Patents by Inventor David E. Bradley
David E. Bradley has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240139455Abstract: A treatment system includes a first interface having a first side that includes an adhesive and a second side that includes a first magnet. The first interface is configured to attach to skin of a patient such that the first magnet does not contact the skin. The system also includes a second interface that includes a medical device and a second magnet mounted to the medical device. The second magnet is configured to attach to the first magnet such that the medical device is secured to the patient.Type: ApplicationFiled: March 8, 2022Publication date: May 2, 2024Inventors: Abhineet Sharma, Eric M. Bradley, David A. Grayson, Leslie Caldarelli, James E. Jensen, Katie L. Turner
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Patent number: 7786335Abstract: A process for the production of C2-C4 hydrofluorocarbon, such as 1,1,1,3,3-pentafluoropropane, by contacting a non-fluorinated hydrochlorocarbon with a fluorinating agent, such as hydrogen fluoride, in a liquid catalyst system preferably comprising fluorinated superacid catalyst prepared from SbF5, NbF5, TaF5 or TaF5/SnF4 and HF.Type: GrantFiled: November 3, 2008Date of Patent: August 31, 2010Assignee: Honeywell International Inc.Inventors: David E. Bradley, David Nalewajek, Robert L. Bell
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Publication number: 20090149681Abstract: A process for the production of C2-C4 hydrofluorocarbon, such as 1,1,1,3,3-pentafluoropropane, by contacting a non-fluorinated hydrochlorocarbon with a fluorinating agent, such as hydrogen fluoride, in a liquid catalyst system preferably comprising fluorinated superacid catalyst prepared from SbF5, NbF5, TaF5 or TaF5/SnF4 and HF.Type: ApplicationFiled: November 3, 2008Publication date: June 11, 2009Applicant: HONEYWELL INTERNATIONAL INC.Inventors: David E. Bradley, David Nalewajek, Robert L. Bell
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Patent number: 7415580Abstract: A system for determining a position of an element in memory comprising a memory queue with a plurality of separate entries and propagate and generate logic in communication with the memory queue such that the propagate and generate logic is operable to inspect each the separate entry in the memory queue and to output one or more vectors indicating the position of the element in the memory queue.Type: GrantFiled: August 1, 2005Date of Patent: August 19, 2008Assignee: Hewlett-Packard Development Company, L.P.Inventors: David E. Bradley, Fred J. Gross
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Patent number: 6809216Abstract: Provided are fluorine-containing compounds, and polymers derived therefrom, for use in compositions used for treating textile substrates. The present invention further provides methods of making fluorine-containing compounds and polymers derived therefrom, compositions comprising the compounds and/or polymers of the present invention, methods of treating substrates, and the treated products derived therefrom.Type: GrantFiled: June 18, 2002Date of Patent: October 26, 2004Assignee: Honeywell International Inc.Inventors: David E. Bradley, Jing Ji Ma, David Nalewajek, George J. Samuels, Leonard M. Stachura, Michael Van Der Puy
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Patent number: 6743943Abstract: Vinyl ether compounds having the formula: R—O—X—O—CH═CH2 wherein R is a radical selected from R1—CnHm—, R1—CnHm—C(═O)—, R1—CnHm—CH[—O—X—O—CH═CH2—], R1—CnHm—CH[—O—X—O—CH═CH2—]C(═O)—, R1—CnHm—CH[—C(═O)—O—X—O—CH═CH2—], R1—CnHm—CH[—C(═O)—O—X—O—CH═CH2—]C(═O)—, R1—[CFCl—CF2—]pCH2— and HCFCl—CF2—, wherein R1 is hydrogen, an unsubstituted or substituted fluorinated aliphatic radical, an unsubstituted or substituted fluorinated cyclic aliphatic radical, an unsubstituted or substituted fluorinated aromatic radical, an unsubstituted or substituted fluorinated araliphatic radical, or an unsubstituted or substituted fluorinated heterocyclic radType: GrantFiled: May 11, 2001Date of Patent: June 1, 2004Assignee: Honeywell International Inc.Inventors: Russell F. Anderson, David E. Bradley, David Nalewajek, Haridasan K. Nair, Mariola J. Proszowski, Eugene V. Sitzman, Ellen L. Swan
