Patents by Inventor David HAMMERICH

David HAMMERICH has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Coated semiconductor processing members having chlorine and fluorine plasma erosion resistance and complex oxide coatings therefor
    Patent number: 10388492
    Abstract: A semiconductor processing member is provided, including a body and a plasma spray coating provided on the body. The coating is an ABO or ABCO complex oxide solid solution composition, where A, B and C are selected from the group consisting of La, Zr, Ce, Gd, Y, Yb and Si, and O is an oxide. The coating imparts both chlorine and fluorine plasma erosion resistance, reduces particle generation during plasma etching, and prevents spalling of the coating during wet cleaning of the semiconductor processing member.
    Type: Grant
    Filed: August 26, 2016
    Date of Patent: August 20, 2019
    Assignee: FM Industries, Inc.
    Inventors: Mahmood Naim, David Hammerich
  • COATED SEMICONDUCTOR PROCESSING MEMBERS HAVING CHLORINE AND FLUORINE PLASMA EROSION RESISTANCE AND COMPLEX OXIDE COATINGS THEREFOR
    Publication number: 20170301519
    Abstract: A semiconductor processing member is provided, including a body and a plasma spray coating provided on the body. The coating is an ABO or ABCO complex oxide solid solution composition, where A, B and C are selected from the group consisting of La, Zr, Ce, Gd, Y, Yb and Si, and O is an oxide. The coating imparts both chlorine and fluorine plasma erosion resistance, reduces particle generation during plasma etching, and prevents spalling of the coating during wet cleaning of the semiconductor processing member.
    Type: Application
    Filed: August 26, 2016
    Publication date: October 19, 2017
    Applicant: FM Industries, Inc.
    Inventors: Mahmood NAIM, David HAMMERICH
  • Emissivity controlled coatings for semiconductor chamber components
    Patent number: 9790581
    Abstract: A component for a semiconductor processing chamber, the component including a substrate and a coating layer provided on a surface of the substrate, wherein the coating layer includes at least a first coating layer having a thermal emissivity of more than 0.98 to 1, having plasma resistance, and having a color value L in a range of 35 to 40 through a thickness direction thereof.
    Type: Grant
    Filed: December 8, 2014
    Date of Patent: October 17, 2017
    Assignee: FM Industries, Inc.
    Inventors: Mahmood Naim, David Hammerich
  • EMISSIVITY CONTROLLED COATINGS FOR SEMICONDUCTOR CHAMBER COMPONENTS
    Publication number: 20150376760
    Abstract: A component for a semiconductor processing chamber, the component including a substrate and a coating layer provided on a surface of the substrate, wherein the coating layer includes at least a first coating layer having a thermal emissivity of more than 0.98 to 1, having plasma resistance, and having a color value L in a range of 35 to 40 through a thickness direction thereof.
    Type: Application
    Filed: December 8, 2014
    Publication date: December 31, 2015
    Inventors: Mahmood NAIM, David HAMMERICH