Patents by Inventor Dave Tuggle

Dave Tuggle has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Multi-source plasma focused ion beam system
    Patent number: 8692217
    Abstract: The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam.
    Type: Grant
    Filed: March 26, 2013
    Date of Patent: April 8, 2014
    Assignee: FEI Company
    Inventors: Noel Smith, Clive D. Chandler, Mark W. Utlaut, Paul P. Tesch, Dave Tuggle
  • Multi-source plasma focused ion beam system
    Patent number: 8405054
    Abstract: The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam.
    Type: Grant
    Filed: October 4, 2011
    Date of Patent: March 26, 2013
    Assignee: FEI Company
    Inventors: Noel Smith, Clive D. Chandler, Mark W. Utlaut, Paul P. Tesch, Dave Tuggle
  • Multi-Source Plasma Focused Ion Beam System
    Publication number: 20120080407
    Abstract: The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam.
    Type: Application
    Filed: October 4, 2011
    Publication date: April 5, 2012
    Applicant: FEI COMPANY
    Inventors: Noel Smith, Clive D. Chandler, Mark Utlaut, Paul P. Tesch, Dave Tuggle
  • Multi-source plasma focused ion beam system
    Patent number: 8076650
    Abstract: The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam.
    Type: Grant
    Filed: July 16, 2007
    Date of Patent: December 13, 2011
    Assignee: FEI Company
    Inventors: Noel Smith, Clive D. Chandler, Mark Utlaut, Paul P. Tesch, Dave Tuggle
  • MULTI-SOURCE PLASMA FOCUSED ION BEAM SYSTEM
    Publication number: 20090309018
    Abstract: The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam.
    Type: Application
    Filed: July 16, 2007
    Publication date: December 17, 2009
    Applicant: Fei Company
    Inventors: Noel Smith, Clive D. Chandler, Mark W. Utlaut, Paul P. Tesch, Dave Tuggle