Patents by Inventor David John Pinckney

David John Pinckney has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110308766
    Abstract: A system and method for improving the efficiency of air handling units by reducing the static air pressure within units. The system and method utilizes rotary union mounts to fluidly connect the heating and cooling coils within the system. The rotary union mounts allow the heating and/or cooling coils to be rotated flush within the housing of the air handling unit when the coil(s) are not in use and thereby out of the air flow path. Rotating the coils out of the air flow path reduces the static air pressure within the air handling unit and significantly improves the efficiency of the system by reducing the horsepower requirement and power consumption of the system fan. The rotary union mounts allow the coil(s) to be selectably rotated out of the air flow path based on system demand requirements.
    Type: Application
    Filed: June 22, 2010
    Publication date: December 22, 2011
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Robert Louis DeAngelis, John G. Hutsko, David John Pinckney, Uldis A. Ziemins
  • Patent number: 5742065
    Abstract: A method for reducing contamination in a silicon membrane mask in a lithography system is described. The method includes: doping the top surface of the silicon membrane mask with boron to lower the electrical resistance of the mask; subsequently metalizing the surface of the mask to further lower its electrical resistance; and, finally, applying a voltage between opposite surfaces of the mask, the voltage generating an electric field that passes through the membrane mask, heating the membrane mask. The method further includes: calculating distortions in the shape of each of the patterns within the mask caused by heating the membrane mask; compensating for the proximity of other shapes positioned in the vicinity of each of the patterns; and appropriately modifying the shape of each of the patterns. The above described method can be equally applied to an e-beam system or to an ion-beam lithography system, and both, to stencil masks and to scattering masks.
    Type: Grant
    Filed: January 22, 1997
    Date of Patent: April 21, 1998
    Assignee: International Business Machines Corporation
    Inventors: Michael Stuart Gordon, Rodney Arthur Kendall, David John Pinckney, James Louis Speidell