Abstract: A substrate transfer door assembly includes a body, one or more radiating elements, a member, and at least one lifting coupler. The body includes a central portion. At least the central portion of the body operates as a substrate transfer door and covers at least one of an opening of a liner or an opening of a chamber wall of a substrate processing chamber. The one or more radiating elements radiating heat away from the body. The member extends from the body. The at least one lifting coupler is connected to the member and movable in a vertical direction between an open position and a closed position to cover the at least one of the opening of the liner or the opening of the chamber wall with the central portion of the body.

Abstract: A lift system removes a display unit or components thereof from a tiled display wall in a way that minimizes the risk of damaging the removed display unit and other display units in the tiled display wall. A lifting structure is configured to selectively lift one or more display units away from the desired display unit when the lifting structure is raised by a vertical motion actuator. The lifting structure is further configured to be free to rotate slightly about a vertical axis when lifting the display units, so that the lifted display units are not constrained to purely vertical translation when lifted away from the desired display unit.

Abstract: A latch system couples precision frames in a way that does not over-constrain the coupled frames. The position of a female latching device mounted to one precision frame is adjustable so that, prior to coupling, the latching device can be aligned to a fixed pin that is part of a fixed pin assembly mounted to a second precision frame. Once positioned, the female latching device is fixed in position with respect to the pin and mechanically coupled to the pin, so that the first and second precision frames are not distorted when the coupling takes place. Such latch systems can be used to provide a rigid and over-constrained connection between two structures that does not contain interference fits or the resultant deflection associated with interference fits.

Abstract: A latch system couples precision frames in a way that does not over-constrain the coupled frames. The position of a female latching device mounted to one precision frame is adjustable so that, prior to coupling, the latching device can be aligned to a fixed pin that is part of a fixed pin assembly mounted to a second precision frame. Once positioned, the female latching device is fixed in position with respect to the pin and mechanically coupled to the pin, so that the first and second precision frames are not distorted when the coupling takes place. Such latch systems can be used to provide a rigid and over-constrained connection between two structures that does not contain interference fits or the resultant deflection associated with interference fits.

Abstract: A lift system removes a display unit or components thereof from a tiled display wall in a way that minimizes the risk of damaging the removed display unit and other display units in the tiled display wall. A lifting structure is configured to selectively lift one or more display units away from the desired display unit when the lifting structure is raised by a vertical motion actuator. The lifting structure is further configured to be free to rotate slightly about a vertical axis when lifting the display units, so that the lifted display units are not constrained to purely vertical translation when lifted away from the desired display unit.

Abstract: An apparatus and method are provided for treating pollutants in a gaseous stream. The apparatus comprises tubular inlets for mixing a gas stream with other oxidative and inert gases for mixture within a reaction chamber. The reaction chamber is heated by heating elements and has orifices through which cool or heated air enters into the central reaction chamber. A process is also provided whereby additional gases are added to the gaseous stream preferably within the temperature range of 650 C-950 C which minimizes or alleviates the production of NOx.

Abstract: An apparatus and method are provided for treating pollutants in a gaseous stream. The apparatus comprises tubular inlets for mixing a gas stream with other oxidative and inert gases for mixture within a reaction chamber. The reaction chamber is heated by heating elements and has orifices through which cool or heated air enters into the central reaction chamber. A process is also provided whereby additional gases are added to the gaseous stream preferably within the temperature range of 650 C.-950 C. which minimizes or alleviates the production of NOx.

Abstract: An apparatus and method are provided for treating pollutants in a gaseous stream. The apparatus comprises tubular inlets for mixing a gas stream with other oxidative and inert gases for mixture within a reaction chamber. The reaction chamber is heated by heating elements and has orifices through which cool or heated air enters into the central reaction chamber. A process is also provided whereby additional gases are added to the gaseous stream preferably within the temperature range of 650 C.-950° C. which minimizes or alleviates the production of NOx.