Abstract: A single input multiple output plasma control system includes a splitter that receives a single input and generates multiple outputs. Each output from the splitter is provided to a load. The splitter includes branch circuits connected between selected splitter outputs. The branch circuits control voltage, current, power, frequency, or phase between each branch to enable controlling a predetermined relationship between the voltage, current, power, impedance, frequency, or phase measured at each load.

Abstract: A radio frequency (RF) control system including a RF generator having a power amplifier that outputs a RF signal and a controller. A matching network receives the RF signal and generates at least one RF output signal. In a first mode of operation, the controller enables adjustment of the frequency of the RF signal and a tune element of the matching network to achieve an impedance match and in a second mode of operation the controller enables adjustment of only the tune element of the matching network to achieve an impedance match while the frequency is adjusted to a target frequency. The RF controls system operates in a continuous and pulse mode of operation.

Abstract: A radio frequency (RF) control system including a RF generator having a power amplifier that outputs a RF signal and a controller. A matching network receives the RF signal and generates at least one RF output signal. In a first mode of operation, the controller enables adjustment of the frequency of the RF signal and a tune element of the matching network to achieve an impedance match and in a second mode of operation the controller enables adjustment of only the tune element of the matching network to achieve an impedance match while the frequency is adjusted to a target frequency. The RF controls system operates in a continuous and pulse mode of operation.

Abstract: An eVC including coarse and fine tuning networks. The coarse tuning network includes a circuit: receiving a RF input signal from a RF generator; outputting a RF output signal to a reference terminal or load; and receiving a DC bias voltage. The circuit is switched between first and second states. A capacitance of the circuit is based on the DC bias voltage while in the first state and is not based on the DC bias voltage while in the second state. The fine tuning network is connected in parallel with the coarse tuning network and includes a varactor. The varactor includes: a first diode receiving the RF input signal; and a second diode connected in a back-to-back configuration with the first diode and outputting a RF output signal to the reference terminal or load. A capacitance of the varactor is based on a second received DC bias voltage.

Abstract: A radio frequency (RF) control system including a RF generator having a power amplifier that outputs a RF signal and a controller. A matching network receives the RF signal and generates a plurality of RF output signals. The matching network includes a ratio tuning element to vary a ratio of power between the plurality of RF output signals. The first controller communicates a ratio control signal to the matching network, and the matching network controls the ratio tuning element in accordance with the ratio control signal. The RF controls system operates in a continuous and pulse mode of operation. The controller can also control the rise or fall of a pulse edge or a level or duration of incremental changes in the pulse edge.

Abstract: A system for controlling RF power supplies applying power to a load, such as a plasma chamber, includes a master power supply and a slave power supply. The master power supply provides a control signal, such as a frequency and phase signal, to the slave power supply. The slave power supply receives the frequency and phase signal and also receives signals characteristic of the spectral emissions detected from the load. The slave RF power supply varies the phase and power of its RF output signal applied to the load. Varying the power controls the width of an ion distribution function, and varying the phase controls a peak of the ion distribution. Depending upon the coupling between the RF generators and the load, different spectral emissions are detected, including first harmonics, second harmonics, and, in the case of a dual frequency drive system, intermodulation distortion.

Abstract: A radio frequency (RF) control system including a RF generator having a power amplifier that outputs a RF signal and a controller. A matching network receives the RF signal and generates at least one RF output signal. In a first mode of operation, the controller enables adjustment of the frequency of the RF signal and a tune element of the matching network to achieve an impedance match and in a second mode of operation the controller enables adjustment of only the tune element of the matching network to achieve an impedance match while the frequency is adjusted to a target frequency. The RF controls system operates in a continuous and pulse mode of operation.

Abstract: A radio frequency (RF) control system including a RF generator having a power amplifier that outputs a RF signal and a controller. A matching network receives the RF signal and generates a plurality of RF output signals. The matching network includes a ratio tuning element to vary a ratio of power between the plurality of RF output signals. The first controller communicates a ratio control signal to the matching network, and the matching network controls the ratio tuning element in accordance with the ratio control signal. The RF controls system operates in a continuous and pulse mode of operation. The controller can also control the rise or fall of a pulse edge or a level or duration of incremental changes in the pulse edge.

Abstract: A RF power supply system for delivering periodic RF power to a load. A power amplifier outputs a RF signal to the load. A sensor measures the RF signal provided to the load and outputs signals that vary in accordance with the RF signal. A first feedback loop enables control the RF signal based upon power determined in accordance with output from the sensor. A second feedback loop enables control the RF signal based upon energy measured in accordance with signals output from the sensor. Energy amplitude and duration provide control values for varying the RF signal. The control system and techniques are applicable to both pulsed RF power supplies and in various instances to continuous wave power supplies.

Abstract: A system has a first RF generator and a second RF generator. The first RF generator controls the frequency of the second RF generator. The first RF generator includes a power source, a sensor, and a sensor signal processing unit. The sensor signal processing unit is coupled to the power source and to the sensor. The sensor signal processing unit scales the frequency of the first RF generator to control the frequency of the second RF generator.

