Abstract: The present invention refers to a surround-view imaging system for time-of-flight (TOF) depth sensing applications and a time-of-flight sensing based collision avoidance system comprising such an imaging system. The imaging system for time-of-flight depth sensing applications comprises a lens system, adapted for imaging angles of view (AOV) larger than 120° in an image on an image plane; a sensor system, adapted to convert at least a part the image in the image plane into an electronic image signal; and an evaluation electronics, adapted to analyze the electronic image signal and to output resulting environmental information; wherein the lens system and/or the sensor system are designed for specifically imaging fields of view (FOV) starting at zenithal angles larger than 60°.

Abstract: The present invention refers to a surround-view imaging system for time-of-flight (TOF) depth sensing applications and a time-of-flight sensing based collision avoidance system comprising such an imaging system. The imaging system for time-of-flight depth sensing applications comprises a lens system, adapted for imaging angles of view (AOV) larger than 120° in an image on an image plane; a sensor system, adapted to convert at least a part the image in the image plane into an electronic image signal; and an evaluation electronics, adapted to analyze the electronic image signal and to output resulting environmental information; wherein the lens system and/or the sensor system are designed for specifically imaging fields of view (FOV) starting at zenithal angles larger than 60°.

Abstract: The present invention refers to a surround-view imaging system for time-of-flight (TOF) depth sensing applications and a time-of-flight sensing based collision avoidance system comprising such an imaging system. The imaging system for time-of-flight depth sensing applications comprises a lens system, adapted for imaging angles of view (AOV) larger than 120° in an image on an image plane; a sensor system, adapted to convert at least a part the image in the image plane into an electronic image signal; and an evaluation electronics, adapted to analyze the electronic image signal and to output resulting environmental information; wherein the lens system and/or the sensor system are designed for specifically imaging fields of view (FOV) starting at zenithal angles larger than 60°.

Abstract: Camera lens system for an endoscope, method for producing same and endoscope. The system includes at least three lenses. Starting from object side, first lens is a negative lens, and lenses moving toward an image side are positive lenses, with features: 45<V1d<75; |V1d?V2d|<10; |V1d?V3d|<10; |V2d?V3d|<10; 1.45<n1d<1.75; |n1d?n2d|<0.1; |n1d?n3d|<0.1; |n2d?n3d|<0.1; diagonal field of view from 80°-100°; 0.4<f<0.7; ?3<f1/f<?2; 1.1<f2/f<1.3; 2.5<f3/f<3.5, the three lenses having V1d, V2d, and V3d Abbe numbers, n1d, n2d, and n3d refractive indices, f1, f2, and f3 focal lengths, respectively, and f is focal length of the objective of the system.

Abstract: The present invention refers to a surround-view imaging system for time-of-flight (TOF) depth sensing applications and a time-of-flight sensing based collision avoidance system comprising such an imaging system. The imaging system for time-of-flight depth sensing applications comprises a lens system, adapted for imaging angles of view (AOV) larger than 120° in an image on an image plane; a sensor system, adapted to convert at least a part the image in the image plane into an electronic image signal; and an evaluation electronics, adapted to analyze the electronic image signal and to output resulting environmental information; wherein the lens system and/or the sensor system are designed for specifically imaging fields of view (FOV) starting at zenithal angles larger than 60°.

Abstract: Camera lens system for an endoscope, method for producing same and endoscope. The system includes at least three lenses. Starting from object side, first lens is a negative lens, and lenses moving toward an image side are positive lenses, with features: 45<V1d<75; |V1d?V2d|<10; |V1d?V3d|<10; |V2d?V3d|<10; 1.45<n1d<1.75; |n1d?n2d|<0.1; |n1d?n3d|<0.1; |n2d?n3d|<0.1; diagonal field of view from 80°-100°; 0.4<f<0.7; ?3<f1/f<?2; 1.1<f2/f<1.3; 2.5<f3/f<3.5, the three lenses having V1d, V2d, and V3d Abbe numbers, n1d, n2d, and n3d refractive indices, f1, f2, and f3 focal lengths, respectively, and f is focal length of the objective of the system.

