Abstract: A microelectronic semiconductor interconnect structure barrier and method of deposition provide improved conductive barrier material properties for high-performance device interconnects. The barrier includes a refractory metal such as cobalt, cobalt-based alloys, ruthenium or ruthenium-based alloys for promoting adhesion of copper. The barrier materials can be deposited by chemical-vapor deposition to achieve good step coverage and a relatively conformal thin film with a good nucleation surface for subsequent metallization such as copper metallization. In one embodiment, the barrier suppresses diffusion of copper into other layers of the device, including the inter-metal dielectric, pre-metal dielectric, and transistor structures.

Abstract: A microelectronic semiconductor interconnect structure barrier and method of deposition provide improved conductive barrier material properties for high-performance device interconnects. The barrier includes a refractory metal such as cobalt, cobalt-based alloys, ruthenium or ruthenium-based alloys for promoting adhesion of copper. The barrier materials can be deposited by chemical-vapor deposition to achieve good step coverage and a relatively conformal thin film with a good nucleation surface for subsequent metallization such as copper metallization. In one embodiment, the barrier suppresses diffusion of copper into other layers of the device, including the inter-metal dielectric, pre-metal dielectric, and transistor structures.

Abstract: A microelectronic semiconductor interconnect structure barrier and method of deposition provide improved conductive barrier material properties for high-performance device interconnects. The barrier includes a refractory metal such as cobalt, cobalt-based alloys, ruthenium or ruthenium-based alloys for promoting adhesion of copper. The barrier materials can be deposited by chemical-vapor deposition to achieve good step coverage and a relatively conformal thin film with a good nucleation surface for subsequent metallization such as copper metallization. In one embodiment, the barrier suppresses diffusion of copper into other layers of the device, including the inter-metal dielectric, pre-metal dielectric, and transistor structures.

Abstract: Adhesion of a copper film, such as a copper interconnect, to a substrate underlayer, such as a substrate diffusion barrier, is enhanced with adhesion promotion techniques. The adhesion promotion techniques can repair the interface of the copper film and the substrate to enhance adhesion of the copper film for high-yield formation of inlaid copper metal lines and plugs. For instance, thermal annealing of a seed layer, including a copper seed layer, an alloy seed layer or a reactant seed layer, can repair contamination at the interface of the seed layer and the substrate. Alternatively, the adhesion promotion techniques can avoid contamination of the interface by depositing an inert seed layer, such as a noble (e.g., platinum) or passivated metal seed layer, or by depositing the seed layer under predetermined conditions that minimize contamination of the interface, and then depositing a bulk copper layer under predetermined conditions that maximize throughput.

Abstract: A window frame profile for forming into a window frame with a number of other similar profiles includes a separate nailing strip extruded from aluminum and attached to the outer surface of the frame profile. The nailing strip includes a planar strip member and a cylindrical bead portion along one side edge of the strip member. The bead is snap fastened into a cylindrical recess in the outer surface of the frame allowing rotation of the strip about the axis of the bead from a retracted position for transport in which the strip is received in a flat recess on the outer surface. The strip can be rotated from the retracted storage position to an erect position at right angles to the outer surface by rotation about the axis of the bead and snap fastened in the erect position.

Abstract: An apparatus for removing bulk materials from a laterally enclosed storage area wherein the apparatus may be substantially buried within the bulk material (11). The apparatus includes a support column (16) mounted at a base into a support floor (25). An auger (17) is attached with an axial mount at the base of the support column for enabling rotational declination of the auger from (i) a vertical orientation wherein the auger is nearly parallel with the vertical axis of the support column, (ii) through intermediate angles of declination (54), to (iii) a substantially horizontal orientation (55) wherein the auger is adjacent to the support floor. The suspension cable (61) is coupled between the support column and auger to enable selective adjustment of auger declination. A rotational displacement drive (35) is coupled to the support column to rotate the column about its vertical axis, along with the attached auger. A rotational drive motor (51) is mounted at a distal end of the auger.

Abstract: An apparatus for removing bulk materials from a laterally enclosed storage area wherein the apparatus may be substantially buried within the bulk material (11). The apparatus includes a support column (16) mounted at a base into a support floor (25). An auger (17) is attached by an axial mount at the base of the support column for enabling rotational inclination of the auger from (i) a vertical orientation vertical orientation wherein the auger is nearly parallel with the vertical axis of the support column, (ii) through intermediate angles of inclination (54), to (iii) a substantially horizontal orientation (55) wherein the auger is adjacent to the support floor. The suspension cable (61) is coupled between the support column and auger to enable selective adjustment of auger inclination. A rotational displacement drive (35) is coupled to the support column to rotate the column about its vertical axis, along with the attached auger. A rotational drive motor (51) is mounted at a distal end of the auger.

Abstract: An apparatus for removing bulk materials from a laterally enclosed storage area wherein the apparatus may be substantially buried within the bulk material. The apparatus includes a support column mounted at a base into a support floor. An auger is attached by means of an axial mount at the base of the support column for enabling rotational inclination of the auger from (i) a vertical orientation wherein the auger is nearly parallel with the vertical axis of the support column, (ii) through intermediate angles of inclination, to (iii) a substantially horizontal orientation wherein the auger is adjacent to the support floor. The suspension cable is coupled between the support column and auger to enable selective adjustment of auger inclination. A rotational displacement drive is coupled to the support column to rotate the column about its vertical axis, along with the attached auger. A rotational drive motor is mounted at a distal end of the auger.

Abstract: A system for covering and supporting a conveyor belt system. The conveyor belt system is supported in large measure by a structural support tube. The structural support tube is simply a tube or pipe of the conventional type. Disposed through the center of the tube are a plurality of internal support pipes. In turn, auxiliary support pipes, smaller in diameter than the internal support pipes, may traverse the interior of the internal support pipe and extend out either end. Attached to the auxiliary support pipes is a conventional belt conveyor system. The belt conveyor system is, in turn, enclosed by a top cover and a lower enclosure. All of the parts are held securely together using readily available materials such as angle iron. The present invention is extremely flexible providing the capability of easily constructing 40, 60, 80 and 120 foot spans of conveyor system. In addition, it is possible to provide an open conveyor, a partially enclosed conveyor, or a totally enclosed conveyor.

Abstract: Prior known enclosed conveyors have had a conventional belt conveyor mounted on a structural framework resting on a series of support columns known in the art as bents. A housing or gallery, as it is known in the art, consisting of a roof, side walls and optionally a floor, is constructed on structural members around the conveyor covered by a protective material. Often times, the housing is large enough to accomodate a walk-way alongside the conveyor. In each instance, however, both the housing and the conveyor are supported by structural members and not by the protective covering material of the housing. There have been instances of short spans of enclosed conveyors using solid longitudinal members as side and top walls as well as for support, but these spans have no internal stabilizing members to prevent undesirable distortion of the conveyor housing.

Abstract: A closed conveyor for transporting finely divided solids, such as grain and the like, comprising feed and discharge sections interconnected by a transport conduit and a return conduit. Sprockets are provided in the feed and discharge sections and a cable is trained about the sprockets and through the two conduits. The cable is equipped with material-engaging flights of area less than the cross-section of the conduit. Each sprocket is provided with material-engaging blades which serve to stir, fluidize and impart movement to the material being transported to render it as a fast-flowing dilute suspension. Lugs are provided on the cable between the flights and are positioned to be engaged by complemental lug-engaging elements on the sprockets. Each pair of lug-engaging elements on the sprockets fits between but in contact with a pair of lugs on the cable. The sprocket elements are notched to accept the cable lugs.