Abstract: A radio frequency sensor system includes a printed circuit board (PCB). The PCB includes a first exterior layer, a second exterior layer, a first interior layer, a second interior layer, and an inner perimeter that defines an aperture through the PCB. The PCB also includes a first loop. The first loop includes a first plurality of sensor pads coupled to a first plurality of vias by a first plurality of traces. The first plurality of sensor pads is arranged on the inner perimeter. The PCB also includes a second loop. The second loop includes a second plurality of sensor pads coupled to a second plurality of vias by a second plurality of traces. The second plurality of sensor pads is arranged on the inner perimeter. A core ring is embedded within the first interior layer proximal to the first plurality of sensor pads, the first plurality of vias, and the first plurality of traces. A center conductor, for carrying RF current, extends through the aperture.

Abstract: A system for detecting and correcting for spurious frequencies that may coincide in a bandwidth of interest in an RF metrology system. The system can (1) utilize a deterministic scheme to detect an interference by a spurious frequency and correct the distortion effect or (2) utilize a mixed signal processing architecture to avoid the occurrence of spurious frequency contamination. A detection scheme identifies the event of distortion and triggers either (a) a shift in the analog to digital convert sample rate or (b) a mathematical vector manipulation. The shift of the analog to digital convert sample rate moves an aliased image of the spurious frequency outside of the frequency of interest. The mathematical vector correction removes the distortion and restores the signal of interest.

Abstract: A scalable radio frequency (RF) generator system including at least one power supply, at least one power amplifier receiving input from the power supply, and a power supply control module, and a system controller. Output from the at least one power supply can be combined and applied to each of the power amplifiers. Output form each of the at least one power amplifiers can be combined to generate a single RF signal. A compensator module controls operation of the at least one power supply. The compensator module, system control module, and power supply controller communicate in a daisy chain configuration.

Abstract: A radio frequency (RF) system is disclosed. The RF system includes an RF sensor, an analog to digital converter (ADC) module, a processing module, and a synchronization module. The RF sensor measures a parameter of an RF output and generates an RF signal based on the parameter. The ADC module converts samples of the RF signal into digital values. The processing module generates processed values based on the digital values. The synchronization module outputs one of the processed values in response to a transition in the RF output.

Abstract: A radio frequency system includes a power amplifier that outputs a radio frequency signal to a matching network via a transmission line between the power amplifier and the matching network. A sensor monitors the radio frequency signal and generates first sensor signals based on the radio frequency signal. A distortion module determines a first distortion value according to at least one of (i) a sinusoidal function of the first sensor signals and (ii) a cross-correlation function of the first sensor signals. A first correction circuit (i) generates a first impedance tuning value based on the first distortion value and a first predetermined value, and (ii) provides feedforward control of impedance matching performed within the matching network including outputting the first impedance tuning value to one of the power amplifier and the matching network.

Abstract: Controlling a phase and/or a frequency of a RF generator. The RF generator includes a power source, a sensor, and a sensor signal processing unit. The sensor signal processing unit is coupled to the power source and to the sensor. The sensor signal processing unit controls the phase and/or the frequency of a RF generator.

Abstract: A system has a first RF generator and a second RF generator. The first RF generator controls the frequency of the second RF generator. The first RF generator includes a power source, a sensor, and a sensor signal processing unit. The sensor signal processing unit is coupled to the power source and to the sensor. The sensor signal processing unit scales the frequency of the first RF generator to control the frequency of the second RF generator.

Abstract: A RF power supply system for delivering periodic RF power to a load. A power amplifier outputs a RF signal to the load. A sensor measures the RF signal provided to the load and outputs signals that vary in accordance with the RF signal. A first feedback loop enables control the RF signal based upon power determined in accordance with output from the sensor. A second feedback loop enables control the RF signal based upon energy measured in accordance with signals output from the sensor. Energy amplitude and duration provide control values for varying the RF signal. The control system and techniques are applicable to both pulsed RF power supplies and in various instances to continuous wave power supplies.

Abstract: A radio frequency (RF) system is disclosed. The RF system includes an RF sensor, an analog to digital converter (ADC) module, a processing module, and a synchronization module. The RF sensor measures a parameter of an RF output and generates an RF signal based on the parameter. The ADC module converts samples of the RF signal into digital values. The processing module generates processed values based on the digital values. The synchronization module outputs one of the processed values in response to a transition in the RF output.

Abstract: A distortion module includes a first module, at least one module and a correction module. The first module is configured to (i) receive radio frequency signals from radio frequency sensors of a power amplifier, and (ii) generate a distortion signal indicating distortion values for the radio frequency signals. The radio frequency signals are indicative of radio frequency power out of the power amplifier and received by a transmission line. At least one module is configured to estimate a phase of the distortion signal. The phase of the distortion signal is indicative of a phase of the transmission line. The correction module is configured to generate a distortion correction signal based on the phase to correct at least one of the distortion values of the radio frequency signals.