Patents by Inventor David Francis CASEY, JR.

David Francis CASEY, JR. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10500546
    Abstract: It can be difficult to remove atomically thin films, such as graphene, graphene-based material and other two-dimensional materials, from a growth substrate and then to transfer the thin films to a secondary substrate. Tearing and conformality issues can arise during the removal and transfer processes. Processes for forming a composite structure by manipulating a two-dimensional material, such as graphene or graphene-base material, can include: providing a two-dimensional material adhered to a growth substrate; depositing a supporting layer on the two-dimensional material while the two-dimensional material is adhered to the growth substrate; and releasing the two-dimensional material from the growth substrate, the two-dimensional material remaining in contact with the supporting layer following release of the two-dimensional material from the growth substrate.
    Type: Grant
    Filed: January 29, 2015
    Date of Patent: December 10, 2019
    Assignee: Lockheed Martin Corporation
    Inventors: Steven Lloyd Sinsabaugh, Peter V. Bedworth, David Francis Casey, Jr., Scott E. Heise, Steven W. Sinton, Randall Mark Stoltenberg, Jacob Louis Swett
  • Publication number: 20150217219
    Abstract: It can be difficult to remove atomically thin films, such as graphene, graphene-based material and other two-dimensional materials, from a growth substrate and then to transfer the thin films to a secondary substrate. Tearing and conformality issues can arise during the removal and transfer processes. Processes for forming a composite structure by manipulating a two-dimensional material, such as graphene or graphene-base material, can include: providing a two-dimensional material adhered to a growth substrate; depositing a supporting layer on the two-dimensional material while the two-dimensional material is adhered to the growth substrate; and releasing the two-dimensional material from the growth substrate, the two-dimensional material remaining in contact with the supporting layer following release of the two-dimensional material from the growth substrate.
    Type: Application
    Filed: January 29, 2015
    Publication date: August 6, 2015
    Inventors: Steven Lloyd SINSABAUGH, Peter V. BEDWORTH, David Francis CASEY, JR., Scott E. HEISE, Steven W. SINTON, Randall Mark STOLTENBERG, Jacob Louis SWETT