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Patent number: 6579667Abstract: Processes for producing optical devices by the steps of: (a) applying a layer of a photocurable composition onto a substrate; (b) imagewise exposing the photocurable composition to actinic radiation to form exposed and non-exposed areas on the substrate; and (c) removing the imagewise non-exposed areas while leaving the imagewise exposed areas on the substrate; wherein the photocurable composition includes: a curable component having at least one compound of the formula: R—O—X—O—CH═CH2 wherein R is R1—CFH—CF2— or R1—CF═CF—, in which R1 is selected from unsubstituted and substituted aliphatic radicals, unsubstituted and substituted cyclic aliphatic radicals, unsubstituted and substituted aromatic radicals, unsubstituted and substituted araliphatic radicals and unsubstituted and substituted heterocyclic radicals; and X is selected from unsubstituted and substituted aliphatic radicals, unsubstituted and substituted cyclic aliphatic radiType: GrantFiled: October 4, 2002Date of Patent: June 17, 2003Assignee: AlliedSignal Inc.Inventors: Haridasan K. Nair, David Nalewajek, David E. Bradley
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Publication number: 20030092828Abstract: Provided are fluorine-containing compounds, and polymers derived therefrom, for use in compositions used for treating textile substrates. The present invention further provides methods of making fluorine-containing compounds and polymers derived therefrom, compositions comprising the compounds and/or polymers of the present invention, methods of treating substrates, and the treated products derived therefrom.Type: ApplicationFiled: June 18, 2002Publication date: May 15, 2003Inventors: David E. Bradley, Jing Ji Ma, David Nalewajek, George J. Samuels, Leonard M. Stachura, Michael Van Der Puy
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Patent number: 6551469Abstract: A process for preparing 1-chloro-1,1,3,3,3-pentafluoropropane, CF3CH2CF2Cl, comprising contacting in a reaction zone in the substantial absence of oxygen, reactants comprising chlorine and 1,1,1,3,3-pentafluoropropane, CF3CH2CHF2 (also referred to as HFC-245fa), and subjecting the reactants to actinic radiation, such as UV light at about 2,000 to 4,000 Angstroms, wherein: (1) inert gas is present at a concentration equal to or less than about 5 wt. % of the total weight of reactants; (2) the molar ratio of chlorine to CF3CH2CHF2 is from about 0.2:1 to about 1.5:1; and (3) the concentration of chlorinated product produced having greater than one chlorine present in the molecule is less than or equal to about 10 wt. %.Type: GrantFiled: November 27, 2001Date of Patent: April 22, 2003Assignee: Honeywell InternationalInventors: Haridasan K. Nair, Michael Van Der Puy, David Nalewajek, Timothy R. Demmin, Andrew J. Poss, David E. Bradley, Ian R. Shankland, Martin E. Cheney
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Patent number: 6548719Abstract: A process for producing a fluoroolefin of the formula: CF3CY═CXnHp wherein Y is a hydrogen atom or a halogen atom (i.e., fluorine, chlorine, bromine or iodine); X is a hydrogen atom or a halogen atom (i.e., fluorine, chlorine, bromine or iodine); n and p are integers independently equal to 0, 1 or 2, provided that (n+p)=2; comprising contacting, in the presence of a phase transfer catalyst, a compound of the formula: CF3C(R1aR2b)C(R3cR4d), wherein R1, R2, R3, and R4 are independently a hydrogen atom or a halogen selected from the group consisting of fluorine, chlorine, bromine and iodine, provided that at least one of R1, R2, R3, and R4 is halogen and there is at least one hydrogen and one halogen on adjacent carbon atoms; a and b are independently=0, 1 or 2 and (a+b)=2; and c and d are independently=0, 1, 2 or 3 and (c+d)=3; and at least one alkali metal hydroxide.Type: GrantFiled: September 25, 2001Date of Patent: April 15, 2003Assignee: Honeywell InternationalInventors: Haridasan K. Nair, Michael Van Der Puy, David Nalewajek, Timothy R. Demmin, Andrew J. Poss, David E. Bradley, Ian R. Shankland
