Patents by Inventor David Mikrut

David Mikrut has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photoresist Image-forming Process Using Double Patterning
    Publication number: 20100183851
    Abstract: A process for forming a double photoresist pattern is disclosed.
    Type: Application
    Filed: January 21, 2009
    Publication date: July 22, 2010
    Inventors: Yi Cao, Muthiah Thiyagarajan, SungEun Hong, DongKwan Lee, Meng Li, David Mikrut