Patents by Inventor Deepak N. Kumar

Deepak N. Kumar has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Holographic recording material
    Patent number: 7129008
    Abstract: New photosensitive acrylic material compositions for fabrication of holographic recording materials (HRMs) are provided. These compositions are comprised of polymerizable acrylic monomers and light absorbing dyes, and when polymerized they are thermally stable, light sensitive, hard and inert to common chemicals. Methods of fabricating HRMs with symmetric concentration distribution of the dye are also provided.
    Type: Grant
    Filed: June 12, 2003
    Date of Patent: October 31, 2006
    Assignee: Laser Photonics Technology Inc.
    Inventors: Ryszard Burzynski, Deepak N. Kumar, Saswati Ghosal, Dale R. Tyczka
  • Methods and compositions for chemical mechanical polishing shallow trench isolation substrates
    Patent number: 6811470
    Abstract: Methods and compositions are provided for planarizing a substrate surface with reduced or minimal defects in surface topography. In one aspect, a method is provided for processing a substrate including positioning a substrate comprising at least first dielectric material and second dielectric material disposed thereon in a polishing apparatus, polishing the substrate with a first polishing composition having a first selectivity, and polishing the substrate with a second polishing composition having a second selectivity greater than the first selectivity.
    Type: Grant
    Filed: July 12, 2002
    Date of Patent: November 2, 2004
    Assignee: Applied Materials Inc.
    Inventors: Benjamin A. Bonner, Anand N. Iyer, Deepak N. Kumar, Thomas H. Osterheld, Wei-Yung Hsu, Yong-Sik R. Kim, Christopher W. Smith, Huanbo Zhang
  • Holographic recording material
    Publication number: 20040033423
    Abstract: New photosensitive acrylic material compositions for fabrication of holographic recording materials (HRMS) are provided. These compositions are comprised of polymerizable acrylic monomers and light absorbing dyes, and when polymerized they are thermally stable, light sensitive, hard and inert to common chemicals. Methods of fabricating HRMs with symmetric concentration distribution of the dye are also provided.
    Type: Application
    Filed: June 12, 2003
    Publication date: February 19, 2004
    Inventors: Ryszard Burzynski, Deepak N. Kumar, Saswati Ghosal, Dale R. Tyczka
  • Methods and compositions for chemical mechanical polishing shallow trench isolation substrates
    Publication number: 20030036339
    Abstract: Methods and compositions are provided for planarizing a substrate surface with reduced or minimal defects in surface topography. In one aspect, a method is provided for processing a substrate including positioning a substrate comprising at least first dielectric material and second dielectric material disposed thereon in a polishing apparatus, polishing the substrate with a first polishing composition having a first selectivity, and polishing the substrate with a second polishing composition having a second selectivity greater than the first selectivity.
    Type: Application
    Filed: July 12, 2002
    Publication date: February 20, 2003
    Applicant: Applied Materials, Inc.
    Inventors: Benjamin A. Bonner, Anand N. Iyer, Deepak N. Kumar, Thomas H. Osterheld, Wei-Yung Hsu, Yong-Sik R. Kim, Christopher W. Smith, Huanbo Zhang
  • Holographic recording material
    Publication number: 20020068225
    Abstract: New photosensitive acrylic material compositions for fabrication of holographic recording materials (HRMs) are provided. These compositions are comprised of polymerizable acrylic monomers and light absorbing dyes, and when polymerized they are thermally stable, light sensitive, hard and inert to common chemicals. Methods of fabricating HRMs with symmetric concentration distribution of the dye are also provided.
    Type: Application
    Filed: November 16, 2001
    Publication date: June 6, 2002
    Inventors: Ryszard Burzynski, Deepak N. Kumar, Saswati Ghosal, Dale R. Tyczka
  • Holographic recording material
    Patent number: 6344297
    Abstract: New photosensitive acrylic material compositions for fabrication of holographic recording materials (HRMs) are provided. These compositions are comprised of polymerizable acrylic monomers and light absorbing dyes, and when polymerized they are thermally stable, light sensitive, hard and inert to common chemicals. Methods of fabricating HRMs with symmetric concentration distribution of the dye are also provided.
    Type: Grant
    Filed: October 12, 1999
    Date of Patent: February 5, 2002
    Assignee: Laser Photonics Technology Inc.
    Inventors: Ryszard Burzynski, Deepak N. Kumar, Saswati Ghosal, Dale R. Tyczka