Patents by Inventor David Felsenthal
David Felsenthal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9147588Abstract: A substrate processing pallet can cool a substrate. A substrate processing pallet can include a base member; an interface pad attachable to the base member, the interface pad having substantially the same coefficient of thermal expansion as the base member and adapted to facilitate cooling of the substrate; and a surface of the base member having features for aligning a substrate on the interface pad. A substrate processing pallet can also include a base member; an interface pad attachable to the base member; an electrostatic chuck for gripping the substrate during processing; an energy storage system for storing energy to sustain the electrostatic chuck at sufficient charge to sustain grip the substrate during processing; and a conduit for transporting gas to a backside of the substrate to facilitate cooling of the substrate.Type: GrantFiled: March 9, 2007Date of Patent: September 29, 2015Assignee: TEL NEXX, INC.Inventors: Daniel Goodman, Arthur Keigler, Stephen Golovato, David Felsenthal
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Publication number: 20110024964Abstract: In one exemplary embodiment, a substrate processing pallet is provided. The substrate processing pallet includes a base member, and an interface pad attachable to the base member. The interface pad has substantially the same coefficient of thermal expansion as the base member and adapted to facilitate cooling of the substrate. The substrate processing pallet also having a surface of the base member having features for aligning a substrate on the interface pad.Type: ApplicationFiled: October 8, 2010Publication date: February 3, 2011Applicant: NEXX SYSTEMS, INC.Inventors: Daniel Goodman, Arthur Keigler, Stephen Golovato, David Felsenthal
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Publication number: 20080220622Abstract: A substrate processing pallet can cool a substrate. A substrate processing pallet can include a base member; an interface pad attachable to the base member, the interface pad having substantially the same coefficient of thermal expansion as the base member and adapted to facilitate cooling of the substrate; and a surface of the base member having features for aligning a substrate on the interface pad. A substrate processing pallet can also include a base member; an interface pad attachable to the base member; an electrostatic chuck for gripping the substrate during processing; an energy storage system for storing energy to sustain the electrostatic chuck at sufficient charge to sustain grip the substrate during processing; and a conduit for transporting gas to a backside of the substrate to facilitate cooling of the substrate.Type: ApplicationFiled: March 9, 2007Publication date: September 11, 2008Inventors: Daniel Goodman, Arthur Keigler, Stephen Golovato, David Felsenthal
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Publication number: 20070209932Abstract: The present invention relates to a sputter deposition system and to methods of use thereof for processing substrates using planetary sputter deposition methods. The sputter deposition system includes a deposition chamber having an azimuthal axis. A rotatable member is situated in the chamber and includes a plurality of magnetrons provided thereon. Each magnetron includes a corresponding one of a plurality of sputtering targets. The rotatable member is configured to position each of the magnetrons to direct sputtered material from the corresponding one of the sputtering targets to a deposition zone defined in the deposition chamber. A transport mechanism is situated in the deposition chamber and includes an arm rotatable about the azimuthal axis. A substrate holder is attached to the arm of the transport mechanism and supports the substrate as the arm rotates the substrate holder to intersect the deposition zone for depositing sputtered material on the substrate.Type: ApplicationFiled: March 10, 2006Publication date: September 13, 2007Applicant: Veeco Instruments Inc.Inventors: Piero Sferlazzo, Ming Mao, Jinliang Chen, David Felsenthal, Robert Hieronymi, Miroslav Eror
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Patent number: 7100954Abstract: An improved Bernoulli end effector for holding, handling, and transporting ultra-thin substrates includes edge guides to aid in the positioning of the substrate and may include friction pads that impede motion of the substrate lifted by the end effector. The Bernoulli end effector may be incorporated into an apparatus and method for supinating a substrate so that both surfaces of the substrate can be processed. In addition, the Bernoulli end effector may be used to place ultra-thin substrates on and retrieve substrates from a substrate handling structure that includes weights that prevent the substrates from bowing or flexing during processing and includes guides that prevent the ultra-thin substrates from moving or translating on the surface of the substrate handling structure.Type: GrantFiled: July 11, 2003Date of Patent: September 5, 2006Assignee: NEXX Systems, Inc.Inventors: Martin P. Klein, Arthur Keigler, David Felsenthal
