Patents by Inventor Darshana N. BHAGAT

Darshana N. BHAGAT has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Semiconductor devices with asymmetric halo implantation and method of manufacture
    Patent number: 10008597
    Abstract: A method includes forming a hardmask over one or more gate structures. The method further includes forming a photoresist over the hardmask. The method further includes forming an opening in the photoresist over at least one of the gate structures. The method further includes stripping the hardmask that is exposed in the opening and which is over the at least one of the gate structures. The method further includes removing the photoresist. The method further includes providing a halo implant on a side of the least one of the at least one of the gate structures.
    Type: Grant
    Filed: October 3, 2014
    Date of Patent: June 26, 2018
    Assignee: GLOBALFOUNDRIES INC.
    Inventors: Darshana N. Bhagat, Thomas J. Dunbar, Yen L. Lim, Jed H. Rankin, Eva S. Holmes
  • SEMICONDUCTOR DEVICES WITH ASYMMETRIC HALO IMPLANTATION AND METHOD OF MANUFACTURE
    Publication number: 20150054094
    Abstract: A method includes forming a hardmask over one or more gate structures. The method further includes forming a photoresist over the hardmask. The method further includes forming an opening in the photoresist over at least one of the gate structures. The method further includes stripping the hardmask that is exposed in the opening and which is over the at least one of the gate structures. The method further includes removing the photoresist. The method further includes providing a halo implant on a side of the least one of the at least one of the gate structures.
    Type: Application
    Filed: October 3, 2014
    Publication date: February 26, 2015
    Inventors: Darshana N. BHAGAT, Thomas J. DUNBAR, Yen L. LIM, Jed H. RANKIN, Eva S. HOLMES
  • Semiconductor devices with asymmetric halo implantation and method of manufacture
    Patent number: 8877596
    Abstract: a method comprises forming a hardmask over one or more gate structures. The method further comprises forming a photoresist over the hardmask. The method further comprises forming an opening in the photoresist over at least one of the gate structures. The method further comprises stripping the hardmask that is exposed in the opening and which is over the at least one of the gate structures. The method further comprises removing the photoresist. The method further comprises providing a halo implant on a side of the at least one of the gate structures.
    Type: Grant
    Filed: June 24, 2010
    Date of Patent: November 4, 2014
    Assignee: International Business Machines Corporation
    Inventors: Darshana N. Bhagat, Thomas J. Dunbar, Yen Li Lim, Jed H. Rankin, Eva A. Shah
  • SEMICONDUCTOR DEVICES WITH ASYMMETRIC HALO IMPLANTATION AND METHOD OF MANUFACTURE
    Publication number: 20110316094
    Abstract: a method comprises forming a hardmask over one or more gate structures. The method further comprises forming a photoresist over the hardmask. The method further comprises forming an opening in the photoresist over at least one of the gate structures. The method further comprises stripping the hardmask that is exposed in the opening and which is over the at least one of the gate structures. The method further comprises removing the photoresist. The method further comprises providing a halo implant on a side of the least one of the at least one of the gate structures.
    Type: Application
    Filed: June 24, 2010
    Publication date: December 29, 2011
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Darshana N. BHAGAT, Thomas J. DUNBAR, Yen Li LIM, Jed H. RANKIN, Eva A. SHAH