Patents by Inventor Darrell J. Armstrong

Darrell J. Armstrong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7248397
    Abstract: A wavelength-doubling optical parametric oscillator (OPO) comprising a type II nonlinear optical medium for generating a pair of degenerate waves at twice a pump wavelength and a plurality of mirrors for rotating the polarization of one wave by 90 degrees to produce a wavelength-doubled beam with an increased output energy by coupling both of the degenerate waves out of the OPO cavity through the same output coupler following polarization rotation of one of the degenerate waves.
    Type: Grant
    Filed: May 3, 2006
    Date of Patent: July 24, 2007
    Assignee: Sandia Corporation
    Inventors: Darrell J. Armstrong, Arlee V. Smith
  • Patent number: 6980354
    Abstract: An optical parametric oscillator apparatus utilizing self-seeding with an external nanosecond-duration pump source to generate a seed pulse resulting in increased conversion efficiency. An optical parametric oscillator with a ring configuration are combined with a pump that injection seeds the optical parametric oscillator with a nanosecond duration, mJ pulse in the reverse direction as the main pulse. A retroreflecting means outside the cavity injects the seed pulse back into the cavity in the direction of the main pulse to seed the main pulse, resulting in higher conversion efficiency.
    Type: Grant
    Filed: May 19, 2003
    Date of Patent: December 27, 2005
    Assignee: Sandia Corporation
    Inventors: Arlee V. Smith, Darrell J. Armstrong
  • Patent number: 6775054
    Abstract: A device for optical parametric amplification utilizing four mirrors oriented in a nonplanar configuration where the optical plane formed by two of the mirrors is orthogonal to the optical plane formed by the other two mirrors and with the ratio of lengths of the laser beam paths approximately constant regardless of the scale of the device. With a cavity length of less than approximately 110 mm, a conversion efficiency of greater than 45% can be achieved.
    Type: Grant
    Filed: August 12, 2002
    Date of Patent: August 10, 2004
    Assignee: Sandia Corporation
    Inventors: Arlee V. Smith, Darrell J. Armstrong
  • Publication number: 20030193647
    Abstract: An ophthalmic error measurement system includes a projecting optical system delivering light onto a retina of an eye, a pre-correction system which compensates a light beam to be injected into the eye for aberrations in the eye, the pre-correction system being positioned in between the projecting optical system and the eye, an imaging system which collects light scattered by the retina, and a detector receiving light returned by the retina from the imaging system. Use of the pre-correction system allows the end-to-end aberrations of the ocular system to be analyzed. The use of a pre-correction system also allows use of a minimized spot size on the retina, and all of its attendant advantages.
    Type: Application
    Filed: April 21, 2003
    Publication date: October 16, 2003
    Inventors: Daniel R. Neal, Darrell J. Armstrong, Daniel M. Topa, Richard J. Copland
  • Patent number: 6550917
    Abstract: An ophthalmic error measurement system includes a projecting optical system delivering light onto a retina of an eye, a pre-correction system which compensates a light beam to be injected into the eye for aberrations in the eye, the pre-correction system being positioned in between the projecting optical system and the eye, an imaging system which collects light scattered by the retina, and a detector receiving light returned by the retina from the imaging system. Use of the pre-correction system allows the end-to-end aberrations of the ocular system to be analyzed. The use of a pre-correction system also allows use of a minimized spot size on the retina, and all of its attendant advantages.
    Type: Grant
    Filed: October 20, 2000
    Date of Patent: April 22, 2003
    Assignee: WaveFront Sciences, Inc.
    Inventors: Daniel R. Neal, Darrell J. Armstrong, Daniel M. Topa, Richard J. Copland
  • Patent number: 6184974
    Abstract: A Shack-Hartmann wavefront sensor having an aperture which is smaller than the size of an object being measured is used to measure the wavefront for the entire object. The wavefront sensor and the object are translated relative to one another to measure the wavefronts at a plurality of subregions of the object. The measured wavefronts are then stitched together to form a wavefront of the object. The subregions may overlap in at least one dimensions. A reference surface may be provided to calibrate the wavefront sensor.
    Type: Grant
    Filed: July 1, 1999
    Date of Patent: February 6, 2001
    Assignee: Wavefront Sciences, Inc.
    Inventors: Daniel R. Neal, Ron R. Rammage, Darrell J. Armstrong, William T. Turner, Justin D. Mansell
  • Patent number: 6052180
    Abstract: An apparatus and method for characterizing a pulsed energy beam with a two-dimensional wavefront sensor. The data acquisition is synchronized with the output of the beam from the pulsed source, so that a beam characterization, including phase, can be determined in a single pulse.
    Type: Grant
    Filed: February 5, 1999
    Date of Patent: April 18, 2000
    Assignee: WaveFront Sciences, Inc.
    Inventors: Daniel R. Neal, Ron R. Rammage, Darrell J. Armstrong, William T. Turner