Patents by Inventor David Trease
David Trease has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11120969Abstract: A scanning electron microscopy system with improved image beam stability is disclosed. The system includes an electron beam source configured to generate an electron beam and a set of electron-optical elements to direct at least a portion of the electron beam onto a portion of the sample. The system includes an emittance analyzer assembly. The system includes a splitter element configured to direct at least a portion secondary electrons and/or backscattered electrons emitted by a surface of the sample to the emittance analyzer assembly. The emittance analyzer assembly is configured to image at least one of the secondary electrons and/or the backscattered electrons.Type: GrantFiled: March 27, 2020Date of Patent: September 14, 2021Assignee: KLA CorporationInventors: Doug K. Masnaghetti, Gabor Toth, David Trease, Rohit Bothra, Grace Hsiu-Ling Chen, Rainer Knippelmeyer
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Patent number: 10770258Abstract: An electron-optical system for inspecting or reviewing an edge portion of a sample includes an electron beam source configured to generate one or more electron beams, a sample stage configured to secure the sample and an electron-optical column including a set of electron-optical elements configured to direct at least a portion of the one or more electron beams onto an edge portion of the sample. The system also includes a sample position reference device disposed about the sample and a guard ring device disposed between the edge of the sample and the sample position reference device to compensate for one or more fringe fields. One or more characteristics of the guard ring device are adjustable. The system also includes a detector assembly configured to detect electrons emanating from the surface of the sample.Type: GrantFiled: August 20, 2018Date of Patent: September 8, 2020Assignee: KLA-Tencor CorporationInventors: Xinrong Jiang, Christopher Sears, Harsh Sinha, David Trease, David Kaz, Wei Ye
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Publication number: 20200227232Abstract: A scanning electron microscopy system with improved image beam stability is disclosed. The system includes an electron beam source configured to generate an electron beam and a set of electron-optical elements to direct at least a portion of the electron beam onto a portion of the sample. The system includes an emittance analyzer assembly. The system includes a splitter element configured to direct at least a portion secondary electrons and/or backscattered electrons emitted by a surface of the sample to the emittance analyzer assembly. The emittance analyzer assembly is configured to image at least one of the secondary electrons and/or the backscattered electrons.Type: ApplicationFiled: March 27, 2020Publication date: July 16, 2020Inventors: Doug K. Masnaghetti, Gabor Toth, David Trease, Rohit Bothra, Grace Hsiu-Ling Chen, Rainer Knippelmeyer
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Patent number: 10643819Abstract: A scanning electron microscopy system with improved image beam stability is disclosed. The system includes an electron beam source configured to generate an electron beam and a set of electron-optical elements to direct at least a portion of the electron beam onto a portion of the sample. The system includes an emittance analyzer assembly. The system includes a splitter element configured to direct at least a portion secondary electrons and/or backscattered electrons emitted by a surface of the sample to the emittance analyzer assembly. The emittance analyzer assembly is configured to image at least one of the secondary electrons and/or the backscattered electrons.Type: GrantFiled: March 24, 2016Date of Patent: May 5, 2020Assignee: KLA-Tencor CorporationInventors: Doug K. Masnaghetti, Gabor Toth, David Trease, Rohit Bothra, Grace Hsiu-Ling Chen, Rainer Knippelmeyer
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Publication number: 20200011627Abstract: An interlock mechanism for a firearm that includes a stop lever and a cam lever is disclosed. The stop lever is coupled to a firearm safety mechanism such that when the safety mechanism is in a “fire” position the stop lever prevents the upper receiver of the rifle from being separated from the lower receiver of the rifle and when the safety mechanism is in a “safe” position the stop lever allows the upper receiver to be separated from the lower receiver. The cam lever has a “locked position” in which the upper receiver cannot be separated from the lower receiver and an “unlocked position” in which the upper receiver can be separated from the lower receiver. When the safety mechanism is in the “fire” position the stop lever prevents the cam lever from transitioning from the “locked position” to the “unlocked position”.Type: ApplicationFiled: July 5, 2019Publication date: January 9, 2020Applicant: TPM Arms, LLCInventor: David Trease
