temperature coating processes, in which an electric arc discharge, ignited and applied on the surface of a target in an arc source, is simultaneously fed a direct current and a pulsed or alternating current. The invention further relates to an arc source in which the target is connected to a power supply unit that encompasses either a minimum of one pulsed high-current power supply 18, 18? and an additional power supply 13?, 18?, or a power supply 21, 21?, 22 designed with switchable combinatorial circuitry.Type: ApplicationFiled: April 8, 2005Publication date: January 4, 2007Inventors: Jurgen Ramm, Oliver Gstoehl, Beno Widrig, Daniel Lendi