Patents by Inventor David Ovadia
David Ovadia has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20130261303Abstract: The present invention provides a process for reacting between a phenol derivative and an aromatic substrate under phenolate forming conditions comprising the following steps: (a) reacting a phenol derivative with a base in a polar organic solvent to obtain a phenolate salt, wherein water is removed from the reaction mixture during the reaction, (b) adding the aromatic substrate to the reaction mixture obtained in step (a), (c) heating the reaction mixture of step (b) to a temperature in the range of 80° to 1300° C., preferably, 90° to 1000° C. for 2 to 7 hours to obtain a phenoxy substituted aromatic substrate, (d) removing the solvent from the mixture of step (c) and optionally further isolating and purifying the phenoxy substituted aromatic substrate. Optionally, the removal of water during step (a) is in conjunction with partial removal of the organic solvent.Type: ApplicationFiled: May 30, 2013Publication date: October 3, 2013Applicant: MAKHTESHIM CHEMICAL WORKS, LTD.Inventors: David OVADIA, Raya STURKOVICH, David LEONOV
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Patent number: 8471013Abstract: The present invention provides a process for reacting between a phenol derivative and an aromatic substrate under phenolate forming conditions comprising the following steps: (a) reacting a phenol derivative with a base in a polar organic solvent to obtain a phenolate salt, wherein water is removed form the reaction mixture during the reaction, (b) adding the aromatic substrate to the reaction mixture obtained in step (a), (c) heating the reaction mixture of step (b) to a temperature in the range of 80° to 1300° C., preferably, 90° to 1000° C. for 2 to 7 hours to obtain a phenoxy substituted aromatic substrate, (d) removing the solvent from the mixture of step (c) and optionally further isolating an purifying the phenoxy substituted aromatic substrate. Optionally, the removal of water during step (a) is in conjunction with partial removal of the organic solvent.Type: GrantFiled: December 16, 2007Date of Patent: June 25, 2013Assignee: Makhteshim Chemical Works, Ltd.Inventors: David Ovadia, Raya Sturkovich, David Leonov
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Publication number: 20090281316Abstract: The present invention provides a process for reacting between a phenol derivative and an aromatic substrate under phenolate forming conditions comprising the following steps: (a) reacting a phenol derivative with a base in a polar organic solvent to obtain a phenolate salt, wherein water is removed form the reaction mixture during the reaction, (b) adding the aromatic substrate to the reaction mixture obtained in step (a), (c) heating the reaction mixture of step (b) to a temperature in the range of 80° to 1300° C., preferably, 90° to 1000° C. for 2 to 7 hours to obtain a phenoxy substituted aromatic substrate, (d) removing the solvent from the mixture of step (c) and optionally further isolating an purifying the phenoxy substituted aromatic substrate. Optionally, the removal of water during step (a) is in conjunction with partial removal of the organic solvent.Type: ApplicationFiled: December 16, 2007Publication date: November 12, 2009Inventors: David Ovadia, Raya Sturkovich, David Leonov
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Publication number: 20080005626Abstract: The invention relates to a stand-alone video recording, playback and Monitoring system. It has network switches, non-volatile storage devices, IP cameras, video servers, and NTSC cameras. The system uses communication channels that are WAN/LAN based and can be hard-wired or wireless and has a flexibly implemented watchdog to detect, for example, hardware and power failure as well as other failures in the system.Type: ApplicationFiled: March 22, 2006Publication date: January 3, 2008Inventors: Glen Schaff, Eric Louis, David Ovadia