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Publication number: 20030059714Abstract: Processes for producing optical devices by the steps of:Type: ApplicationFiled: October 4, 2002Publication date: March 27, 2003Inventors: Haridasan K. Nair, David Nalewajek, David E. Bradley
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Publication number: 20030060670Abstract: A process for producing a fluoroolefin of the formula: CF3CY═CXnHp wherein Y is a hydrogen atom or a halogen atom (i.e., fluorine, chlorine, bromine or iodine); X is a hydrogen atom or a halogen atom (i.e., fluorine, chlorine, bromine or iodine); n and p are integers independently equal to 0, 1 or 2, provided that (n+p)=2; comprising contacting, in the presence of a phase transfer catalyst, a compound of the formula: CF3C(R1aR2b) C(R3cR4d), wherein R1, R2, R3, and R4 are independently a hydrogen atom or a halogen selected from the group consisting of fluorine, chlorine, bromine and iodine, provided that at least one of R1, R2, R3, and R4 is halogen and there is at least one hydrogen and one halogen on adjacent carbon atoms; a and b are independently=0, 1 or 2 and (a+b)=2; and c and d are independently=0, 1, 2 or 3 and (c+d)=3; and at least one alkali metal hydroxide.Type: ApplicationFiled: September 25, 2001Publication date: March 27, 2003Inventors: Haridasan K. Nair, Michael Van Der Puy, David Nalewajek, Timothy R. Demmin, Andrew J. Poss, David E. Bradley, Ian R. Shankland
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Patent number: 6466730Abstract: Vinyl ether compounds having the formula: R—O—X—O—CH═CH2 wherein R is a radical having the formula: R1—CFH—CF2— or R1—CF═CF2—, wherein R1 is an unsubstituted or substituted aliphatic radical, an unsubstituted or substituted cyclic aliphatic radical, an unsubstituted or substituted aromatic radical, an unsubstituted or substituted araliphatic radical, or an unsubstituted or substituted heterocyclic radical, and X is an unsubstituted or substituted aliphatic radical, an un-substituted or substituted cyclic aliphatic radical, an unsubstituted or substituted aromatic radical, an unsubstituted or substituted araliphatic radical, or an unsubstituted or substituted heterocyclic radical. Curable compositions containing the vinyl ether compounds and methods in which substrate coating layers of the vinyl ether compositions are cured, particularly on optical devices, are also disclosed, as well as polymers polymerized from the vinyl ether compounds.Type: GrantFiled: July 31, 2001Date of Patent: October 15, 2002Assignee: Honeywell International Inc.Inventors: Haridasan K. Nair, David Nalewajek, David E. Bradley
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Publication number: 20020012516Abstract: Vinyl ether compounds having the formula:Type: ApplicationFiled: July 31, 2001Publication date: January 31, 2002Applicant: AlliedSignal Inc.Inventors: Haridasan Kar Nair, David Nalewajek, David E. Bradley
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Publication number: 20010034458Abstract: Vinyl ether compounds having the formula:Type: ApplicationFiled: May 11, 2001Publication date: October 25, 2001Applicant: AlliedSignal Inc.Inventors: Russell F. Anderson, David E. Bradley, David Nalewajek, Haridasan K. Nair, Mariola J. Proszowski, Eugene V. Sitzmann, Ellen L. Swan
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Patent number: 6308001Abstract: Vinyl ether compounds having the formula: R—O—X—O—CH═CH2 wherein R is a radical having the formula: R1—CFH—CF2— or R1—CF═CF—, wherein R1 is an unsubstituted or substituted aliphatic radical, unsubstituted or substituted cyclic aliphatic radical, an unsubstituted or substituted aromatic radical, an unsubstituted or substituted araliphatic radical, or an unsubstituted or substituted heterocyclic radical, and X is an unsubstituted or substituted aliphatic radical, an unsubstituted or substituted cyclic aliphatic radical, unsubstituted or substituted aromatic radical, unsubstituted or substituted araliphatic radical or an unsubstituted or substituted heterocyclic radical. Curable compositions containing the vinyl ether compounds and methods in which the substrate coating layers of the vinyl ether compositions are cured, particularly on optical devices, are also disclosed, as well as polymers polymerized from the vinyl ether compounds.Type: GrantFiled: December 22, 1998Date of Patent: October 23, 2001Assignee: AlliedSignal Inc.Inventors: Haridasan K. Nair, David Nalewajek, David E. Bradley
