Patents by Inventor David H. Narum

David H. Narum has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods and systems including pulsed dual-beam charge neutralization
    Patent number: 11915901
    Abstract: Surface imaging apparatuses, surface analysis apparatuses, methods based on detection of secondary electrons or secondary ions that include a spatially scanned and DC or pulsed primary excitation source resulting in secondary electrons or secondary ions which are detected and provide the modulated signal for imaging of the sample; and dual polarity flood beams to effect neutralization of surface charge and surface potential variation.
    Type: Grant
    Filed: August 27, 2021
    Date of Patent: February 27, 2024
    Assignee: ULVAC-PHI, INCORPORATED
    Inventors: Scott R. Bryan, Gregory L. Fisher, David H. Narum, Ronald E. Negri
  • METHODS AND SYSTEMS INCLUDING PULSED DUAL-BEAM CHARGE NEUTRALIZATION
    Publication number: 20230245848
    Abstract: Surface imaging apparatuses, surface analysis apparatuses, methods based on detection of secondary electrons or secondary ions that include a spatially scanned and DC or pulsed primary excitation source resulting in secondary electrons or secondary ions which are detected and provide the modulated signal for imaging of the sample; and dual polarity flood beams to effect neutralization of surface charge and surface potential variation.
    Type: Application
    Filed: August 27, 2021
    Publication date: August 3, 2023
    Inventors: Scott R. Bryan, Gregory L. Fisher, David H. Narum, Ronald E. Negri
  • Method and apparatus for laser machining
    Patent number: 10493559
    Abstract: Laser processing is enhanced by using endpointing or by using a charged particle beam together with a laser. End-pointing uses emissions, such as photons, electrons, ions, or neutral particles, from the substrate to determine when the material under the laser has changed or is about to change. Material removed from the sample can be deflected to avoid deposition onto the laser optics.
    Type: Grant
    Filed: July 8, 2009
    Date of Patent: December 3, 2019
    Assignee: FEI Company
    Inventors: Marcus Straw, David H. Narum, Milos Toth, Mark Utlaut, Guido Knippels, Gerardus Nicolaas Anne Van Veen
  • Localized, in-vacuum modification of small structures
    Patent number: 9812286
    Abstract: A charge transfer mechanism is used to locally deposit or remove material for a small structure. A local electrochemical cell is created without having to immerse the entire work piece in a bath. The charge transfer mechanism can be used together with a charged particle beam or laser system to modify small structures, such as integrated circuits or micro-electromechanical system. The charge transfer process can be performed in air or, in some embodiments, in a vacuum chamber.
    Type: Grant
    Filed: December 22, 2015
    Date of Patent: November 7, 2017
    Assignee: FEI Company
    Inventors: David H. Narum, Milos Toth, Steven Randolph, Aurelien Philippe Jean Maclou Botman
  • LOCALIZED, IN-VACUUM MODIFICATION OF SMALL STRUCTURES
    Publication number: 20160189920
    Abstract: A charge transfer mechanism is used to locally deposit or remove material for a small structure. A local electrochemical cell is created without having to immerse the entire work piece in a bath. The charge transfer mechanism can be used together with a charged particle beam or laser system to modify small structures, such as integrated circuits or micro-electromechanical system. The charge transfer process can be performed in air or, in some embodiments, in a vacuum chamber.
    Type: Application
    Filed: December 22, 2015
    Publication date: June 30, 2016
    Applicant: FEI Company
    Inventors: David H. Narum, Milos Toth, Steven Randolph, Aurelien Philippe Jean Maclou Botman
  • Localized, in-vacuum modification of small structures
    Patent number: 9255339
    Abstract: A charge transfer mechanism is used to locally deposit or remove material for a small structure. A local electrochemical cell is created without having to immerse the entire work piece in a bath. The charge transfer mechanism can be used together with a charged particle beam or laser system to modify small structures, such as integrated circuits or microelectromechanical system. The charge transfer process can be performed in air or, in some embodiments, in a vacuum chamber.
    Type: Grant
    Filed: September 19, 2011
    Date of Patent: February 9, 2016
    Assignee: FEI Company
    Inventors: Aurelien Philippe Jean Maclou Botman, Milos Toth, Steven Randolph, David H. Narum
  • Localized, In-Vacuum Modification of Small Structures
    Publication number: 20130068611
    Abstract: A charge transfer mechanism is used to locally deposit or remove material for a small structure. A local electrochemical cell is created without having to immerse the entire work piece in a bath. The charge transfer mechanism can be used together with a charged particle beam or laser system to modify small structures, such as integrated circuits or micro-electromechanical system. The charge transfer process can be performed in air or, in some embodiments, in a vacuum chamber.
    Type: Application
    Filed: September 19, 2011
    Publication date: March 21, 2013
    Applicant: FEI Company
    Inventors: Aurelien Philippe Jean Maclou Botman, Milos Toth, Steven Randolph, David H. Narum
  • Method And Apparatus For Laser Machining
    Publication number: 20120103945
    Abstract: Laser processing is enhanced by using endpointing or by using a charged particle beam together with a laser. End-pointing uses emissions, such as photons, electrons, ions, or neutral particles, from the substrate to determine when the material under the laser has changed or is about to change. Material removed from the sample can be deflected to avoid deposition onto the laser optics.
    Type: Application
    Filed: July 8, 2009
    Publication date: May 3, 2012
    Applicant: FEI COMPANY
    Inventors: Marcus Straw, David H. Narum, Milos Toth, Mark Utlaut, Guido Knippels, Gerardus Nicolaas Van Veen
  • Multibeam System
    Publication number: 20110163068
    Abstract: A multibeam system in which a charged particle beam and one or more additional beams can be directed to the target within a single vacuum chamber. A first beam colunm preferably produces a beam for rapid processing, and a second beam column produces a beam for more precise processing. A third beam column can be used to produce a beam useful for forming an image of the sample while producing little or no change in the sample.
    Type: Application
    Filed: January 9, 2009
    Publication date: July 7, 2011
    Inventors: Mark Utlaut, Noel Smith, Paul P. Tesch, Tom Miller, David H. Narum, David Tuggle, Lawrence Scipioni