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Publication number: 20190006143Abstract: An electron-optical system for inspecting or reviewing an edge portion of a sample includes an electron beam source configured to generate one or more electron beams, a sample stage configured to secure the sample and an electron-optical column including a set of electron-optical elements configured to direct at least a portion of the one or more electron beams onto an edge portion of the sample. The system also includes a sample position reference device disposed about the sample and a guard ring device disposed between the edge of the sample and the sample position reference device to compensate for one or more fringe fields. One or more characteristics of the guard ring device are adjustable. The system also includes a detector assembly configured to detect electrons emanating from the surface of the sample.Type: ApplicationFiled: August 20, 2018Publication date: January 3, 2019Inventors: Xinrong Jiang, Christopher Sears, Harsh Sinha, David Trease, David Kaz, Wei Ye
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Patent number: 10056224Abstract: An electron-optical system for inspecting or reviewing an edge portion of a sample includes an electron beam source configured to generate one or more electron beams, a sample stage configured to secure the sample and an electron-optical column including a set of electron-optical elements configured to direct at least a portion of the one or more electron beams onto an edge portion of the sample. The system also includes a sample position reference device disposed about the sample and a guard ring device disposed between the edge of the sample and the sample position reference device to compensate for one or more fringe fields. One or more characteristics of the guard ring device are adjustable. The system also includes a detector assembly configured to detect electrons emanating from the surface of the sample.Type: GrantFiled: August 8, 2016Date of Patent: August 21, 2018Assignee: KLA-Tencor CorporationInventors: Xinrong Jiang, Christopher Sears, Harsh Sinha, David Trease, David Kaz, Wei Ye
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Patent number: 9805910Abstract: Aspects of the present disclosure provide an apparatus comprising a primary beam column configured to direct a primary beam of energetic particles onto a location of interest on a sample containing one or more integrated circuit structures, a detector configured to produce a signal in response to detection of secondary charged particles generated as a result of an interaction between the primary beam of energetic particles and the location of interest, and a signal processor coupled to the detector configured to measure the transient behavior of generation of the secondary charged particles from the signal produced by the detector, and a characterizing module configured to characterize the location of interest by comparing the measured transient behavior to a predetermined reference transient behavior. The detector has a response that is fast enough to detect a transient behavior of generation of the secondary charged particles.Type: GrantFiled: April 24, 2015Date of Patent: October 31, 2017Assignee: KLA-TENCOR CORPORATIONInventors: David Trease, Christopher M. Sears
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Publication number: 20170047193Abstract: An electron-optical system for inspecting or reviewing an edge portion of a sample includes an electron beam source configured to generate one or more electron beams, a sample stage configured to secure the sample and an electron-optical column including a set of electron-optical elements configured to direct at least a portion of the one or more electron beams onto an edge portion of the sample. The system also includes a sample position reference device disposed about the sample and a guard ring device disposed between the edge of the sample and the sample position reference device to compensate for one or more fringe fields. One or more characteristics of the guard ring device are adjustable. The system also includes a detector assembly configured to detect electrons emanating from the surface of the sample.Type: ApplicationFiled: August 8, 2016Publication date: February 16, 2017Inventors: Xinrong Jiang, Christopher Sears, Harsh Sinha, David Trease, David Kaz, Wei Ye
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Publication number: 20160372304Abstract: A scanning electron microscopy system with improved image beam stability is disclosed. The system includes an electron beam source configured to generate an electron beam and a set of electron-optical elements to direct at least a portion of the electron beam onto a portion of the sample. The system includes an emittance analyzer assembly. The system includes a splitter element configured to direct at least a portion secondary electrons and/or backscattered electrons emitted by a surface of the sample to the emittance analyzer assembly. The emittance analyzer assembly is configured to image at least one of the secondary electrons and/or the backscattered electrons.Type: ApplicationFiled: March 24, 2016Publication date: December 22, 2016Inventors: Doug K. Masnaghetti, Gabor Toth, David Trease, Rohit Bothra, Grace Hsiu-Ling Chen, Rainer Knippelmeyer