Abstract: Water-soluble polymers are disclosed which comprise hydrophobic segments, each segment containing at least one hydrophobic group or comlex hydrophobic group covalently bonded to the polymer, wherein the polymer has an amount of complex hydrophobic groups sufficient to provide for enhanced thickening of aqueous solutions containing the polymer. These polymers provide superior thickening and leveling in aqueous systems through hydrophobic associations, and aid suspension of particulate materials in non-aqueous systems.

Abstract: Polymers are disclosed which comprise:(A) about 1-99.9 weight percent of one or more alpha, beta-monoethylenically unsaturated carboxylic acids, typically methacrylic acids;(B) about 0-98.9 weight percent of one or more monoethylenically unsaturated monomers, typically ethyl acrylate;(C) about 0.1-99 weight percent of one or more monoethylenically unsaturated macromonomers, and(D) about 0-20 weight percent or greater of one or more polyethylenically unsaturated monomers. These polymers can be solubilized in water with the aid of an alkali, like ammonium hydroxide. When the polymers are added to latex paints and neutralized, the viscosity of the paint is increased, brush drag is increased, and the paint rheology is otherwise improved.

Abstract: This invention relates to polyurethane (meth)acrylates that are prepared from certain liquid hydrocarbon diols and/or derivatives of said liquid hydrocarbon diols, polyfunctional isocyanates, and hydroxyalkyl acrylates and methacrylates. The polyurethane (meth)acrylates are useful as decorative and functional coatings, inks, adhesives, sealants, and formed parts.

Abstract: Photoresist formulations and coatings are provided which contain a polymer having pendant tetrazole-5-thione groups which upon exposure to ultraviolet light decompose to carbodiimides and thereby providing means for crosslinking the base polymer to provide high resolution and thermal stability.

Abstract: A positive photoresist composition containing (i) a quinone diazide polymer formed by reacting a cresol-formaldehyde novolac resin and an o-quinonediazide compound, and (ii) a sulfonamide development enhancement agent.

Abstract: A process is provided for the preparation of a mixture of parylene dimers wherein the distribution of dimers within the mixture is predetermined by the proper selection of halogenated and non-halogenated 2,2-paracyclophane starting material. Since the dimers are free of alpha-halogens, the formation of environmentally undesirable acid halides during the deposition of parylene films and coatings is avoided. Since the dimers are useful in the preparation of inert, transparent, conformal coatings of parylene, desirable chemical and/or physical properties can be imparted to such coating by formation of a dimer mixture of a predetermined composition. The parylene film properties, composition and deposition conditions will be different by varying dimer distribution.

Abstract: The resolution and stability of liquid, dual-tone photoresist formulations containing novolac resins and photoactive compounds are enhanced by the incorporation therein of certain carbodiimide resolution enhancers.

Abstract: A process is provided for the preparation of the dimer, dichloro-[2,2]paracyclophane, which is useful as the starting material for the deposition of conformal parylene coatings employed, for example, in the electronics industry for the protection of various sensitive electronic components.The process avoids the normally low yields of chlorinated dimer formed by the chlorination of 2,2-paracyclophane and instead utilizes the Hofmann elimination of 2(3)-chloro-p-methylbenzyltrimethylammonium hydroxide by conducting the elimination reaction under carefully controlled conditions of reaction temperature and profile, reaction feed configuration, water concentration in the reactor and the use of a cosolvent, certain reaction promoters, or a combination thereof.

Abstract: An improved process is provided for the preparation of the dimer, 2,2-paracyclophane, which is useful as the starting material for parylene conformal coatings used in the electronics industry for the protection of various sensitive electronic components.The process comprises optimization of the normally low yield of dimer formed by the Hofmann elimination reaction of p-methylbenzyltrimethylammonium halide by conducting the elimination reaction in the presence of dimethysulfoxide and certain reaction promoters.

Abstract: An improved process is provided for the preparation of the dimer, 2,2-paracyclophane, which is useful as the starting material for parylene conformal coatings used in the electronics industry for the protection of various sensitive electronic components.The process comprises optimization of the normally low yield of dimer formed by the Hofmann elimination reaction of p-methylbenzyltrimethylammonium hydroxide by conducting the elimination reaction in the presence of a cosolvent and certain reaction promoters.

Abstract: Novel autodeposition coatings formulated with acrylic copolymer dispersions which have incorporated therein either methacrylic acid or acrylic acid and, optionally, hydroxyl containing monomers or multifunctional monomers polymerized in the molecule. These novel coatings display significantly improved corrosion resistance, rinse resistance, gloss, heat aging resistance and gasoline resistance when compared to heretofore known autodeposition coatings.

Abstract: Autodeposition coating compositions containing certain relatively water-insoluble derivatives of glycoluril will crosslink upon curing. The resulting coating exhibits improved block resistance and solvent resistance over heretofore available autodeposition coatings.

Abstract: Aqueous, translucent to clear, water-borne vehicles of emulsion polymerized mixture of acrylic acid or methacrylic acid, an acrylate ester and, optionally, a styrene compound. Blends thereof with latexes and clear and pigmented compositions thereof.