Patents by Inventor David A. Van Gogh

David A. Van Gogh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for determining a position of a robot
    Patent number: 7039501
    Abstract: Generally, a method of determining a position of a robot is provided. In one embodiment, a method of determining a position of a robot comprises acquiring a first set of positional metrics, acquiring a second set of positional metrics and resolving the position of the robot due to thermal expansion using the first set and the second set of positional metrics. Acquiring the first and second set of positional metrics may occur at the same location within a processing system, or may occur at different locations. For example, in another embodiment, the method may comprise acquiring a first set of positional metrics at a first location proximate a processing chamber and acquiring a second set of positional metrics in another location. In another embodiment, substrate center information is corrected using the determined position of the robot.
    Type: Grant
    Filed: April 3, 2003
    Date of Patent: May 2, 2006
    Assignee: Applied Materials, Inc.
    Inventors: Marvin L. Freeman, Jeffrey C. Hudgens, Damon Keith Cox, Chris Holt Pencis, Michael Rice, David A. Van Gogh
  • Method for determining a position of a robot
    Publication number: 20040199291
    Abstract: Generally, a method of determining a position of a robot is provided. In one embodiment, a method of determining a position of a robot comprises acquiring a first set of positional metrics, acquiring a second set of positional metrics and resolving the position of the robot due to thermal expansion using the first set and the second set of positional metrics. Acquiring the first and second set of positional metrics may occur at the same location within a processing system, or may occur at different locations. For example, in another embodiment, the method may comprise acquiring a first set of positional metrics at a first location proximate a processing chamber and acquiring a second set of positional metrics in another location. In another embodiment, substrate center information is corrected using the determined position of the robot.
    Type: Application
    Filed: April 3, 2003
    Publication date: October 7, 2004
    Applicant: Applied Materials, Inc.
    Inventors: Marvin L. Freeman, Jeffrey C. Hudgens, Damon Keith Cox, Chris Holt Pencis, Michael Rice, David A. Van Gogh
  • Method for determining a position of a robot
    Patent number: 6556887
    Abstract: Generally, a method of determining a position of a robot is provided. In one embodiment, a method of determining a position of a robot comprises acquiring a first set of positional metrics, acquiring a second set of positional metrics and resolving the position of the robot due to thermal expansion using the first set and the second set of positional metrics. Acquiring the first and second set of positional metrics may occur at the same location within a processing system, or may occur at different locations. For example, in another embodiment, the method may comprise acquiring a first set of positional metrics at a first location proximate a processing chamber and acquiring a second set of positional metrics in another location. In another embodiment, substrate center information is corrected using the determined position of the robot.
    Type: Grant
    Filed: July 12, 2001
    Date of Patent: April 29, 2003
    Assignee: Applied Materials, Inc.
    Inventors: Marvin L. Freeman, Jeffrey C. Hudgens, Damon Keith Cox, Chris Holt Pencis, Michael Rice, David A. Van Gogh
  • Method for determining a position of a robot
    Publication number: 20030014157
    Abstract: Generally, a method of determining a position of a robot is provided. In one embodiment, a method of determining a position of a robot comprises acquiring a first set of positional metrics, acquiring a second set of positional metrics and resolving the position of the robot due to thermal expansion using the first set and the second set of positional metrics. Acquiring the first and second set of positional metrics may occur at the same location within a processing system, or may occur at different locations. For example, in another embodiment, the method may comprise acquiring a first set of positional metrics at a first location proximate a processing chamber and acquiring a second set of positional metrics in another location. In another embodiment, substrate center information is corrected using the determined position of the robot.
    Type: Application
    Filed: July 12, 2001
    Publication date: January 16, 2003
    Applicant: Applied Materials, Inc.
    Inventors: Marvin L. Freeman, Jeffrey C. Hudgens, Damon Keith Cox, Chris Holt Pencis, Michael Rice, David A. Van Gogh