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Publication number: 20050110291Abstract: An improved Bernoulli end effector for holding, handling, and transporting ultra-thin substrates includes edge guides to aid in the positioning of the substrate and may include friction pads that impede motion of the substrate lifted by the end effector. The Bernoulli end effector may be incorporated into an apparatus and method for supinating a substrate so that both surfaces of the substrate can be processed. In addition, the Bernoulli end effector may be used to place ultra-thin substrates on and retrieve substrates from a substrate handling structure that includes weights that prevent the substrates from bowing or flexing during processing and includes guides that prevent the ultra-thin substrates from moving or translating on the surface of the substrate handling structure.Type: ApplicationFiled: July 11, 2003Publication date: May 26, 2005Applicant: Nexx Systems Packaging, LLCInventors: Martin Klein, Arthur Keigler, David Felsenthal
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Patent number: 6821912Abstract: A substrate processing pallet has a top surface and a plurality of side surfaces. The top surface has at least one recess adapted to receive a substrate. The recess includes a support structure adapted to contact a portion of a substrate seated in the recess and a plurality of apertures each adapted to accommodate a lift pin. Lift pins can extend through the apertures initially to support the substrate and retract to deposit the substrate onto the support structure. A side surface includes a process positioning feature adapted to engage with a feature located in a process chamber to position the pallet. A side surface includes a positioning feature adapted to engage with an end effector alignment feature to position the pallet with respect to the end effector during transport. A side surface includes support features adapted to engage with end effector support features to support the pallet during transport.Type: GrantFiled: July 27, 2001Date of Patent: November 23, 2004Assignee: NEXX Systems Packaging, LLCInventors: Martin P. Klein, David Felsenthal, Piero Sferlazzo
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Patent number: 6682288Abstract: A substrate processing pallet has a top surface and a plurality of side surfaces. The top surface has at least one recess adapted to receive a substrate. The recess includes a support structure adapted to contact a portion of a substrate seated in the recess and a plurality of apertures each adapted to accommodate a lift pin. Lift pins can extend through the apertures initially to support the substrate and retract to deposit the substrate onto the support structure. A side surface includes a process positioning feature adapted to engage with a feature located in a process chamber to position the pallet. A side surface includes a positioning feature adapted to engage with an end effector alignment feature to position the pallet with respect to the end effector during transport. A side surface includes support features adapted to engage with end effector support features to support the pallet during transport.Type: GrantFiled: July 27, 2001Date of Patent: January 27, 2004Assignee: Nexx Systems Packaging, LLCInventors: Martin P. Klein, David Felsenthal, Piero Sferlazzo
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Patent number: 6530733Abstract: A substrate processing pallet has a top surface and a plurality of side surfaces. The top surface has at least one recess adapted to receive a substrate. The recess includes a support structure adapted to contact a portion of a substrate seated in the recess and a plurality of apertures each adapted to accommodate a lift pin. Lift pins can extend through the apertures initially to support the substrate and retract to deposit the substrate onto the support structure. A side surface includes a process positioning feature adapted to engage with a feature located in a process chamber to position the pallet. A side surface includes a positioning feature adapted to engage with an end effector alignment feature to position the pallet with respect to the end effector during transport. A side surface includes support features adapted to engage with end effector support features to support the pallet during transport.Type: GrantFiled: July 27, 2001Date of Patent: March 11, 2003Assignee: Nexx Systems Packaging, LLCInventors: Martin P. Klein, David Felsenthal, Piero Sferlazzo
