Patents by Inventor David D. Meacham

David D. Meacham has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System for igniting and controlling a wafer processing plasma
    Patent number: 4557819
    Abstract: A circuit for impedance matching an RF source to a plasma load comprises an impedance magnitude control shunted with a parallel-resonant tank circuit to provide a phase control. A DC-blocking capacitor and RF filter are used to monitor the self-bias voltage on a workpiece in the plasma. An ignition control is used to provide prompt ignition of the plasma and a rotating magnet is used to stabilize the plasma.
    Type: Grant
    Filed: July 20, 1984
    Date of Patent: December 10, 1985
    Assignee: Varian Associates, Inc.
    Inventors: David D. Meacham, John J. Haruff