Patents by Inventor Debra S. Hilgers

Debra S. Hilgers has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6812196
    Abstract: A method of substantially reducing biofilm-associated microorganisms on a surface and a composition designed to substantially reduce biofilm-associated microorganisms on surfaces are disclosed. In one embodiment, the composition is an anionic surfactant selected from the group consisting of alkyl sulfates, alkyl sulfonates, and aryl sulfonates with alkyl or aryl substituents, an acid, and an alcohol solvent, wherein the pH of the composition is between pH 1 and pH 5.
    Type: Grant
    Filed: June 10, 2002
    Date of Patent: November 2, 2004
    Assignee: S.C. Johnson & Son, Inc.
    Inventors: Wayne M. Rees, Debra S. Hilgers
  • Patent number: 6699825
    Abstract: A low residue antimicrobial solution containing about 0.2 percent by weight of an acid selected from the group consisting of organocarboxylic acids; and about 2 percent of a volatile solvent selected from the group consisting of n-butanol, benzyl alcohol, phenylethanol, and sparingly soluble glycol ether solvents is disclosed. Preferred compositions may also contain about 0.1 percent anionic sulfated or sulfonated surfactants and about 5 percent co-solvent selected from the group consisting of completely water soluble monoprotic aliphatic alcohols and glycol ethers. The solution may be also employed as a low-residue cleaner for soiled hard surfaces.
    Type: Grant
    Filed: January 12, 2001
    Date of Patent: March 2, 2004
    Assignee: S.C. Johnson & Son, Inc.
    Inventors: Wayne M. Rees, Debra S. Hilgers
  • Publication number: 20030083219
    Abstract: A method of substantially reducing biofilm-associated microorganisms on a surface and a composition designed to substantially reduce biofilm-associated microorganisms on surfaces are disclosed. In one embodiment, the composition is an anionic surfactant selected from the group consisting of alkyl sulfates, alkyl sulfonates, and aryl sulfonates with alkyl or aryl substituents, an acid, and an alcohol solvent, wherein the pH of the composition is between pH 1 and pH 5.
    Type: Application
    Filed: June 10, 2002
    Publication date: May 1, 2003
    Inventors: Wayne M. Rees, Debra S. Hilgers
  • Patent number: 6471974
    Abstract: The antimicrobial efficacy of N-chlorosulfamate solutions, namely buffered aqueous combinations of HClNSO3−(mono-N-chlorosulfamate) and Cl2NSO3 (di-N-chlorosulfamate), herein referred to as “stabilized hypochlorite”, can be markedly enhanced by the addition of certain organic dopants. The dopants themselves are select hypochlorite stabilizing agents, which are known to readily form stable organochloramides when reacted with “free” hypochlorite (HOCl or NaOCl). Highly effective antimicrobial enhancing dopants include 5,5-dialkyl hydantoins, arylsulfonamides, and succinimides. Examples of these include 5,5-dimethylhydantoin, benzenesulfonamide, and succinimide. Other, less effective dopants include glycolurils. Generally, the dopant is present in a minor mole fraction, relative to the molar amount of stabilized hypochlorite present in the enhanced antimicrobial solution.
    Type: Grant
    Filed: June 29, 1999
    Date of Patent: October 29, 2002
    Assignee: S.C. Johnson & Son, Inc.
    Inventors: Wayne M. Rees, Debra S. Hilgers
  • Publication number: 20020155969
    Abstract: A low residue antimicrobial solution containing about 0.2 percent by weight of an acid selected from the group consisting of organocarboxylic acids; and about 2 percent of a volatile solvent selected from the group consisting of n-butanol, benzyl alcohol, phenylethanol, and sparingly soluble glycol ether solvents is disclosed. Preferred compositions may also contain about 0.1 percent anionic sulfated or sulfonated surfactants and about 5 percent co-solvent selected from the group consisting of completely water soluble monoprotic aliphatic alcohols and glycol ethers. The solution may be also employed as a low-residue cleaner for soiled hard surfaces.
    Type: Application
    Filed: January 12, 2001
    Publication date: October 24, 2002
    Inventors: Wayne M. Rees, Debra S. Hilgers
  • Patent number: 6162371
    Abstract: The composition of this invention is a stabilized acidic bleaching composition comprising an aqueous solution of a source of source of unipositive chlorine ion, a chlorine stabilizing agent, and an acidic buffer to stabilize the pH of the bleaching composition in the range from about 2 to 6.5, wherein the chlorine stabilizing agent and the source of source of unipositive chlorine ion are in a molar ratio of greater than about 1:1. Methods are described for removal of lime scale from a hard surface controlling microbial activity as well as reducing malodor by applying the composition of this invention.
    Type: Grant
    Filed: December 22, 1997
    Date of Patent: December 19, 2000
    Assignee: S. C. Johnson & Son, Inc.
    Inventors: Wayne M. Rees, Debra S. Hilgers, Margaret Coyle-Rees, Timothy Moodycliffe