Patents by Inventor Daniel Walldorf
Daniel Walldorf has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10403995Abstract: An electrical connector comprises an interface element attachable to a circuit board and a plurality of peripheral connectors. The interface element has an inner contact electrically contacting the circuit board and a connecting interface. The peripheral connectors are each individually matable with the connecting interface. The peripheral connectors include a peripheral plug connector having a plurality of plug connector pins and a peripheral lead connector having a plurality of wires.Type: GrantFiled: September 13, 2017Date of Patent: September 3, 2019Assignee: TE Connectivity Germany GmbHInventors: Daniel Walldorf, Calogero Mauro Buscemi, Markus Strelow, Chistian Schrettlinger, Frank Wolf, Steffen Burger, Chris Buechling, Mike Laub, Ulrich Buchmann
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Illumination system of a microlithographic projection exposure apparatus with a birefringent element
Patent number: 10151982Abstract: The disclosure concerns an illumination system of a microlithographic projection exposure apparatus. The illumination system includes a mirror arrangement which has a plurality of mirror units and at least one element arranged in front of the mirror arrangement in the light propagation direction to produce at least two different states of polarization incident on different mirror units. The mirror units are displaceable independently of each other for altering an angle distribution of the light reflected by the mirror arrangement.Type: GrantFiled: January 28, 2016Date of Patent: December 11, 2018Assignee: Carl Zeiss SMT GmbHInventors: Damian Fiolka, Daniel Walldorf, Ingo Saenger -
Patent number: 10088754Abstract: A raster arrangement includes at least one raster element of a first type and at least one raster element of a second type. Each raster element of the first type has a first bundle-influencing effect. Each raster element of the second type has a second bundle-influencing effect which is different from the first bundle-influencing effect. Each raster element of the first type is located in a first area of the raster arrangement. Each raster element of the second type is located in a second area of the raster arrangement which is different from the first area of the raster arrangement.Type: GrantFiled: March 21, 2017Date of Patent: October 2, 2018Assignee: Carl Zeiss SMT GmbHInventors: Axel Scholz, Frank Schlesener, Nils Haverkamp, Vladimir Davydenko, Michael Gerhard, Gerhard-Wilhelm Ziegler, Mirco Kern, Thomas Bischoff, Thomas Stammler, Stephan Kellner, Manfred Maul, Daniel Walldorf, Igor Hurevich, Markus Deguenther
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Publication number: 20180006390Abstract: An electrical connector comprises an interface element attachable to a circuit board and a plurality of peripheral connectors. The interface element has an inner contact electrically contacting the circuit board and a connecting interface. The peripheral connectors are each individually matable with the connecting interface. The peripheral connectors include a peripheral plug connector having a plurality of plug connector pins and a peripheral lead connector having a plurality of wires.Type: ApplicationFiled: September 13, 2017Publication date: January 4, 2018Applicant: TE Connectivity Germany GmbHInventors: Daniel Walldorf, Calogero Mauro Buscemi, Markus Strelow, Chistian Schrettlinger, Frank Wolf, Steffen Burger, Chris Buechling, Mike Laub, Ulrich Buchmann
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Publication number: 20170192361Abstract: A raster arrangement includes at least one raster element of a first type and at least one raster element of a second type. Each raster element of the first type has a first bundle-influencing effect. Each raster element of the second type has a second bundle-influencing effect which is different from the first bundle-influencing effect. Each raster element of the first type is located in a first area of the raster arrangement. Each raster element of the second type is located in a second area of the raster arrangement which is different from the first area of the raster arrangement.Type: ApplicationFiled: March 21, 2017Publication date: July 6, 2017Inventors: Axel Scholz, Frank Schlesener, Nils Haverkamp, Vladimir Davydenko, Michael Gerhard, Gerhard-Wilhelm Ziegler, Mirco Kern, Thomas Bischoff, Thomas Stammler, Stephan Kellner, Manfred Maul, Daniel Walldorf, Igor Hurevich, Markus Deguenther
