Patents by Inventor David Russell Voorhees

David Russell Voorhees has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Induction heated chemical vapor deposition reactor
    Patent number: 6368404
    Abstract: A chemical vapor deposition reactor includes a pancake type induction heating device to achieve operating temperature within the reactor chamber. By design of the susceptor, the induction magnetic force created at the top surface of the susceptor is insufficient to effect levitation of the wafer carrier during epitaxial deposition at high temperatures in the order of about 1500-1800° C.
    Type: Grant
    Filed: April 23, 1999
    Date of Patent: April 9, 2002
    Assignee: Emcore Corporation
    Inventors: Alexander I. Gurary, Paul Thomas Fabiano, David Russell Voorhees, Scott Beherrell