Patents by Inventor David A. Setton
David A. Setton has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230402264Abstract: A gas distribution assembly for a processing chamber in a substrate processing system includes a gas plate including a plurality of holes configured to supply a gas mixture into an interior of the processing chamber and a carrier ring configured to support the gas plate. The carrier ring includes an annular body and a radially inwardly projecting portion. The radially inwardly projecting portion has a first inner diameter and the annular body has a second inner diameter greater than the first inner diameter, the radially inwardly projecting portion defines a ledge, and the gas plate is arranged on the ledge of the carrier ring. A dielectric window is arranged on the gas plate above the gas plate and the carrier ring such that the gas plate is supported between the carrier ring and the dielectric window.Type: ApplicationFiled: September 14, 2021Publication date: December 14, 2023Inventors: Gordon PENG, Ambarish CHHATRE, Craig ROSSLEE, Dan MAROHL, David SETTON
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Publication number: 20230395359Abstract: An electrostatic chuck is provided. In one example, the electrostatic chuck includes a base plate, a bond layer disposed over the base plate, a ceramic plate, and a heater. The ceramic plate includes a bottom surface disposed over the bond layer and a raised top surface for supporting a substrate. The raised top surface includes an outer diameter. The heater is disposed between the bottom surface of the ceramic plate and the bond layer. The heater element includes an inner heating element and an outer heating element. The inner heating element is arranged in a central circular area adjacent to the bottom surface of the ceramic plate and the outer heating element is arranged in an annular area that surrounds the central circular area and is adjacent to the bottom surface of the ceramic plate. An outer diameter of the outer heating element is inset from an annual heater setback region of the ceramic plate.Type: ApplicationFiled: September 9, 2021Publication date: December 7, 2023Inventors: Ambarish Chhatre, Patrick Chung, Dan Marohl, Craig A. Rosslee, David A. Setton, Mohammad Sohail Shaik
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Publication number: 20230298929Abstract: A thin shadow ring for a substrate processing system includes an annular body having an inner diameter and an outer diameter. The inner diameter and the outer diameter define a cross-sectional width of the annular body between the inner diameter and the outer diameter. At least two tabs extend radially outward from the annular body. The cross-sectional width of the annular body between the inner diameter and the outer diameter is less than 1.0 inch.Type: ApplicationFiled: July 30, 2021Publication date: September 21, 2023Inventors: David SETTON, Ambarish CHHATRE, Justin Charles CANNIFF, Dan MAROHL, Craig ROSSLEE
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Patent number: 10923322Abstract: A coil portion is formed. A first articulation portion extends from the coil portion. A first mounting structure extends from the first articulation portion. The first mounting structure includes a first mounting region configured to mount in contact with a terminal of a first electrical component. The first articulation portion and the first mounting structure are configured to position the first mounting region at a location outside of a strong electromagnetic field emanating from the coil portion. A second articulation portion extends from the coil portion. A second mounting structure extends from the second articulation portion. The second mounting structure includes a second mounting region configured to mount in contact with a terminal of a second electrical component. The second articulation portion and the second mounting structure are configured to position the second mounting region at a location outside of the strong electromagnetic field emanating from the coil portion.Type: GrantFiled: June 14, 2017Date of Patent: February 16, 2021Assignee: Lam Research CorporationInventors: Oscar Lopez, Shen Peng, David Setton, Craig Rosslee, Dan Marohl, Andras Kuthi
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Publication number: 20190214236Abstract: A substrate support for a substrate processing chamber configured to implement a rapid alternating process includes a baseplate and a heating plate arranged on the baseplate. The heating plate includes a first zone including a first heating element configured to adjust a first temperature of the first zone of the heating plate and a second zone including a second heating element configured to adjust a second temperature of the second zone of the heating plate. A first thermally conductive bond layer is arranged between the heating plate and the baseplate. The first thermally conductive bond layer is configured to transfer heat from the heating plate to the baseplate during the rapid alternating process. The rapid alternating process includes a plurality of alternating deposition steps and etching steps.Type: ApplicationFiled: January 10, 2018Publication date: July 11, 2019Inventors: Dan MAROHL, David Setton, Craig Rosslee, Gautam Bhattacharyya