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Patent number: 9606441Abstract: A microlithography illumination system includes a first raster arrangement including a first plurality of bundle-forming raster elements arranged in or adjacent a first plane of the illumination system. The first plurality of bundle-forming raster elements is configured to generate a raster arrangement of secondary light sources. The illumination system also includes a transmission optics configured to superimpose transmission of the illumination light of the secondary light sources into the object field. The transmission optics includes a second raster arrangement comprising a second plurality of bundle-forming raster elements. The illumination system further includes a displacement device configured to displace a displaceable segment of the first raster arrangement relative to the second raster arrangement. The displaceable segment includes exactly one of the raster elements, a group of several raster elements, a raster column, a raster area, or several groups of raster elements.Type: GrantFiled: February 1, 2016Date of Patent: March 28, 2017Assignee: Carl Zeiss SMT GmbHInventors: Axel Scholz, Frank Schlesener, Nils Haverkamp, Vladimir Davydenko, Michael Gerhard, Gerhard-Wilhelm Ziegler, Mirco Kern, Thomas Bischoff, Thomas Stammler, Stephan Kellner, Manfred Maul, Daniel Walldorf, Igor Hurevich, Markus Deguenther
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ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS WITH A BIREFRINGENT ELEMENT
Publication number: 20160195815Abstract: The disclosure concerns an illumination system of a microlithographic projection exposure apparatus. The illumination system includes a mirror arrangement which has a plurality of mirror units and at least one element arranged in front of the mirror arrangement in the light propagation direction to produce at least two different states of polarization incident on different mirror units. The mirror units are displaceable independently of each other for altering an angle distribution of the light reflected by the mirror arrangement.Type: ApplicationFiled: January 28, 2016Publication date: July 7, 2016Inventors: Damian Fiolka, Daniel Walldorf, Ingo Saenger -
Publication number: 20160161858Abstract: An illumination system for microlithography serves to illuminate an illumination field with illumination light of a primary light source. A first raster arrangement has bundle-forming first raster elements which are arranged in a first plane of the illumination system or adjacent to the plane. The first raster arrangement serves to generate a raster arrangement of secondary light sources. A transmission optics serves for superimposed transmission of the illumination light of the secondary light sources into the illumination field. The transmission optics has a second raster arrangement with bundle-forming second raster elements. In each case one of the raster elements of the first raster arrangement is allocated to one of the raster elements of the second raster arrangement for guiding a partial bundle of an entire bundle of illumination light. The first raster arrangement for example has at least two types (I, II, III) of the first raster elements which have different bundle-influencing effects.Type: ApplicationFiled: February 1, 2016Publication date: June 9, 2016Inventors: Axel Scholz, Frank Schlesener, Nils Haverkamp, Vladimir Davydenko, Michael Gerhard, Gerhard-Wilhelm Ziegler, Mirco Kern, Thomas Bischoff, Thomas Stammler, Stephan Kellner, Manfred Maul, Daniel Walldorf, Igor Hurevich, Markus Deguenther
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Illumination system of a microlithographic projection exposure apparatus with a birefringent element
Patent number: 9316920Abstract: The disclosure concerns an illumination system of a microlithographic projection exposure apparatus. The illumination system includes a mirror arrangement which has a plurality of mirror units and at least one element arranged in front of the mirror arrangement in the light propagation direction to produce at least two different states of polarization incident on different mirror units. The mirror units are displaceable independently of each other for altering an angle distribution of the light reflected by the mirror arrangement.Type: GrantFiled: March 4, 2010Date of Patent: April 19, 2016Assignee: Carl Zeiss SMT GmbHInventors: Damian Fiolka, Daniel Walldorf, Ingo Saenger -
Patent number: 9280060Abstract: A raster arrangement includes first and second types of raster elements which have different bundle-influencing effects. There is a distance step between a first raster area and a second raster area. The first raster area comprises a raster element of the first raster element type. The second raster area includes a raster element of the second raster element type. The raster arrangement is configured to be used in a microlithography illumination system.Type: GrantFiled: September 25, 2014Date of Patent: March 8, 2016Assignee: Carl Zeiss SMT GmbHInventors: Axel Scholz, Frank Schlesener, Nils Haverkamp, Vladimir Davydenko, Michael Gerhard, Gerhard-Wilhelm Ziegler, Mirco Kern, Thomas Bischoff, Thomas Stammler, Stephan Kellner, Manfred Maul, Daniel Walldorf, Igor Hurevich, Markus Deguenther