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Patent number: 6291704Abstract: Vinyl ether compounds having the formula: R—O—X—O—CH═CH2 wherein R is a radical selected from R1—CnHm—, R1—CnHm—C(═O)—, R1—CnHm—CH[—O—X—O—CH═CH2—], R1—CnHm—CH[—O—X—O—CH═CH2—]C(═O)—, R1—CnHm—CH[—C(═O)—O—X—O—CH═CH2—], R1—CnHm—CH[—C(═O)—O—X—0—CH═CH2—]C(═O)—, R1—[CFCl—CF2—]pCH2— and HCFCl—CF2—, wherein R1 is hydrogen, an unsubstituted or substituted fluorinated aliphatic radical, an unsubstituted or substituted fluorinated cyclic aliphatic radical, an unsubstituted or substituted fluorinated aromatic radical, an unsubstituted or substituted fluorinated araliphatic radical, or an unsubstituted or substituted fluorinated heterocyclic radiType: GrantFiled: March 18, 1999Date of Patent: September 18, 2001Assignee: AlliedSignal Inc.Inventors: Russell F. Anderson, David E. Bradley, David Nalewajek, Haridasan K. Nair, Mariola J. Proszowski, Eugene V. Sitzman, Ellen L. Swan
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Patent number: 6080899Abstract: A process for producing a fluorinated organic compound comprising: (a) reacting an organic starting material with hydrogen fluoride in the presence of a fluorination catalyst and an HFC reaction solvent to produce a product stream containing the fluorinated organic compound wherein the reaction solvent has a boiling point higher than that of the fluorinated organic compound; and (b) recovering the fluorinated organic compound from the product stream.Type: GrantFiled: January 25, 1999Date of Patent: June 27, 2000Assignee: AlliedSignal Inc.Inventors: David E. Bradley, Kevin Benson, David Nalewajek, Alagappan Thenappan
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Patent number: 5633413Abstract: A process for the continuous production of telomers CCl.sub.3 (CH.sub.2 CCl.sub.2).sub.n Cl where n=1-3 (Formula I) by the continuous reaction of CCl.sub.4 and vinylidene chloride in the presence of a solvent and a catalyst. The reaction to form CCl.sub.3 (CH.sub.2 CCl.sub.2)Cl proceeds at a reaction rate constant k.sub.1. If n=1, CCl.sub.3 (CH.sub.2 CCl.sub.2)Cl is continuously removed from the reactor. If n=2, the removed CCl.sub.3 (CH.sub.2 CCl.sub.2)Cl reacts similarly with CCl.sub.4 and CH.sub.2 .dbd.CCl.sub.2 in a second reactor to form and remove CCl.sub.3 (CH.sub.2 CCl.sub.2).sub.2 Cl under conditions to have a reaction rate constant k.sub.2, wherein the ratio of the molar amounts of CCl.sub.4 to CCl.sub.3 (CH.sub.2 CCl.sub.2)Cl reacted is greater than the ratio k.sub.2 /k.sub.1. If n=3, the removed CCl.sub.3 (CH.sub.2 CCl.sub.2).sub.2 Cl similarly reacts in a third reactor with CCl.sub.4 and CH.sub.2 .dbd.CCl.sub.2 to form CCl.sub.3 (CH.sub.2 CCl.sub.2).sub.Type: GrantFiled: August 8, 1995Date of Patent: May 27, 1997Assignee: AlliedSignal Inc.Inventors: Michael Van Der Puy, Timothy R. Demmin, David E. Bradley
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Patent number: 5071062Abstract: A box having a full size configuration and a reduced size configuration is provided. The full size box can hold, for example, an entire pizza. When the full volume is no longer required, the box can be reduced in size by eliminating certain portions thereof by tearing along preformed perforated score lines and folding along specially provided score lines. In accordance with the invention, no tools are required to form the smaller size box from the blank of the full size box. A microwave susceptor material can be provided on the base of the box to crispen leftovers that are heated in a microwave oven.Type: GrantFiled: January 28, 1991Date of Patent: December 10, 1991Inventors: David E. Bradley, Michael A. Jaworski