Patents by Inventor David Hartzell Leebrick

David Hartzell Leebrick has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process control monitor and technique for thick photo-resist photolithographic processes
    Patent number: 9087787
    Abstract: A process control monitor for determination of alignment between layers of a semiconductor structure includes a patterned layer having a plurality of lines formed on a base layer, the plurality of lines enclosed within a circle. A photo-resist layer is deposited on top of the base layer and over the patterned layer. The photo-resist layer may be patterned to include an opening that exposes a portion of the base layer adjacent the patterned layer and that exposes a portion of the patterned layer. Alignment between the patterned layer and the patterned photo-resist layer may be determined according to a contrast between the exposed portion of the base layer and the exposed portion of the patterned layer.
    Type: Grant
    Filed: February 28, 2014
    Date of Patent: July 21, 2015
    Assignee: Avago Technologies General IP (Singapore) Pte. Ltd.
    Inventors: Osvaldo Buccafusca, Jim Roland, David Hartzell Leebrick