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Publication number: 20150022798Abstract: A raster arrangement includes first and second types of raster elements which have different bundle-influencing effects. There is a distance step between a first raster area and a second raster area. The first raster area comprises a raster element of the first raster element type. The second raster area includes a raster element of the second raster element type. The raster arrangement is configured to be used in a microlithography illumination system.Type: ApplicationFiled: September 25, 2014Publication date: January 22, 2015Inventors: Axel Scholz, Frank Schlesener, Nils Haverkamp, Vladimir Davydenko, Michael Gerhard, Gerhard-Wilhelm Ziegler, Mirco Kern, Thomas Bischoff, Thomas Stammler, Stephan Kellner, Manfred Maul, Daniel Walldorf, Igor Hurevich, Markus Deguenther
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Patent number: 8873023Abstract: An illumination system for microlithography serves to illuminate an illumination field with illumination light of a primary light source. A first raster arrangement has bundle-forming first raster elements which are arranged in a first plane of the illumination system or adjacent to the plane. The first raster arrangement serves to generate a raster arrangement of secondary light sources. A transmission optics serves for superimposed transmission of the illumination light of the secondary light sources into the illumination field. The transmission optics has a second raster arrangement with bundle-forming second raster elements. In each case one of the raster elements of the first raster arrangement is allocated to one of the raster elements of the second raster arrangement for guiding a partial bundle of an entire bundle of illumination light. The first raster arrangement for example has at least two types (I, II, III) of the first raster elements which have different bundle-influencing effects.Type: GrantFiled: July 19, 2011Date of Patent: October 28, 2014Assignee: Carl Zeiss SMT GmbHInventors: Axel Scholz, Frank Schlesener, Nils Haverkamp, Vladimir Davydenko, Michael Gerhard, Gerhard-Wilhelm Ziegler, Mirco Kern, Thomas Bischoff, Thomas Stammler, Stephan Kellner, Manfred Maul, Daniel Walldorf, Igor Hurevich, Markus Deguenther
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Publication number: 20120019796Abstract: An illumination system for microlithography serves to illuminate an illumination field with illumination light of a primary light source. A first raster arrangement has bundle-forming first raster elements which are arranged in a first plane of the illumination system or adjacent to the plane. The first raster arrangement serves to generate a raster arrangement of secondary light sources. A transmission optics serves for superimposed transmission of the illumination light of the secondary light sources into the illumination field. The transmission optics has a second raster arrangement with bundle-forming second raster elements. In each case one of the raster elements of the first raster arrangement is allocated to one of the raster elements of the second raster arrangement for guiding a partial bundle of an entire bundle of illumination light. The first raster arrangement for example has at least two types (I, II, III) of the first raster elements which have different bundle-influencing effects.Type: ApplicationFiled: July 19, 2011Publication date: January 26, 2012Applicant: CARL ZEISS SMT GMBHInventors: Axel Scholz, Frank Schlesener, Nils Haverkamp, Vladimir Davydenko, Michael Gerhard, Gerhard-Wilhelm Ziegler, Mirco Kern, Thomas Bischoff, Thomas Stammler, Stephan Kellner, Manfred Maul, Daniel Walldorf, Igor Hurevich, Markus Deguenther
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Publication number: 20100165318Abstract: The disclosure concerns an illumination system of a microlithographic projection exposure apparatus. The illumination system includes a mirror arrangement which has a plurality of mirror units and at least one element arranged in front of the mirror arrangement in the light propagation direction to produce at least two different states of polarization incident on different mirror units. The mirror units are displaceable independently of each other for altering an angle distribution of the light reflected by the mirror arrangement.Type: ApplicationFiled: March 4, 2010Publication date: July 1, 2010Applicant: CARL ZEISS SMT AGInventors: Damian Fiolka, Daniel Walldorf, Ingo Saenger