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Publication number: 20020034883Abstract: A substrate processing pallet has a top surface and a plurality of side surfaces. The top surface has at least one recess adapted to receive a substrate. The recess includes a support structure adapted to contact a portion of a substrate seated in the recess and a plurality of apertures each adapted to accommodate a lift pin. Lift pins can extend through the apertures initially to support the substrate and retract to deposit the substrate onto the support structure. A side surface includes a process positioning feature adapted to engage with a feature located in a process chamber to position the pallet. A side surface includes a positioning feature adapted to engage with an end effector alignment feature to position the pallet with respect to the end effector during transport. A side surface includes support features adapted to engage with end effector support features to support the pallet during transport.Type: ApplicationFiled: July 27, 2001Publication date: March 21, 2002Inventors: Martin P. Klein, David Felsenthal, Piero Sferlazzo
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Publication number: 20020034429Abstract: A substrate processing pallet has a top surface and a plurality of side surfaces. The top surface has at least one recess adapted to receive a substrate. The recess includes a support structure adapted to contact a portion of a substrate seated in the recess and a plurality of apertures each adapted to accommodate a lift pin. Lift pins can extend through the apertures initially to support the substrate and retract to deposit the substrate onto the support structure. A side surface includes a process positioning feature adapted to engage with a feature located in a process chamber to position the pallet. A side surface includes a positioning feature adapted to engage with an end effector alignment feature to position the pallet with respect to the end effector during transport. A side surface includes support features adapted to engage with end effector support features to support the pallet during transport.Type: ApplicationFiled: July 27, 2001Publication date: March 21, 2002Inventors: Martin P. Klein, David Felsenthal, Piero Sferlazzo
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Publication number: 20020033133Abstract: A substrate processing pallet has a top surface and a plurality of side surfaces. The top surface has at least one recess adapted to receive a substrate. The recess includes a support structure adapted to contact a portion of a substrate seated in the recess and a plurality of apertures each adapted to accommodate a lift pin. Lift pins can extend through the apertures initially to support the substrate and retract to deposit the substrate onto the support structure. A side surface includes a process positioning feature adapted to engage with a feature located in a process chamber to position the pallet. A side surface includes a positioning feature adapted to engage with an end effector alignment feature to position the pallet with respect to the end effector during transport. A side surface includes support features adapted to engage with end effector support features to support the pallet during transport.Type: ApplicationFiled: July 27, 2001Publication date: March 21, 2002Inventors: Martin P. Klein, David Felsenthal, Piero Sferlazzo
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Patent number: 6328858Abstract: A multi-layer sputter deposition chamber or cluster tool module is described. The sputter deposition chamber includes a plurality of magnetrons mounted on a rotatable member that defines an aperture. A predetermined one of the plurality of magnetrons is positionable proximate to a substrate in the sputter deposition chamber. A transport mechanism transports the substrate in a path of the sputtered ions in a first and a second direction that is substantially opposite to the first direction.Type: GrantFiled: September 23, 1999Date of Patent: December 11, 2001Assignee: NEXX Systems Packaging, LLCInventors: David Felsenthal, Chunghsin Lee, Piero Sferlazzo
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Patent number: 6217272Abstract: An apparatus for simultaneously transporting and processing substrates is described. The apparatus includes a load lock that stores at least one substrate prior to processing and that stores at least one substrate after processing. A first transport mechanism transports at least one substrate into and out of the load lock. A multi-stage elevator is adapted to receive the first transport mechanism. A first process chamber is vertically disposed from the multi-stage elevator. The multi-stage elevator vertically transports at least one substrate into and out of the first process chamber. A second process chamber may be coupled to the multi-stage elevator. A second transport mechanism transports at least one substrate between the multi-stage elevator and the second process chamber.Type: GrantFiled: September 23, 1999Date of Patent: April 17, 2001Assignee: Applied Science and Technology, Inc.Inventors: David Felsenthal, Chunghsin Lee, Piero Sferlazzo