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Patent number: 5334402Abstract: A method and apparatus are provided for the rapid heat treatment of products, and especially gas-permeable, water-containing products such as bread dough. Baking of dough involves placing the dough within an enclosed oven or zone (1) and subjecting the dough to dielectric (e.g. radio-frequency or microwave) heating using appropriate generators (6, 7, 7a, 8a). Radiant heat from an appropriate source (9) and hot oven gases are simultaneously applied for crust formation. During at least a portion of the baking cycle, the gas pressure within the zone (1) is selectively elevated by steam addition (10) in response to the rise in gas pressure within the dough resulting from vaporization of water therein. In this way, the pressure differential between the dough interior and the ambient environment is minimized, and the dough may be rapidly baked without fear of significant dough disruption. Cooling is effected by gradually reducing the zone pressure, through use of a vacuum pump (12).Type: GrantFiled: February 22, 1993Date of Patent: August 2, 1994Assignee: Kansas State University Research FoundationInventor: David Ovadia
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Patent number: 5331135Abstract: An improved baking pan (10) for short-time combination baking is provided which allows baking of bread or other comestible products using both conventional heating and microwave or rf energy. The pan (10) preferably includes a bottom wall (12) and upstanding sidewall structure (14) which are provided with apertures (26, 28) sized to permit passage of microwave or rf energy therethrough. A liner (34) is positioned within the pan (10) in covering relationship to the apertures (26, 28), so as to prevent passage of uncooked dough or the like through the pan apertures (26, 28), while being sufficiently thin to not appreciably decrease thermal conductivity through the pan walls (12, 14). Combination bread baking using the pan (10) typically involves conventional heating to a temperature of from about 430.degree.-625.degree. F., with simultaneous application of microwave energy.Type: GrantFiled: February 12, 1993Date of Patent: July 19, 1994Assignee: Kansas State University Research FoundationInventor: David Ovadia
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Patent number: 5272299Abstract: A combined microwave and conventionally heated oven includes first and second chambers separated from one another by a partition including first and second spaced panels which define a cavity therebetween. These panels are both metallic, except where the microwave waveguide passes through rectangular gaps in them, in which are situated rectangular, non-metallic, infrared-absorbing panels of the same size. A microwave generator is provided in the second chamber for generating microwaves for use in heating a product positioned in the first chamber. Convention heater(s) (gas and/or electrical resistance) is/are also provided. A stream of cooling air reduces the temperature within the cavity in order to insulate the second chamber from the transfer of heat emitted from the first chamber in operation of the conventional heater(s).Type: GrantFiled: June 22, 1992Date of Patent: December 21, 1993Assignee: Kansas State University Research FoundationInventor: David Ovadia
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Patent number: 4898942Abstract: An improved process for the production of Diazinon substantially free of toxic by-products in high yield and very high purity which involves mixing 2-isopropyl-4-methyl-6-hydroxypyrimidine with solid sodium or potassium hydroxide in a ketone or ether solvent at a temperature of about 50.degree.-60.degree. C. until a homogeneous mixture is formed, adding diethylthiophosphoryl chloride to the homogeneous mixture, keeping the mixture at a temperature of 55.degree.-80.degree. C. until the reaction is complete, and separating the Diazinon formed.Type: GrantFiled: August 30, 1988Date of Patent: February 6, 1990Assignee: Makhteshim Chemical Works, Ltd.Inventors: David Ovadia, Ernestine Mandler
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Patent number: 4087534Abstract: Novel haloalkylthio 4-substituted urazoles and thiourazoles of the formula: ##STR1## wherein R is alkyl of 1-12 carbon atoms, cycloalkyl having 3-6 carbon atoms, lower monohaloalkyl, benzyl, phenylethyl and phenyl optionally substituted by 1-3 halogens, nitro, chloromethyl, trifluoromethyl, lower alkyl, lower alkoxy or lower thioalkyl groups;R' designates haloalkyl of 1 or 2 carbon atoms, having at least two halogen atoms, andR" designates R or-SR', and X and Y each designate independently oxygen or sulfur:A process for preparing the above defined novel compounds, and fungistatic, fungicidal, bacteriostatic and bactericidal compositions of matter containing such compounds as active ingredient.Type: GrantFiled: February 11, 1977Date of Patent: May 2, 1978Inventors: David Ovadia, Nitzah Peleg, Peretz Bracha