Abstract: A composite material comprising an amorphous, porous material with nanocrystalline material in its pores has been found to be a UV absorber. The porous material is a matrix of pores that act as a scaffold for the nanocrystalline material. The particles of the nanocrystalline material are isolated, which mean that they do not connect to each other. In some embodiments, the nanocrystalline material is completely inside the pores of the porous material. In some embodiments, the nanocrystalline material may stick out of some or all of the pores of the porous material. In some embodiments, the nanocrystalline material is a cerium oxide material. In some embodiments, the nanocrystallite ranges in size from 2 to about 100 nm on its longest axis, with an aspect ratio from about 1 to about 1.5.

Abstract: The disclosure provides a polymer composition comprising a treated inorganic particle having improved photostability and improved anti-microbial properties, wherein the treated inorganic particle comprises: a inorganic core particle; a first treatment of a silicon compound, wherein the silicon compound is added in a single step; and a second treatment comprising a co-precipitated zinc oxide and alumina.

Abstract: The present disclosure relates to a vapor phase process for producing a substantially anatase-free titanium dioxide pigment comprising: reacting a vaporous titanium dioxide precursor and an oxygen containing gas in a reactor; and introducing a mixture of liquid titanium dioxide precursor and a liquid or finely divided solid compound comprising a element selected from the group consisting of Li, Be, B, Na, Mg, Al, P, S, K, Ca, Sc, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, As, Se, Rb, Sr, Y, Zr, Nb, Mo, Ru, Rh, Pd, Ag, Cd, In, Sn, Sb, Te, Cs, Ba, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Hf, Ta, W, Re, Os, Ir, Pt, Au, Hg, Tl, and Pb, into the reactor at a point downstream of the addition of the vaporous titanium dioxide precursor, and the oxygen containing gas, and at a process temperature of about 1200° C. to about 1600° C. to produce titanium dioxide particles that are coated by the oxide formed from the element.

Abstract: The present disclosure relates to a vapor phase process for producing a substantially anatase-free titanium dioxide pigment comprising reacting a vaporous titanium dioxide precursor and an oxygen containing gas in a reactor; and introducing a mixture of liquid silicon halide and liquid titanium dioxide precursor into the reactor at a point downstream of the addition of the vaporous titanium dioxide precursor, and the oxygen containing gas, and at a process temperature of about 1200° C. to about 1600° C. to produce titanium dioxide particles that are substantially encapsulated in silicon dioxide.

Abstract: The disclosure provides a treated inorganic particle, in particular a titanium dioxide particle, having reduced photoactivity, lower acid solubility and improved anti-microbial properties comprising: an inorganic core particle, in particular a titanium dioxide particle; a first treatment of silica, wherein the silica is added in a single step; and a second treatment comprising co-precipitated zinc oxide and alumina. These particles have reduced photoactivity, lower acid solubility and improved anti-microbial properties.

Abstract: This disclosure relates to a process for producing titanium dioxide, comprising: a) reacting an alloy comprising a metal selected from the group consisting of aluminum, titanium and mixtures thereof, wherein either aluminum or titanium is a major component of the alloy, and an element selected from the group consisting of Li, Be, B, Na, Mg, Al, P, S, K, Ca, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, As, Se, Rb, Sr, Y, Zr, Nb, Mo, Ru, Rh, Pd, Ag, Cd, In, Sn, Sb, Te, Cs, Ba, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Hf, Ta, W, Re, Os, Ir, Pt, Au, Hg, Tl, Pb, and Bi, with chlorine gas to form chlorides of aluminum, titanium or mixtures thereof and chlorides of the element selected from the group consisting of Li, Be, B, Na, Mg, Al, P, S, K, Ca, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, As, Se, Rb, Sr, Y, Zr, Nb, Mo, Ru, Rh, Pd, Ag, Cd, In, Sn, Sb, Te, Cs, Ba, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Hf, Ta, W, Re, Os, Ir, Pt, Au, Hg, Tl, Pb, and Bi, at or above the boiling p

Abstract: The disclosure provides a coating composition comprising a treated inorganic particle having reduced photoactivity and improved anti-microbial properties, wherein the treated inorganic particle comprises: an inorganic core particle; a first treatment of a silicon compound, wherein the silicon compound is added in a single step; and a second treatment comprising co-precipitated zinc oxide and alumina.

