Patents by Inventor Deepak Vedhachalam

Deepak Vedhachalam has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Controlling dry etch process characteristics using waferless dry clean optical emission spectroscopy
    Patent number: 11273469
    Abstract: Described herein are architectures, platforms and methods for acquiring optical emission spectra from an optical emission spectroscopy system by flowing a dry cleaning gas into a plasma processing chamber of the plasma processing system and igniting a plasma in the plasma processing chamber to initiate the waferless dry cleaning process.
    Type: Grant
    Filed: September 11, 2020
    Date of Patent: March 15, 2022
    Assignee: Tokyo Electron Limited
    Inventors: Brian J. Coppa, Deepak Vedhachalam, Francois C. Dassapa
  • CONTROLLING DRY ETCH PROCESS CHARACTERISTICS USING WAFERLESS DRY CLEAN OPTICAL EMISSION SPECTROSCOPY
    Publication number: 20200406315
    Abstract: Described herein are architectures, platforms and methods for acquiring optical emission spectra from an optical emission spectroscopy system by flowing a dry cleaning gas into a plasma processing chamber of the plasma processing system and igniting a plasma in the plasma processing chamber to initiate the waferless dry cleaning process.
    Type: Application
    Filed: September 11, 2020
    Publication date: December 31, 2020
    Applicant: Tokyo Electron Limited
    Inventors: Brian J. COPPA, Deepak Vedhachalam, Francois C. Dassapa
  • Controlling dry etch process characteristics using waferless dry clean optical emission spectroscopy
    Patent number: 10773282
    Abstract: Described herein are architectures, platforms and methods for acquiring optical emission spectra from an optical emission spectroscopy system by flowing a dry cleaning gas into a plasma processing chamber of the plasma processing system and igniting a plasma in the plasma processing chamber to initiate the waferless dry cleaning process.
    Type: Grant
    Filed: March 24, 2017
    Date of Patent: September 15, 2020
    Assignee: Tokyo Electron Limited
    Inventors: Brian J. Coppa, Deepak Vedhachalam, Francois C. Dassapa
  • Compositional optical emission spectroscopy for detection of particle induced arcs in a fabrication process
    Patent number: 10436717
    Abstract: Described herein are architectures, platforms and methods for detecting and analyzing anomalous events (i.e., arcing events) from spectral data gathered during a wafer fabrication process.
    Type: Grant
    Filed: November 17, 2017
    Date of Patent: October 8, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Thomas Omstead, Ke-Hung Chen, Deepak Vedhachalam
  • COMPOSITIONAL OPTICAL EMISSION SPECTROSCOPY FOR DETECTION OF PARTICLE INDUCED ARCS IN A FABRICATION PROCESS
    Publication number: 20180143141
    Abstract: Described herein are architectures, platforms and methods for detecting and analyzing anomalous events (i.e., arcing events) from spectral data gathered during a wafer fabrication process.
    Type: Application
    Filed: November 17, 2017
    Publication date: May 24, 2018
    Inventors: Thomas Omstead, Ke-Hung Chen, Deepak Vedhachalam
  • CONTROLLING DRY ETCH PROCESS CHARACTERISTICS USING WAFERLESS DRY CLEAN OPTICAL EMISSION SPECTROSCOPY
    Publication number: 20170282223
    Abstract: Described herein are architectures, platforms and methods for acquiring optical emission spectra from an optical emission spectroscopy system by flowing a dry cleaning gas into a plasma processing chamber of the plasma processing system and igniting a plasma in the plasma processing chamber to initiate the waferless dry cleaning process.
    Type: Application
    Filed: March 24, 2017
    Publication date: October 5, 2017
    Inventors: Brian J. Coppa, Deepak Vedhachalam, Francois C. Dassapa
  • CONTROLLING DRY ETCH PROCESS CHARACTERISTICS USING WAFERLESS DRY CLEAN OPTICAL EMISSION SPECTROSCOPY
    Publication number: 20170287791
    Abstract: Described herein are architectures, platforms and methods for acquiring optical emission spectra from an optical emission spectroscopy system by flowing a dry cleaning gas into a plasma processing chamber of the plasma processing system and igniting a plasma in the plasma processing chamber to initiate the waferless dry cleaning process.
    Type: Application
    Filed: March 24, 2017
    Publication date: October 5, 2017
    Inventors: Brian J. Coppa, Deepak Vedhachalam, Francois C. Dassapa