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Publication number: 20180366301Abstract: A coil portion is formed. A first articulation portion extends from the coil portion. A first mounting structure extends from the first articulation portion. The first mounting structure includes a first mounting region configured to mount in contact with a terminal of a first electrical component. The first articulation portion and the first mounting structure are configured to position the first mounting region at a location outside of a strong electromagnetic field emanating from the coil portion. A second articulation portion extends from the coil portion. A second mounting structure extends from the second articulation portion. The second mounting structure includes a second mounting region configured to mount in contact with a terminal of a second electrical component. The second articulation portion and the second mounting structure are configured to position the second mounting region at a location outside of the strong electromagnetic field emanating from the coil portion.Type: ApplicationFiled: June 14, 2017Publication date: December 20, 2018Inventors: Oscar Lopez, Shen Peng, David Setton, Craig Rosslee, Dan Marohl, Andras Kuthi
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Publication number: 20180047543Abstract: A system is provided and includes a first linear motor, a first separator support assembly, and a controller. The first linear motor includes a shaft that is linearly driven based on a current supplied to the first linear motor. The first separator support assembly is configured to connect to the shaft of the first linear motor and to a rod of a first capacitor of a match network. The first linear motor is configured to actuate the rod to move a first electrode of the first capacitor relative to a second electrode of the first capacitor to change a capacitance of the first capacitor. The controller is connected to the first linear motor and is configured to adjust power supplied to a first radio frequency reactor coil of a plasma processing chamber by adjusting the current supplied to the first linear motor.Type: ApplicationFiled: August 8, 2017Publication date: February 15, 2018Inventors: David Setton, Dan Marohl, Shen Peng, Gautam Bhattacharyya, Andras Kuthi
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Patent number: 9437400Abstract: An insulated dielectric window assembly comprising a dielectric window of an inductively coupled plasma processing apparatus; an upper polymeric ring, and a lower polymeric ring. The upper polymeric ring insulates the outer edge of the dielectric window from a cooler ambient atmosphere and the lower polymeric ring insulates the lower surface of the dielectric window from a chamber surface supporting the window.Type: GrantFiled: May 2, 2012Date of Patent: September 6, 2016Assignee: Lam Research CorporationInventors: David Setton, Gautam Bhattacharyya, Brett C. Richardson
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Publication number: 20130292055Abstract: An insulated dielectric window assembly comprising a dielectric window of an inductively coupled plasma processing apparatus; an upper polymeric ring, and a lower polymeric ring. The upper polymeric ring insulates the outer edge of the dielectric window from a cooler ambient atmosphere and the lower polymeric ring insulates the lower surface of the dielectric window from a chamber surface supporting the window.Type: ApplicationFiled: May 2, 2012Publication date: November 7, 2013Applicant: Lam Research CorporationInventors: David Setton, Gautam Bhattacharyya, Brett C. Richardson
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Publication number: 20050268572Abstract: A beverage reservoir for a personal hydration device is filled with a beverage concentrate and sealed in a tamper-evident manner. As a result, the reservoir can be sold pre-filled and the user can simply add water from any of a multitude of public water sources to form a beverage and use the reservoir confident that the beverage contains no mold, fungus, or residue from previously stored and consumed beverage. The reservoir can also include a port for re-filling such that the user can use the reservoir in a conventional manner after consumption of the beverage of the previously sealed-in beverage concentrate.Type: ApplicationFiled: August 24, 2004Publication date: December 8, 2005Inventor: David Setton
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Patent number: 6837026Abstract: A beverage reservoir for a personal hydration device is filled with a beverage, e.g., water, and sealed in a tamper-evident manner. As a result, the reservoir can be sold pre-filled and the user can use the reservoir confident that the beverage contains no mold, fungus, or residue from previously stored and consumed beverage. The reservoir can also include a port for re-filling such that the user can use the reservoir in a conventional manner after consumption of the previously sealed-in beverage.Type: GrantFiled: September 20, 2002Date of Patent: January 4, 2005Inventor: David Setton