Abstract: The disclosure provides a treated inorganic particle, in particular a titanium dioxide particle, having reduced photoactivity, lower acid solubility and improved anti-microbial properties comprising: an inorganic core particle, in particular a titanium dioxide particle; a first treatment of silica, wherein the silica is added in a single step; and a second treatment comprising co-precipitated zinc oxide and alumina. These particles have reduced photoactivity, lower acid solubility and improved anti-microbial properties.

Abstract: The disclosure provides a treated inorganic particle, in particular a titanium dioxide particle, having reduced photoactivity, lower acid solubility and improved anti-microbial properties comprising: an inorganic core particle, in particular a titanium dioxide particle; a first treatment of silica, wherein the silica is added in a single step; and a second treatment comprising co-precipitated zinc oxide and alumina. These particles have reduced photoactivity, lower acid solubility and improved anti-microbial properties.

Abstract: The disclosure provides a paper slurry comprising a treated inorganic particle having reduced photoactivity and improved anti-microbial properties, wherein the treated inorganic pigment comprises: an inorganic core particle; a first treatment of a silicon compound, wherein the silicon compound is added in a single step; and a second treatment comprising a co-precipitated zinc oxide and alumina.

Abstract: This disclosure relates to a process for producing titanium dioxide, comprising: a) reacting an alloy comprising a metal selected from the group consisting of aluminum, titanium and mixtures thereof, wherein either aluminum or titanium is a major component of the alloy, and an element selected from the group consisting of Li, Be, B, Na, Mg, Al, P, S, K, Ca, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, As, Se, Rb, Sr, Y, Zr, Nb, Mo, Ru, Rh, Pd, Ag, Cd, In, Sn, Sb, Te, Cs, Ba, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Hf, Ta, W, Re, Os, Ir, Pt, Au, Hg, Tl, Pb, and Bi, with chlorine gas to form chlorides of aluminum, titanium or mixtures thereof and chlorides of the element selected from the group consisting of Li, Be, B, Na, Mg, Al, P, S, K, Ca, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, As, Se, Rb, Sr, Y, Zr, Nb, Mo, Ru, Rh, Pd, Ag, Cd, In, Sn, Sb, Te, Cs, Ba, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Hf, Ta, W, Re, Os, Ir, Pt, Au, Hg, TI, Pb, and Bi, at or above the boiling p

Abstract: This disclosure relates to an improved process for preparing titanium tetrachloride comprising a first carbo-chlorination reaction comprising reacting ores comprising silica and/or zirconium with chlorine and a carbon compound at a temperature of about 900° C. to about 1300° C. to form an unscrubbed off gas comprising carbon monoxide, and using the unscrubbed off gas in a second carbo-chlorination reaction comprising titanium to form titanium tetrachloride.

Abstract: This disclosure relates to a process for producing titanium dioxide, comprising: a) reacting a alloy comprising silicon and aluminum having a melting point of about 482° C. to about 660° C., with chlorine gas at temperatures above 190° C. to form chlorides of silicon and aluminum; b) adding titanium tetrachloride to the chlorides of silicon and aluminum of step (a); c) oxidizing the chlorides of silicon and aluminum and titanium tetrachloride of step (b); and d) forming titanium dioxide.

Abstract: A process for producing titanium dioxide, comprising: a) reacting an alloy comprising a metal selected from the group consisting of aluminum, titanium and mixtures thereof, wherein one metal is a major component of the alloy, and an element, with chlorine gas to form chlorides of aluminum, titanium or mixtures thereof and chlorides of the element, at or above the boiling point of the chloride of the major component of the alloy; with the proviso that the element does not comprise Ti when the metal is Ti and does not comprise Al when the metal is Al; (b) adding titanium tetrachloride to the chlorides formed in step (a); (c) oxidizing the chlorides formed in step (a), and titanium tetrachloride of step (b); and (d) forming titanium dioxide.