Patents by Inventor David Wasinger

David Wasinger has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Non-destructive gap metrology
    Patent number: 11913772
    Abstract: The present disclosure is directed to a metrology system having 3-dimensional sensors for thickness measurements of semiconductor elements, and methods for taking the thickness measurements. In an aspect, the 3-dimensional sensor may be a single or dual 3-dimensional profiler that may scan across the top and bottom surfaces of an element to obtain a thickness measurement. In another aspect, the method may be used to measure a gap between elements that have assembled together.
    Type: Grant
    Filed: March 17, 2022
    Date of Patent: February 27, 2024
    Assignee: Intel Corporation
    Inventors: Jianyong Mo, V Wade Singleton, Yiren Wu, Liang Zhang, David Wasinger
  • NON-DESTRUCTIVE GAP METROLOGY
    Publication number: 20230296371
    Abstract: The present disclosure is directed to a metrology system having 3-dimensional sensors for thickness measurements of semiconductor elements, and methods for taking the thickness measurements. In an aspect, the 3-dimensional sensor may be a single or dual 3-dimensional profiler that may scan across the top and bottom surfaces of an element to obtain a thickness measurement. In another aspect, the method may be used to measure a gap between elements that have assembled together.
    Type: Application
    Filed: March 17, 2022
    Publication date: September 21, 2023
    Inventors: Jianyong MO, V Wade SINGLETON, Yiren WU, Liang ZHANG, David WASINGER
  • Metrology diffraction signal adaptation for tool-to-tool matching
    Patent number: 6792328
    Abstract: A method and system in integrated circuit metrology for adapting a metrology system to work with diverse metrology devices. One embodiment is a method and system for generating signal adjustment data to adapt measured diffraction signals to enable use of a library of diffraction signals and structure profiles created for a different metrology device. Another embodiment is the creation and use of a data store of diffraction adjustment vectors and metrology device specifications relative to a reference device specification.
    Type: Grant
    Filed: March 29, 2002
    Date of Patent: September 14, 2004
    Assignee: Timbre Technologies, Inc.
    Inventors: Michael Laughery, David Wasinger, Nickhil Jakatdar
  • Metrology diffraction signal adaptation for tool-to-tool matching
    Publication number: 20030187840
    Abstract: A method and system in integrated circuit metrology for adapting a metrology system to work with diverse metrology devices. One embodiment is a method and system for generating signal adjustment data to adapt measured diffraction signals to enable use of a library of diffraction signals and structure profiles created for a different metrology device. Another embodiment is the creation and use of a data store of diffraction adjustment vectors and metrology device specifications relative to a reference device specification.
    Type: Application
    Filed: March 29, 2002
    Publication date: October 2, 2003
    Inventors: Michael Laughery, David Wasinger, Nickhil Jakatdar