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Publication number: 20040091349Abstract: A workpiece handling system with dual load locks, a transport chamber and a process chamber. Workpieces may be retrieved from one load lock for processing at vacuum pressure, while workpieces are unloaded from the other load lock at the pressure of the surrounding environment. The transport chamber has a transport robot with two arms. Processed workpieces and new workpieces may be exchanged by a simple under/over motion of the two robot arms. The transport robot rotates about a central shaft to align with the load locks or the process chamber. The robot may also be raised or lowered to align the arms with the desired location to which workpieces are deposited or from which workpieces are retrieved. The two load locks may be positioned one above the other such that a simple vertical motion of the robot can be used to select between the two load locks. The two load locks and transport robot allow almost continuous processing.Type: ApplicationFiled: November 5, 2003Publication date: May 13, 2004Inventors: Farzad Tabrizi, Barry Kitazumi, David A. Barker, David A. Setton, Leszek Niewmierzycki, Michael J. Kuhlman
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Publication number: 20040055254Abstract: A beverage reservoir for a personal hydration device is filled with a beverage, e.g., water, and sealed in a tamper-evident manner. As a result, the reservoir can be sold pre-filled and the user can use the reservoir confident that the beverage contains no mold, fungus, or residue from previously stored and consumed beverage. The reservoir can also include a port for re-filling such that the user can use the reservoir in a conventional manner after consumption of the previously sealed-in beverage.Type: ApplicationFiled: September 20, 2002Publication date: March 25, 2004Inventor: David Setton
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Patent number: 6647665Abstract: A workpiece handling system with dual load locks, a transport chamber and a process chamber. Workpieces may be retrieved from one load lock for processing at vacuum pressure, while workpieces are unloaded from the other load lock at the pressure of the surrounding environment. The transport chamber has a transport robot with two arms. Processed workpieces and new workpieces may be exchanged by a simple under/over motion of the two robot arms. The transport robot rotates about a central shaft to align with the load locks or the process chamber. The robot may also be raised or lowered to align the arms with the desired location to which workpieces are deposited or from which workpieces are retrieved. The two load locks may be positioned one above the other such that a simple vertical motion of the robot can be used to select between the two load locks. The two load locks and transport robot allow almost continuous processing.Type: GrantFiled: August 30, 2000Date of Patent: November 18, 2003Assignee: Mattson Technology, Inc.Inventors: Farzad Tabrizi, Barry Kitazumi, David A. Barker, David A. Setton, Leszek Niewmierzycki, Michael J. Kuhlman
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Patent number: 6568552Abstract: A workpiece handling system with dual load locks, a transport chamber and a process chamber. Workpieces may be retrieved from one load lock for processing at vacuum pressure, while workpieces are unloaded from the other load lock at the pressure of the surrounding environment. The transport chamber has a transport robot with two arms. Processed workpieces and new workpieces may be exchanged by a simple under/over motion of the two robot arms. The transport robot rotates about a central shaft to align with the load locks or the process chamber. The robot may also be raised or lowered to align the arms with the desired location to which workpieces are deposited or from which workpieces are retrieved. The two load locks may be positioned one above the other such that a simple vertical motion of the robot can be used to select between the two load locks. The two load locks and transport robot allow almost continuous processing.Type: GrantFiled: August 30, 2000Date of Patent: May 27, 2003Assignee: Mattson Technology, Inc.Inventors: Farzad Tabrizi, Barry Kitazumi, David A. Barker, David A. Setton, Leszek Niewmierzycki, Michael J. Kuhlman
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Patent number: 6315512Abstract: A workpiece handling system with dual load locks, a transport chamber and a process chamber. Workpieces may be retrieved from one load lock for processing at vacuum pressure, while workpieces are unloaded from the other load lock at the pressure of the surrounding envirornment. The transport chamber has a transport robot with two arms. Processed workpieces and new workpieces may be exchanged by a simple under/over motion of the two robot arms. The transport robot rotates about a central shaft to align with the load locks or the process chamber. The robot may also be raised or lowered to align the arms with the desired location to which workpieces are deposited or from which workpieces are retrieved. The two load locks may be positioned one above the other such that a simple vertical motion of the robot can be used to select between the two load locks. The two load locks and transport robot allow almost continuous processing.Type: GrantFiled: November 25, 1998Date of Patent: November 13, 2001Assignee: Mattson Technology, Inc.Inventors: Farzad Tabrizi, Barry Kitazumi, David A. Barker, David A. Setton, Leszek Niewmierzycki, Michael J. Kuhlman