Patents by Inventor David W. Laks

David W. Laks has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for etching sloped vias in polyimide insulators
    Patent number: 4369090
    Abstract: A method for the fabrication of a cured polyamic acid film having apertures therein selectively etched to provide sidewalls sloped at a controlled angle. Such films are used in the fabrication of integrated circuits having two or more levels of metallization, to provide electrical insulation between metal levels. The apertures therein are required to have sloped sidewalls in order to enhance the yields of circuits having reliable contact between metal levels.
    Type: Grant
    Filed: November 6, 1980
    Date of Patent: January 18, 1983
    Assignee: Texas Instruments Incorporated
    Inventors: Arthur M. Wilson, David W. Laks, Stephen M. Davis