Patents by Inventor David Bittrich

David Bittrich has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050199585
    Abstract: Methods are provided for processing a substrate including etching conductive materials with amorphous carbon materials disposed thereon. In one aspect, the invention provides a method for processing a substrate including forming a conductive material layer on a surface of the substrate, depositing an amorphous carbon layer on the conductive material layer, etching the amorphous carbon layer to form a patterned amorphous carbon layer, and etching feature definitions in the conductive material layer corresponding to the patterned amorphous carbon layer. The amorphous carbon layer may act as a hardmask, an etch stop, or an anti-reflective coating.
    Type: Application
    Filed: March 12, 2004
    Publication date: September 15, 2005
    Inventors: Yuxiang Wang, David Bittrich, Christopher Bencher, Heraldo Botelho, Sudha Rathi, Michael Kwan