Patents by Inventor David Richard Wilson

David Richard Wilson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for compressing a gas feed with a variable flow rate
    Patent number: 11994135
    Abstract: Energy efficiency and/or operational stability of a multistage compression system comprising a plurality (N) of centrifugal compressors that is compressing a gas feed having a variable flow rate is improved by adjusting reversibly the load on each compressor in response to changes in the flow rate of the gas feed using a main recycle system to enable operation of the centrifugal compressors at turndown capacity during periods when the flow rate is below total turndown capacity for all of the compressors, and if necessary, using the local recycle systems in order to avoid activation of anti-surge control, and switching one or more centrifugal compressors into low power mode or shutdown mode as required.
    Type: Grant
    Filed: June 14, 2021
    Date of Patent: May 28, 2024
    Assignee: AIR PRODUCTS AND CHEMICALS, INC.
    Inventors: David M. Espie, Gregory W. Henzler, Zhong-Xiang (John) Zhu, Graeme Richard Wilson
  • Polymers, photoresist compositions and methods of forming photolithographic patterns
    Patent number: 8628911
    Abstract: Provided are polymers and photoresist compositions useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.
    Type: Grant
    Filed: December 2, 2011
    Date of Patent: January 14, 2014
    Assignees: Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
    Inventors: Young Cheol Bae, David Richard Wilson, Jibin Sun
  • POLYMERS, PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAHIC PATTERNS
    Publication number: 20120308927
    Abstract: Provided are polymers and photoresist compositions useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.
    Type: Application
    Filed: December 2, 2011
    Publication date: December 6, 2012
    Applicants: Dow Global Technologies LLC, Rohm and Haas Electronic Materials LLC
    Inventors: Young Cheol Bae, David Richard Wilson, Jibin Sun