Abstract: A deposition system for depositing a chemical vapor onto a workpiece is disclosed, including a deposition chamber having a plurality of components for performing chemical vapor deposition on the workpiece. The workpiece is held by a lathe that rotates the workpiece relative to chemical burners that deposit silica soot on the workpiece. The deposition system has a gas panel for regulating the flow of gases and vapors into the deposition chamber, and a computer for controlling operation of the gas panel and the components in the deposition chamber. Multiple sets of chemical burners are disposed longitudinally along the length of the workpiece. Each set of burners is separated from other sets, such that each set of burners deposit silica particles onto generally different portions of a workpiece. The respective portions include an overlap segment in which one or more burners from one burner set will deposit silica particles on the same portion of the workpiece as one or more burners from another set.

Abstract: A deposition system for depositing a chemical vapor onto a workpiece is disclosed, including a deposition chamber having a plurality of components for performing chemical vapor deposition on the workpiece. The workpiece is held by a lathe that rotates the workpiece relative to chemical burners that deposit silica soot on the workpiece. The deposition system has a gas panel for regulating the flow of gases and vapors into the deposition chamber, and a computer for controlling operation of the gas panel and the components in the deposition chamber. Multiple sets of chemical burners are disposed longitudinally along the length of the workpiece. Each set of burners is separated from other sets, such that each set of burners deposit silica particles onto generally different portions of a workpiece. The respective portions include an overlap segment in which one or more burners from one burner set will deposit silica particles on the same portion of the workpiece as one or more burners from another set.

Abstract: A deposition system for depositing a chemical vapor onto a workpiece is disclosed, including a deposition chamber having a plurality of components for performing chemical vapor deposition on the workpiece. The workpiece is held by a lathe that rotates the workpiece relative to chemical burners that deposit silica soot on the workpiece. The deposition system has a gas panel for regulating the flow of gases and vapors into the deposition chamber, and a computer for controlling operation of the gas panel and the components in the deposition chamber. Multiple sets of chemical burners are disposed longitudinally along the length of the workpiece. Each set of burners is separated from other sets, such that each set of burners deposit silica particles onto generally different portions of a workpiece. The respective portions include an overlap segment in which one or more burners from one burner set will deposit silica particles on the same portion of the workpiece as one or more burners from another set.

Abstract: A deposition system for depositing a chemical vapor onto a workpiece is disclosed, including a deposition chamber having a plurality of components for performing chemical vapor deposition on the workpiece. The workpiece is held by a lathe that rotates the workpiece relative to chemical burners that deposit silica soot on the workpiece. The deposition system has a gas panel for regulating the flow of gases and vapors into the deposition chamber, and a computer for controlling operation of the gas panel and the components in the deposition chamber. Multiple sets of chemical burners are disposed longitudinally along the length of the workpiece. Each set of burners is separated from other sets, such that each set of burners deposit silica particles onto generally different portions of a workpiece. The respective portions include an overlap segment in which one or more burners from one burner set will deposit silica particles on the same portion of the workpiece as one or more burners from another set.

Abstract: A deposition system for depositing a chemical vapor onto a workpiece is disclosed, including a deposition chamber having a plurality of components for performing chemical vapor deposition on the workpiece. The workpiece is held by a lathe that rotates the workpiece relative to chemical burners that deposit silica soot on the workpiece. The deposition system has a gas panel for regulating the flow of gases and vapors into the deposition chamber, and a computer for controlling operation of the gas panel and the components in the deposition chamber. Multiple sets of chemical burners are disposed longitudinally along the length of the workpiece. Each set of burners is separated from other sets, such that each set of burners deposit silica particles onto generally different portions of a workpiece. The respective portions include an overlap segment in which one or more burners from one burner set will deposit silica particles on the same portion of the workpiece as one or more burners from another set.

Abstract: A deposition system for depositing a chemical vapor onto a workpiece is disclosed, including a deposition chamber having a plurality of components for performing chemical vapor deposition on the workpiece. The workpiece is held by a lathe that rotates the workpiece relative to chemical burners that deposit silica soot on the workpiece. The deposition system has a gas panel for regulating the flow of gases and vapors into the deposition chamber, and a computer for controlling operation of the gas panel and the components in the deposition chamber. Multiple sets of chemical burners are disposed longitudinally along the length of the workpiece. Each set of burners is separated from other sets, such that each set of burners deposit silica particles onto generally different portions of a workpiece. The respective portions include an overlap segment in which one or more burners from one burner set will deposit silica particles on the same portion of the workpiece as one or more burners from another set.

Abstract: A method of manufacturing a cylindrical glass optical waveguide preform having a low water content centerline region, for use in the manufacture of optical waveguide fiber, is disclosed. The centerline region of the glass optical waveguide preform has a water content sufficiently low such that an optical waveguide fiber producible from the glass optical waveguide preform of the present invention exhibits an optical attenuation of less than about 0.35 dB/km, and preferably less than about 0.31 dB/km, at a measured wavelength of 1380 nm. Method of manufacture of a porous core mandrel used in the manufacture of such a glass optical waveguide preform is also disclosed.

Abstract: A method of manufacturing a cylindrical glass optical waveguide preform having a low water content centerline region, for use in the manufacture of optical waveguide fiber, is disclosed. The centerline region of the glass optical waveguide preform has a water content sufficiently low such that an optical waveguide fiber producible from the glass optical waveguide preform of the present invention exhibits an optical attenuation of less than about 0.35 dB/km, and preferably less than about 0.31 dB/km, at a measured wavelength of 1380 nm. Method of manufacture of a porous core mandrel used in the manufacture of such a glass optical waveguide preform is also disclosed.

Abstract: A method of manufacturing a cylindrical glass optical waveguide preform having a low water content centerline region, for use in the manufacture of optical waveguide fiber, is disclosed. The centerline region of the glass optical waveguide preform has a water content sufficiently low such that an optical waveguide fiber producible from the glass optical waveguide preform of the present invention exhibits an optical attenuation of less than about 0.35 dB/km, and preferably less than about 0.31 dB/km, at a measured wavelength of 1380 nm. Method of manufacture of a porous core mandrel used in the manufacture of such a glass optical waveguide preform is also disclosed.