Patents by Inventor DANIELE BENETTI

DANIELE BENETTI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Thin film coating and method of fabrication thereof
    Patent number: 11274360
    Abstract: A method and a system for film deposition, the system comprising a substrate and a negatively biased target, the target being mounted on a magnetron sputtering cathode and located at a distance from the substrate, wherein a laser beam from a pulsed laser is focused on the target, thereby triggering a magnetron plasma or ejecting vaporized and ionized material from the target in an existing magnetron plasma, the magnetron plasma sputtering material from the target depositing on the substrate.
    Type: Grant
    Filed: December 13, 2017
    Date of Patent: March 15, 2022
    Inventors: Daniele Benetti, Riad Nechache, Henri Pepin, Jennifer MacLeod, Federico Rosei, Rafik Nouar, Andranik Sarkissian
  • LUMINESCENT SOLAR CONCENTRATOR USING A METAL-FREE EMITTER
    Publication number: 20200235254
    Abstract: A luminescent solar concentrator (LSC) comprising a metal-free emitter. The emitter may for example be carbon-based. In particular, the emitter may comprise colloidal carbon quantum dots, also called C-dots or C-QDs or C-dots. In embodiments of the invention, the surface of the C-dots is modified.
    Type: Application
    Filed: February 16, 2018
    Publication date: July 23, 2020
    Applicants: INSTITUT NATIONAL DE LA RECHERCHE SCIENTIFIQUE, UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA
    Inventors: Yufeng ZHOU, Daniele BENETTI, Xin TONG, Lei JIN, Zhiming M. WANG, Dongling MA, Haiguang ZHAO, Federico ROSEI
  • THIN FILM COATING AND METHOD OF FABRICATION THEREOF
    Publication number: 20190177834
    Abstract: A method and a system for film deposition, the system comprising a substrate and a negatively biased target, the target being mounted on a magnetron sputtering cathode and located at a distance from the substrate, wherein a laser beam from a pulsed laser is focused on the target, thereby triggering a magnetron plasma or ejecting vaporized and ionized material from the target in an existing magnetron plasma, the magnetron plasma sputtering material from the target depositing on the substrate.
    Type: Application
    Filed: December 13, 2017
    Publication date: June 13, 2019
    Inventors: DANIELE BENETTI, RIAD NECHACHE, HENRI PEPIN, JENNIFER MACLEOD, FEDERICO ROSEI, RAFIK NOUAR, ANDRANIK SARKISSIAN