Patents by Inventor David C. Madoux

David C. Madoux has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Post exposure method for enhancing durability of negative working lithographic plates
    Publication number: 20030118944
    Abstract: The durability of negative working lithographic plates is enhanced by post-exposure to a wavelength, or a range of wavelengths, effective to promote further addition polymerization and/or cross-linking reactions. Preferably, the electromagnetic energy used for post-exposure comprises a principal wave length not greater than 300 nanometers.
    Type: Application
    Filed: March 27, 2002
    Publication date: June 26, 2003
    Applicant: Western Litho Plate & Supply Co.
    Inventors: Harry Copeland, Charles J. Kramer, David C. Madoux, William J. Streeter
  • Photosensitive element having an overcoat which increases photo-speed and is substantially impermeable to oxygen
    Patent number: 5786127
    Abstract: This invention relates to a novel photosensitive element comprising: a support having a surface; a photosensitive layer on the surface; and a transparent, protective coating on the photosensitive layer. The photosensitive layer comprises a composition of an ethylenically unsaturated compound and a photo-initiator, and is capable of photo-initiated addition polymerization. The PVA-based protective coating is substantially impermeable to atmospheric oxygen. In accordance with this invention, it has been discovered that photo-speed in a photosensitive element is substantially enhanced if this coating contains a acid, and especially if the coating exhibits an acidic pH, preferably less than about 5.5. The protective coating preferably also contains a second polymer which imparts surface hardness and scratch resistance to the protective coating. The coating may further contain a plasticizer to impart flexibility and inhibit cracking and snow-flaking.
    Type: Grant
    Filed: August 15, 1996
    Date of Patent: July 28, 1998
    Assignee: Western Litho Plate & Supply Co.
    Inventors: David C. Madoux, Edward H. Parker
  • Positive photoresist composition with naphthoquinonediazidesulfonate of oligomeric phenol
    Patent number: 5178986
    Abstract: A radiation sensitive oligomeric compound is described as the photoactive component with a base soluble phenolic matrix resin to provide improved photo-resist composition having high light-sensitivity, high resolution, excellent developer resistance and excellent resistance to thermal flow.
    Type: Grant
    Filed: June 19, 1992
    Date of Patent: January 12, 1993
    Assignee: Shipley Company Inc.
    Inventors: Anthony Zampini, David C. Madoux, Peter Trefonas, III, Charles R. Szmanda
  • Positive dye photoresist compositions with 4,6-bis(azophenyl)resorcinol
    Patent number: 5164279
    Abstract: This invention provides improved positive photoresist compositions containing a bis(azophenyl)resorcinol as a dye.
    Type: Grant
    Filed: December 3, 1990
    Date of Patent: November 17, 1992
    Assignee: Shipley Company Inc.
    Inventors: Peter Trefonas, III, Anthony Zampini, David C. Madoux
  • Quinone diazide containing photoresist composition utilizing mixed solvent of ethyl lactate, anisole and amyl acetate
    Patent number: 5128230
    Abstract: This invention is directed to novel photoresist processes and compositions having high resolution novalac resins, high resolution photoactive components with several diazoquinone groups per molecule, and solvents having a high solvency power, better safety, improved photospeed, higher contrast and equivalent cast film thickness from lower percent solids formulations.
    Type: Grant
    Filed: January 23, 1991
    Date of Patent: July 7, 1992
    Assignee: Shipley Company Inc.
    Inventors: Michael K. Templeton, Anthony Zampini, Peter Trefonas, III, James C. Woodbrey, David C. Madoux, Brian K. Daniels
  • Positive dye photoresist compositions with 2,4-bis(phenylazo)resorcinol
    Patent number: 4983492
    Abstract: This invention provides improved positive photoresist compositions containing a bis(azophenyl)resorcinol as a dye.
    Type: Grant
    Filed: June 6, 1988
    Date of Patent: January 8, 1991
    Assignee: Shipley Company Inc.
    Inventors: Peter Trefonas, III, Anthony Zampini, David C. Madoux