Abstract: A SMIF system for transferring semiconductor wafers between two controlled environments, one being within a wafer cassette carrier and the other being within an enclosure around a wafer processing apparatus. In a carrier loading position, a carrier door rests on a port door which forms part of a platform for vertically fixing and horizontally moving the cassette within the enclosure. A carrier cover, when unlocked from the carrier door, is engageable by a port plate for vertical movement therewith as an elevator mechanism moves the port plate between down and up positions. In the down position, the port door closes an enclosure opening defined by the port plate. In the up position, the port plate raises the carrier cover to allow access to the wafers in the cassette by an article processing apparatus. External and internal panels carried by the port plate cause the controlled environment of the enclosure to be extended to include a compartment containing the uncovered cassette.

Abstract: A reaction chamber for performing a chemical vapor deposition process wherein the window through which the light must pass is prevented from becoming clouded. The chamber is divided by baffles into a reactant zone, a buffer zone, and a window zone, and the momentum flux densities of the gases flowing in the respective zones are about matched. Additionally, discontinuities are provided on the walls of the reactor to impede diffusion of the reactant gas towards the window.